专利检索 ap:("David L. Johnson" OR "Frank Tran" OR "John Wai Fong") AND inv:"John Wai Fong" 第 2 页

11.

发明申请
DUAL PHOTOINITIATOR, PHOTOCURABLE COMPOSITION, USE THEREOF AND PROCESS FOR PRODUCING A THREE DIMENSIONAL ARTICLE 有权
标题翻译：双光泽剂，光致抗蚀剂组合物及其制造方法及其制造方法

公开(公告)号：US20100327493A1

公开(公告)日：2010-12-30

申请号：US12595643

申请日：2008-04-09

申请人： John Wai Fong , Carole Chapelat , Loic Messe , Ranjana Patel , Laurence Messe

发明人： John Wai Fong , Carole Chapelat , Loic Messe , Ranjana Patel , Laurence Messe

IPC分类号： B29C35/08 , G03C1/675 , C08F2/50

CPC分类号： G03F7/0045 , B33Y10/00 , B33Y70/00 , C07C381/12 , G03F7/0037 , G03F7/038

摘要： The present invention is directed to a photoinitiator composition comprising two different cationic photoinitiators and a photocurable composition comprising said photoinitiator composition. Moreover, the present invention relates to the use of the photoinitiator composition and the photocurable composition. Furthermore, the present invention relates to a process for producing a three dimensional article.

摘要翻译： 本发明涉及包含两种不同阳离子光引发剂的光引发剂组合物和包含所述光引发剂组合物的光固化组合物。此外，本发明涉及光引发剂组合物和光固化性组合物的用途。此外，本发明涉及三维制品的制造方法。