公开(公告)号：US11443083B2

公开(公告)日：2022-09-13

申请号：US16300380

申请日：2017-04-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Jing Su ,  Yi Zou ,  Chenxi Lin ,  Stefan Hunsche ,  Marinus Jochemsen ,  Yen-Wen Lu ,  Lin Lee Cheong

IPC: G06T7/00 ,  G06F30/20 ,  G03F7/20 ,  G06K9/62 ,  G06F30/398 ,  G06N20/00

Abstract: Methods of identifying a hot spot from a design layout or of predicting whether a pattern in a design layout is defective, using a machine learning model. An example method disclosed herein includes obtaining sets of one or more characteristics of performance of hot spots, respectively, under a plurality of process conditions, respectively, in a device manufacturing process; determining, for each of the process conditions, for each of the hot spots, based on the one or more characteristics under that process condition, whether that hot spot is defective; obtaining a characteristic of each of the process conditions; obtaining a characteristic of each of the hot spots; and training a machine learning model using a training set including the characteristic of one of the process conditions, the characteristic of one of the hot spots, and whether that hot spot is defective under that process condition.

公开(公告)号：US10670973B2

公开(公告)日：2020-06-02

申请号：US15573832

申请日：2016-04-29

Applicant: ASML Netherlands B.V.

Inventor： Yi Zou ,  Jing Su ,  Robert John Socha ,  Christopher Alan Spence ,  Duan-Fu Stephen Hsu

IPC: G06F17/50 ,  G03F7/20 ,  G06T7/90 ,  G06T11/00 ,  G06F30/00

Abstract: A method includes obtaining a sub-layout having an area that is a performance limiting spot, adjusting colors of patterns in the area, and determining whether the area is still a performance limiting spot. Another method includes decomposing patterns in a design layout into multiple sub-layouts; determining for at least one area in one of the sub-layouts, the likelihood of that a figure of merit is beyond its allowed range; and if the likelihood is above a threshold, that one sub-layout has a performance limiting spot. Another method includes: obtaining a design layout having a first group of patterns and a second group of patterns, wherein colors of the first group of patterns are not allowed to change and colors of the second group of patterns are allowed to change; and co-optimizing at least the first group of patterns, the second group of patterns and an illumination of a lithographic apparatus.