公开(公告)号：US20180160517A1

公开(公告)日：2018-06-07

申请号：US15887935

申请日：2018-02-02

Applicant: ASML Netherlands B.V.

Inventor： Jonghoon Baek ,  Mathew Cheeran Abraham ,  David Robert Evans ,  Jack Michael Gazza

IPC: H05G2/00 ,  G02B19/00 ,  G03F7/20

CPC classification number: H05G2/005 ,  G02B19/0095 ,  G02B27/0006 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70925 ,  G03F7/70933 ,  H05G2/008

Abstract: A system and method of removing target material debris deposits simultaneously with generating EUV light includes generating hydrogen radicals in situ in the EUV vessel, proximate to the target material debris deposits and volatilizing the target material debris deposits and purging the volatilized target material debris deposits from the EUV vessel without the need of an oxygen containing species in the EUV vessel.