公开(公告)号：US20210185793A1

公开(公告)日：2021-06-17

申请号：US16714247

申请日：2019-12-13

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Eli DAGAN

IPC: H05H1/24 ,  G03F1/82

Abstract: Embodiments of the present disclosure generally provide apparatus and methods for removing an adhesive material from a photomask. In one embodiment, an apparatus for processing a photomask includes an enclosure, a substrate support assembly disposed in the enclosure, and a dielectric barrier discharge (DBD) plasma generator disposed above the substrate support assembly, wherein the dielectric barrier discharge plasma generator further comprises a first electrode, a second electrode, wherein the first and the second electrodes are vertically aligned and in parallel, a dielectric barrier positioned between the first electrode and the second electrode, and a discharge space defined between the dielectric barrier and the second electrode.

公开(公告)号：US20240157411A1

公开(公告)日：2024-05-16

申请号：US17987591

申请日：2022-11-15

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Eliyahu Shlomo DAGAN

IPC: B08B7/04 ,  B08B3/08 ,  B08B3/10 ,  B08B7/00 ,  B08B13/00

CPC classification number: B08B7/04 ,  B08B3/08 ,  B08B3/10 ,  B08B7/0057 ,  B08B13/00 ,  B08B2203/005

Abstract: A cleaning apparatus for cleaning a substrate wherein the substrate is contacted with ozonated water and irradiating the substrate and the ozonated water with UV electromagnetic radiation from a UV lamp within a cleaning chamber; wherein greater than or equal to about 50% of the UV electromagnetic radiation has a wavelength of greater than or equal to about 280 nm. Methods of cleaning a substrate are also presented.

公开(公告)号：US20240027894A1

公开(公告)日：2024-01-25

申请号：US18370190

申请日：2023-09-19

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Eliyahu Shlomo DAGAN

IPC: G03F1/82 ,  H01J37/32 ,  B08B7/00 ,  B08B13/00

CPC classification number: G03F1/82 ,  H01J37/32825 ,  H01J37/3244 ,  H01J37/3299 ,  H01J37/32972 ,  B08B7/0035 ,  B08B13/00 ,  H01J37/32082 ,  H01J2237/335 ,  H01J2237/0206

Abstract: Methods and apparatus leverage dielectric barrier discharge (DBD) plasma to treat samples for surface modification prior to photomask application and for photomask cleaning. In some embodiments, a method of treating a surface with AP plasma includes igniting plasma over an ignition plate where the AP plasma is formed by one or more plasma heads of an AP plasma reactor positioned above the ignition plate, monitoring characteristics of the AP plasma with an optical emission spectrometer (OES) sensor to determine if stable AP plasma is obtained and, if so, moving the AP reactor over a central opening of an assistant plate where the central opening contains a sample under treatment and where the assistant plate reduces AP plasma arcing on the sample during treatment. The AP reactor scans back and forth over the central opening of the assistant plate while maintaining stabilized AP plasma to treat the sample.

公开(公告)号：US20230127302A1

公开(公告)日：2023-04-27

申请号：US17550903

申请日：2021-12-14

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Eliyahu Shlomo DAGAN

IPC: B08B3/12 ,  B08B13/00 ,  G01B11/30

Abstract: Embodiments of megasonic cleaning chambers are provided herein. In some embodiments, a megasonic cleaning chamber includes: a chamber body defining an interior volume therein; a substrate support to support a substrate disposed in the interior volume; a supply tube comprising a transparent material configured to direct a cleaning fluid to the substrate support; a megasonic power generator coupled to the supply tube to provide megasonic power to the cleaning fluid; a megasonic transducer coupled to the megasonic power generator and the supply tube to create megasonic waves in the cleaning fluid and to form cavities in the cleaning fluid, wherein the megasonic transducer is configured to direct the megasonic waves and cavities toward the substrate support; and one or more sensors configured to generate a signal indicative of a property of the cavities in the cleaning fluid.

公开(公告)号：US20230044618A1

公开(公告)日：2023-02-09

申请号：US17397088

申请日：2021-08-09

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Hiroki OGAWA ,  Eliyahu Shlomo DAGAN

IPC: H01L21/02 ,  B08B7/00 ,  B08B3/10

Abstract: A cleaning apparatus for cleaning a substrate includes a lamp for emitting ultraviolet radiation in an irradiation region; a housing that houses the lamp; a water deflector spaced below the housing, the water deflector having a water inlet for receiving a supply of ozonated water and a water outlet for discharging ozonated water irradiated by the lamp into a substrate processing region beneath the water deflector, and defining a water flow path between the water inlet and the water outlet, the water flow path extending in the irradiation region; an upper reflector extending along and above the lamp; and a lower reflector extending along and below the water deflector, wherein the upper reflector and the lower reflector at least partially define the irradiation region and reflect ultraviolet radiation toward the water flow path, and wherein the lower reflector shields the substrate from ultraviolet radiation emitted by the lamp.

公开(公告)号：US20220326606A1

公开(公告)日：2022-10-13

申请号：US17226775

申请日：2021-04-09

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Khalid MAKHAMREH ,  Eliyahu Shlomo DAGAN

IPC: G03F1/82 ,  G03F7/20 ,  G03F7/16

Abstract: Embodiments of baking chambers for baking a photomask are provided herein. In some embodiments, a baking chamber includes: a chamber body enclosing a first interior volume and a second interior volume, disposed beneath and fluidly independent from the first interior volume; a radiant heat source disposed in the first interior volume; a photomask support structure configured to support a photomask disposed in the second interior volume; a window disposed between the first interior volume the second interior volume, wherein the window is made of a material that is transparent to thermal radiation; a first gas inlet and a first gas outlet coupled to the first interior volume; and a second gas inlet and a second gas outlet coupled to the second interior volume on opposite ends thereof to facilitate flow of a process gas laterally through the second interior volume and across the photomask support structure.

公开(公告)号：US20200166834A1

公开(公告)日：2020-05-28

申请号：US16685164

申请日：2019-11-15

Applicant: Applied Materials, Inc.

Inventor： Banqiu WU ,  Eli DAGAN ,  Khalid MAKHAMREH ,  Bruce J. FENDER

IPC: G03F1/66 ,  G03F1/22

Abstract: Embodiments of the present disclosure generally relate to methods and apparatus for preparing a photomask for a lithography process. In one embodiment, a curing chamber is disclosed that includes an elevator adapted to receive a plurality of holder units. Each of the holder units comprise a holder, a clamp holding a photomask, one or more studs coupled to the photomask by an adhesive, and a spring coupled to each of the one or more studs.