公开(公告)号：US20050161059A1

公开(公告)日：2005-07-28

申请号：US10864929

申请日：2004-06-10

Applicant: Cole Franklin ,  Yi Wu ,  Brian Fraser

Inventor： Cole Franklin ,  Yi Wu ,  Brian Fraser

IPC: B08B3/00 ,  B08B7/00

CPC classification number: B08B3/12 ,  H01L21/67051 ,  Y10S438/906

Abstract: A method and system for the megasonic cleaning of one or more substrates that reduces damage to the substrate(s) resulting from the megasonic energy. The substrates are supported in a process chamber and contacted with a cleaning solution comprising a cleaning liquid having carbon dioxide gas dissolved in the cleaning liquid in such amounts that the carbon dioxide gas is at a supersaturated concentration for the conditions within the process chamber. Megasonic energy is then transmitted to the substrate. The cleaning solution provides protection from damage resulting from the application of megasonic/acoustical energy. In another aspect, the invention is a system for carrying out the method. The invention is not limited to carbon dioxide but can be used in conjunction with any gas that, when so dissolved in a cleaning liquid, protects substrates from being damaged by the application of megasonic/acoustical energy.

Abstract translation: 用于超声波清洗一个或多个基板的方法和系统，其减少由兆声波能量引起的对基板的损坏。 基板被支撑在处理室中，并与包括清洁液体的清洁溶液接触，所述清洗溶液包含溶解在清洗液体中的二氧化碳气体的清洗液体，其量使二氧化碳气体处于处理室内的条件的过饱和浓度。 然后将兆声波能量传输到基板。 清洁液可以防止因应用超声波/声能造成的损坏。 另一方面，本发明是一种执行该方法的系统。 本发明不限于二氧化碳，而是可以与任何气体一起使用，当这些气体溶解在清洁液体中时，可以保护基材免受应用兆声/声能的损害。