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公开(公告)号:US11553596B2
公开(公告)日:2023-01-10
申请号:US17342363
申请日:2021-06-08
Applicant: Advanced Semiconductor Engineering, Inc.
Inventor: Chien-Fan Chen , Chien-Hao Wang
IPC: H05K7/00 , H05K1/18 , H01L21/48 , H01L23/538 , H01L21/56
Abstract: A manufacturing method of an embedded component package structure includes the following steps: providing a carrier and forming a semi-cured first dielectric layer on the carrier, the semi-cured first dielectric layer having a first surface; providing a component on the semi-cured first dielectric layer, and respectively providing heat energies from a top and a bottom of the component to cure the semi-cured first dielectric layer; forming a second dielectric layer on the first dielectric layer to cover the component; and forming a patterned circuit layer on the second dielectric layer, the patterned circuit layer being electrically connected to the component.
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12.
公开(公告)号:US11335646B2
公开(公告)日:2022-05-17
申请号:US16814704
申请日:2020-03-10
Applicant: Advanced Semiconductor Engineering, Inc.
Inventor: Chien-Fan Chen , Yu-Ju Liao
IPC: H01L23/552 , H01L23/31 , H01L23/538 , H01L21/56 , H01L21/48
Abstract: The present disclosure provides a substrate structure. The substrate structure includes an interconnection structure, a dielectric layer on the interconnection structure, an electronic component embedded in the dielectric layer, and a first conductive via penetrating through the dielectric layer and disposed adjacent to the electronic component. The interconnection structure includes a carrier having a first surface and a second surface opposite to the first surface, a first conductive layer disposed on the first surface of the carrier, and a second conductive layer disposed on the second surface of the carrier. The first conductive via and at least one of the first conductive layer and the second conductive layer define a first shielding structure surrounding the electronic component. A method of manufacturing a substrate structure is also disclosed.
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13.
公开(公告)号:US11277917B2
公开(公告)日:2022-03-15
申请号:US16351026
申请日:2019-03-12
Applicant: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
Inventor: Yu-Ju Liao , Chien-Fan Chen , Chien-Hao Wang , I-Chia Lin
IPC: H05K1/18 , H01L21/48 , H01L23/00 , H01L23/498
Abstract: An embedded component package structure including a circuit substrate, an embedded component and a stress compensation layer is provided. The circuit substrate includes a core layer and an asymmetric circuit structure, and the core layer has a first thickness. The embedded component is disposed in the core layer. The stress compensation layer is disposed on one side of the core layer, and the stress compensation layer has a second thickness between 4 μm and 351 μm.
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公开(公告)号:US11032911B2
公开(公告)日:2021-06-08
申请号:US16942609
申请日:2020-07-29
Applicant: Advanced Semiconductor Engineering, Inc.
Inventor: Chien-Fan Chen , Chien-Hao Wang
IPC: H05K7/00 , H05K1/18 , H01L21/48 , H01L23/538 , H01L21/56
Abstract: A manufacturing method of an embedded component package structure includes the following steps: providing a carrier and forming a semi-cured first dielectric layer on the carrier, the semi-cured first dielectric layer having a first surface; providing a component on the semi-cured first dielectric layer, and respectively providing heat energies from a top and a bottom of the component to cure the semi-cured first dielectric layer; forming a second dielectric layer on the first dielectric layer to cover the component; and forming a patterned circuit layer on the second dielectric layer, the patterned circuit layer being electrically connected to the component.
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公开(公告)号:US10757813B2
公开(公告)日:2020-08-25
申请号:US16159264
申请日:2018-10-12
Applicant: ADVANCED SEMICONDUCTOR ENGINEERING, INC.
Inventor: Chien-Fan Chen , Chien-Hao Wang
IPC: H05K1/18 , H01L21/48 , H01L23/538 , H01L21/56
Abstract: A manufacturing method of an embedded component package structure includes the following steps: providing a carrier and forming a semi-cured first dielectric layer on the carrier, the semi-cured first dielectric layer having a first surface; providing a component on the semi-cured first dielectric layer, and respectively providing heat energies from a top and a bottom of the component to cure the semi-cured first dielectric layer; forming a second dielectric layer on the first dielectric layer to cover the component; and forming a patterned circuit layer on the second dielectric layer, the patterned circuit layer being electrically connected to the component.
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