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公开(公告)号：US10459346B2
公开(公告)日：2019-10-29
申请号：US16036732
申请日：2018-07-16
Applicant: ASML Netherlands B.V.
Inventor： Duan-Fu Stephen Hsu , Rafael C. Howell , Xiaofeng Liu
Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
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公开(公告)号：US20150089459A1
公开(公告)日：2015-03-26
申请号：US14398416
申请日：2013-04-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Xiaofeng Liu
IPC: G06F17/50
CPC classification number: G06F17/5045 , G03F7/705 , G03F7/70525 , G03F7/7065 , G06F17/5081 , G06F2217/12 , H05K3/0005 , H05K2203/05
Abstract: A computer-implemented method for obtaining values of one or more design variables of one or more design rules for a pattern transfer process comprising a lithographic projection apparatus, the method comprising. simultaneously optimizing one or more design variables of the pattern transfer process and the one or more design variables of the one or more design rules. The optimizing comprises evaluating a cost function that measures a metric characteristic of the pattern transfer process, the cost function being a function of one or more design variables of the pattern transfer process and one or more design variables of the one or more design rules.
Abstract translation: 一种计算机实现的方法，用于获得包括光刻投影装置的图案转印处理的一个或多个设计规则的一个或多个设计变量的值，所述方法包括。 同时优化模式转移过程的一个或多个设计变量和一个或多个设计规则的一个或多个设计变量。 优化包括评估测量图案转移过程的度量特征的成本函数，成本函数是模式转移过程的一个或多个设计变量和一个或多个设计规则的一个或多个设计变量的函数。
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公开(公告)号：US10558124B2
公开(公告)日：2020-02-11
申请号：US16257423
申请日：2019-01-25
Applicant: ASML Netherlands B.V.
Inventor： Xiaofeng Liu , Rafael C. Howell
IPC: G03F7/20
Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.
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公开(公告)号：US10409165B2
公开(公告)日：2019-09-10
申请号：US15528034
申请日：2015-11-18
Applicant: ASML Netherlands B.V.
Inventor： Xiaofeng Liu
Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic apparatus, the method including: obtaining a first source of the lithographic apparatus; classifying the first source into a class among a plurality of possible classes, based on one or more numerical characteristics of the first source, using a machine learning model, by a computer; determining whether the class is among one or more predetermined classes; only when the class is among the one or more predetermined classes, adjusting one or more source design variables to obtain a second source.
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公开(公告)号：US09489479B2
公开(公告)日：2016-11-08
申请号：US14398416
申请日：2013-04-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Xiaofeng Liu
CPC classification number: G06F17/5045 , G03F7/705 , G03F7/70525 , G03F7/7065 , G06F17/5081 , G06F2217/12 , H05K3/0005 , H05K2203/05
Abstract: A computer-implemented method for obtaining values of one or more design variables of one or more design rules for a pattern transfer process comprising a lithographic projection apparatus, the method comprising: simultaneously optimizing one or more design variables of the pattern transfer process and the one or more design variables of the one or more design rules. The optimizing comprises evaluating a cost function that measures a metric characteristic of the pattern transfer process, the cost function being a function of one or more design variables of the pattern transfer process and one or more design variables of the one or more design rules.
Abstract translation: 一种用于获得包括光刻投影设备的图案转移处理的一个或多个设计规则的一个或多个设计规则的值的计算机实现的方法，所述方法包括：同时优化所述图案转移过程的一个或多个设计变量， 或更多设计变量的一个或多个设计规则。 优化包括评估测量图案转移过程的度量特征的成本函数，成本函数是模式转移过程的一个或多个设计变量和一个或多个设计规则的一个或多个设计变量的函数。
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Patent Agency Ranking
公开(公告)号：US20190155145A1
公开(公告)日：2019-05-23
申请号：US16258884
申请日：2019-01-28
Applicant: ASML Netherlands B.V.
Inventor： Xiaofeng Liu
Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which method includes: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.
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公开(公告)号：US10191366B2
公开(公告)日：2019-01-29
申请号：US15318940
申请日：2015-06-01
Applicant: ASML Netherlands B.V.
Inventor： Xiaofeng Liu
Abstract: Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which includes the following steps: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.
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公开(公告)号：US10025201B2
公开(公告)日：2018-07-17
申请号：US15303199
申请日：2015-02-13
Applicant: ASML Netherlands B.V.
Inventor： Duan-Fu Stephen Hsu , Rafael C. Howell , Xiaofeng Liu
Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus having an illumination system and projection optics, the method including: obtaining an illumination source shape and a mask defocus value; optimizing a dose of the lithographic process; and optimizing the portion of the design layout for each of a plurality of slit positions of the illumination source.
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公开(公告)号：US10712653B2
公开(公告)日：2020-07-14
申请号：US16258884
申请日：2019-01-28
Applicant: ASML Netherlands B.V.
Inventor： Xiaofeng Liu
Abstract: A method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus and for transferring the imaged portion of the design layout to the substrate by an etching process, which method includes: determining a value of at least one evaluation point of the lithographic process for each of a plurality of variations of the etching process; computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, wherein the multi-variable cost function is a function of deviation from the determined values of the at least one evaluation point; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a termination condition is satisfied. This method may reduce the need of repeated adjustment to the lithographic process when the etching process varies.
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公开(公告)号：US10191384B2
公开(公告)日：2019-01-29
申请号：US14766703
申请日：2014-02-04
Applicant: ASML Netherlands B.V.
Inventor： Xiaofeng Liu , Rafael C. Howell
IPC: G03F7/20
Abstract: A method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method including: calculating a discrete pupil profile based on a desired pupil profile; selecting a discrete change to the discrete pupil profile; and applying the selected discrete change to the discrete pupil profile. The methods according to various embodiments disclosed herein may reduce the computational cost of discrete optimization from O(an) to O(n) wherein a is constant and n is the number of knobs that can generate discrete change in the pupil profile.
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