公开(公告)号：US10944079B2

公开(公告)日：2021-03-09

申请号：US16149198

申请日：2018-10-02

Applicant: BOE Technology Group Co., Ltd.

Inventor： Wenwen Sun

IPC: H01L51/52 ,  H01L27/32 ,  H01L51/00 ,  H01L51/56 ,  F03G7/06 ,  G06F3/041

Abstract: The disclosure discloses a flexible display panel and a method for fabricating the same, the flexible display panel includes: a flexible substrate and a light-emitting element formed on the flexible substrate, wherein the light-emitting element includes a light-emitting layer, a polarization sheet is arranged on a light-emitting side of the light-emitting element, and the flexible display panel further includes a stress buffer layer.

公开(公告)号：US09323151B2

公开(公告)日：2016-04-26

申请号：US14348489

申请日：2013-06-03

Applicant: BOE TECHNOLOGY GROUP CO., LTD.

Inventor： Wenwen Sun ,  Zhuo Zhang

IPC: C08F8/14 ,  G03F7/038 ,  C08F220/06 ,  C08F220/10 ,  C08F8/42 ,  G03F7/004 ,  G02B5/23 ,  G02B1/00

CPC classification number: G03F7/0388 ,  C08F8/14 ,  C08F8/42 ,  C08F220/06 ,  C08F220/10 ,  G02B1/00 ,  G02B5/223 ,  G02B5/23 ,  G02F1/133514 ,  G03F7/0007 ,  G03F7/004 ,  G03F7/027 ,  G03F7/038 ,  G03F7/105

Abstract: A photosensitive oligomer for photosensitive resist comprising unsaturated double-bond group and flexible group. The monomers or compounds for synthesizing the photosensitive oligomer include unsaturated double-bond containing organic acid-based monomers, unsaturated double-bond containing organic ester-based monomers, unsaturated double-bond containing organic acid chloride/ethylene-based monomers, unsaturated double-bond containing alcohol-based compounds, and flexible group-containing silane/ether-based compounds. The present invention further provides a negative photosensitive resist resin composition comprising the photosensitive oligomer.

Abstract translation: 一种光敏抗蚀剂用光敏低聚物，包括不饱和双键和柔性基。 用于合成光敏低聚物的单体或化合物包括不饱和双键的有机酸类单体，不饱和双键含有机酯类单体，不饱和双键含有机酰氯/乙烯类单体，不饱和双键 含有醇的化合物和含柔性基团的硅烷/醚类化合物。 本发明还提供一种含感光性低聚物的负型感光性抗蚀剂树脂组合物。