公开(公告)号：US11029605B2

公开(公告)日：2021-06-08

申请号：US16527098

申请日：2019-07-31

Applicant: ASML Netherlands B.V.

Inventor： Xiaofeng Liu

IPC: G06N20/00 ,  G03F7/20 ,  G06F30/00 ,  G06F30/20 ,  G06N20/10

Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a first source of the lithographic apparatus; classifying the first source into a class among a plurality of possible classes, based on one or more numerical characteristics of the first source, using a machine learning model, by a computer; determining whether the class is among one or more predetermined classes; only when the class is among the one or more predetermined classes, adjusting one or more source design variables to obtain a second source.

公开(公告)号：US10386727B2

公开(公告)日：2019-08-20

申请号：US15126234

申请日：2015-03-03

Applicant: ASML Netherlands B.V.

Inventor： Duan-Fu Stephen Hsu ,  Jianjun Jia ,  Xiaofeng Liu ,  Cuiping Zhang

IPC: G03F7/20 ,  G03F1/36

Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors.