-
11.发明授权公开(公告)号：US07903339B2
公开(公告)日：2011-03-08
申请号：US11837529
申请日：2007-08-12
申请人： Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
IPC分类号： G02B1/10
CPC分类号： G02B5/0833 , G02B5/26
摘要： Disclosed is a multilayer structure wherein a first layer of a first material having an outer surface and a refracted index between 2 and 4 extends across an outer surface of a second layer having a refractive index between 1 and 3. The multilayer stack has a reflective band of less than 200 nanometers when viewed from angles between 0° and 80° and can be used to reflect a narrow range of electromagnetic radiation in the ultraviolet, visible and infrared spectrum ranges. In some instances, the reflection band of the multilayer structure is less than 100 nanometers. In addition, the multilayer structure can have a quantity defined as a range to mid-range ratio percentage of less than 2%.
摘要翻译： 公开了一种多层结构，其中具有外表面和2和4之间的折射率的第一材料的第一层延伸穿过折射率在1和3之间的第二层的外表面。多层堆叠具有反射带 从0°到80°之间的角度观察时，小于200纳米，可用于在紫外线，可见光和红外光谱范围内反射窄范围的电磁辐射。 在一些情况下，多层结构的反射带小于100纳米。 此外，多层结构可以具有定义为小于2％的中等范围比例百分比的范围的量。
-
公开(公告)号：US20100209593A1
公开(公告)日：2010-08-19
申请号：US12389256
申请日：2009-02-19
IPC分类号： B05D5/06
CPC分类号： G02B5/0825 , G02B27/0012
摘要： A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
摘要翻译： 一种制备具有至少一组高折射率材料和低折射率材料的交替层的多层光子结构的方法可以包括：确定多层光子结构的特性属性函数，确定至少 基于特征属性函数与目标轮廓的比较，一组交替层，用所确定的厚度乘数调整特性属性函数，以及将经调整的特性属性函数与目标轮廓进行比较，其中当调节特征特性函数 不近似目标分布，至少一组另外的层被添加到多层光子结构。
-
公开(公告)号：US20090161220A1
公开(公告)日：2009-06-25
申请号：US12388395
申请日：2009-02-18
申请人： Debasish Banerjee , Masahiko Ishii , Minjuan Zhang
发明人： Debasish Banerjee , Masahiko Ishii , Minjuan Zhang
IPC分类号： G02B5/28
CPC分类号： G02B5/26 , G02B5/0825 , G02B5/0833
摘要： Disclosed is a multilayer structure wherein a first layer of a first material having an outer surface and a refracted index between 2 and 4 extends across an outer surface of a second layer having a refractive index between 1 and 3. The multilayer stack has a reflective band of less than 200 nanometers when viewed from angles between 0° and 80° and can be used to reflect a narrow range of electromagnetic radiation in the ultraviolet, visible and infrared spectrum ranges. In some instances, the reflection band of the multilayer structure is less than 100 nanometers. In addition, the multilayer structure can have a quantity defined as a range to mid-range ratio percentage of less than 2%.
-
14.发明申请公开(公告)号：US20090153953A1
公开(公告)日：2009-06-18
申请号：US12389221
申请日：2009-02-19
CPC分类号： G02B5/0825 , G02B1/115 , G02B5/0833 , G02B5/26 , G02B5/28 , G02B13/14 , G02B13/143 , Y10T428/24942
摘要： A multi-layer photonic structure may include alternating layers of high index material and low index material having a form [H(LH)N] where, H is a layer of high index material, L is a layer of low index material and N is a number of pairs of layers of high index material and layers of low index material. N may be an integer ≧1. The low index dielectric material may have an index of refraction nL from about 1.3 to about 2.5. The high index dielectric material may have an index of refraction nH from about 1.8 to about 3.5, wherein nH>nL and the multi-layer photonic structure comprises a reflectivity band of greater than about 200 nm for light having angles of incidence from about 0 degrees to about 80 degrees relative to the multi-layer photonic structure. The multi-layer photonic structure may be incorporated into a paint or coating system thereby forming an omni-directional reflective paint or coating.
摘要翻译： 多层光子结构可以包括具有[H（LH）N]形式的高折射率材料和低折射率材料的交替层，其中H是高折射率材料层，L是低折射率材料层，N是 多层高指数材料和低折射率材料层。 N可以是整数> = 1。 低折射率介电材料可以具有约1.3至约2.5的折射率nL。 高折射率介电材料可以具有约1.8至约3.5的折射率nH，其中对于具有大约0度的入射角的光，nH> nL和多层光子结构包括大于约200nm的反射带 到大约80度相对于多层光子结构。 多层光子结构可以结合到涂料或涂料体系中，从而形成全向反射涂料或涂料。
-
公开(公告)号：US20140055848A9
公开(公告)日：2014-02-27
申请号：US12793772
申请日：2010-06-04
IPC分类号： F21V9/06
CPC分类号： G02B1/005 , G02B5/0825
摘要： An omnidirectional reflector that reflects a band of electromagnetic radiation of less than 100 nanometers when viewed from angles between 0 and 45 degrees is provided. The omnidirectional reflector includes a multilayer stack having a plurality of layers of high index of refraction material and a plurality of layers of low index of refraction material. In addition, the plurality of high index of refraction material layers and low index of refraction material layers are alternately stacked on top of or across each other and provide a non-periodic layered structure.
摘要翻译： 提供了从0度到45度之间的角度观察时，反射小于100纳米的电磁辐射带的全向反射器。 全向反射器包括具有多层高折射率材料和多层低折射率材料层的多层叠层。 此外，多个高折射率材料层和低折射率材料层折射交替堆叠在彼此的顶部或彼此之间，并提供非周期性分层结构。
-
公开(公告)号：US08329247B2
公开(公告)日：2012-12-11
申请号：US12389256
申请日：2009-02-19
IPC分类号： B05D5/06
CPC分类号： G02B5/0825 , G02B27/0012
摘要： A method for producing a multi-layer photonic structure having at least one group of alternating layers of high index material and low index material may include, determining a characteristic property function for the multi-layer photonic structure, determining a thickness multiplier for the at least one group of alternating layers based on a comparison of the characteristic property function to a target profile, adjusting the characteristic property function with the determined thickness multiplier, and comparing an adjusted characteristic property function to the target profile, wherein, when the adjusted characteristic property function does not approximate the target profile, at least one additional group of layers is added to the multi-layer photonic structure.
摘要翻译： 一种制备具有至少一组高折射率材料和低折射率材料的交替层的多层光子结构的方法可以包括：确定多层光子结构的特性属性函数，确定至少 基于特征属性函数与目标轮廓的比较，一组交替层，用所确定的厚度乘数调整特性属性函数，以及将经调整的特性属性函数与目标轮廓进行比较，其中当调节特征特性函数 不近似目标分布，至少一组另外的层被添加到多层光子结构。
-
公开(公告)号：US20100290109A1
公开(公告)日：2010-11-18
申请号：US12467656
申请日：2009-05-18
申请人： Pinar Kurt , Debasish Banerjee , Robert E. Cohen , Michael Rubner , Masahiko Ishii , Minjuan Zhang
发明人： Pinar Kurt , Debasish Banerjee , Robert E. Cohen , Michael Rubner , Masahiko Ishii , Minjuan Zhang
CPC分类号： C01G23/053 , B82Y30/00 , C01P2004/04 , C01P2004/64 , C09C1/0051 , C09C2200/409 , C09C2200/505 , C09C2210/20 , G02B5/0891 , G02B5/208
摘要： The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region. The non-quarter wave multilayer structure, i.e. nLdL≠nHdH≠λ0/4, can be expressed as [A 0.5qH pL(qH pL)N 0.5qH G], where q and p are multipliers to the quarter-wave thicknesses of high and low refractive index material, respectively, H is the quarter-wave thickness of the high refracting index material; L is the quarter-wave thickness of the low refracting index material; N represents the total number of layers between bounding half layers of high index of refraction material (0.5qH); G represents a substrate and A represents air.
摘要翻译： 本发明公开了一种非四分之一波长多层结构，其具有多个交替折射率较低的折射材料堆叠和高折射率折射材料堆叠。 多个交替的堆叠可以反射紫外区域中的电磁辐射和可见光区域中的电磁辐射的窄带。 非四分之一波长多层结构，即nLdL≠nHdH≠λ0/ 4，可以表示为[A 0.5qH pL（qH pL）N 0.5qH G]，其中q和p是四分之一波长厚度的乘数 和低折射率材料，H是高折射率材料的四分之一波长厚度; L是低折射率材料的四分之一波长厚度; N表示高折射率材料的折射半层之间的总层数（0.5qH）; G表示底物，A表示空气。
-
公开(公告)号：US09063291B2
公开(公告)日：2015-06-23
申请号：US13021730
申请日：2011-02-05
申请人： Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
CPC分类号： G02B5/285 , G02B5/0825 , G02B5/085
摘要： An omnidirectional structural color (OSC) having a non-periodic layered structure. The OSC can include a multilayer stack that has an outer surface and at least two layers. The at least two layers can include at least one first index of refraction material layer A1 and at least one second index of refraction material layer B1. The at least A1 and B1 can be alternately stacked on top of each other with each layer having a predefined thickness dA1 and dB1, respectively. The dA1 is not generally equal to the dB1 such that the multilayer stack has a non-periodic layered structure.
摘要翻译： 具有非周期性分层结构的全向结构颜色（OSC）。 OSC可以包括具有外表面和至少两层的多层堆叠。 所述至少两层可以包括至少一个第一折射材料层A1和至少一个第二折射材料层B1折射率。 至少A1和B1可以交替地堆叠在彼此的顶部，每个层分别具有预定义的厚度dA1和dB1。 dA1通常不等于dB1，使得多层堆叠具有非周期性分层结构。
-
公开(公告)号：US08446666B2
公开(公告)日：2013-05-21
申请号：US12467656
申请日：2009-05-18
申请人： Pinar Kurt , Debasish Banerjee , Robert E. Cohen , Michael Rubner , Masahiko Ishii , Minjuan Zhang
发明人： Pinar Kurt , Debasish Banerjee , Robert E. Cohen , Michael Rubner , Masahiko Ishii , Minjuan Zhang
CPC分类号： C01G23/053 , B82Y30/00 , C01P2004/04 , C01P2004/64 , C09C1/0051 , C09C2200/409 , C09C2200/505 , C09C2210/20 , G02B5/0891 , G02B5/208
摘要： The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region. The non-quarter wave multilayer structure, i.e. nLdL≠nHdH≠λ0/4, can be expressed as [A 0.5 qH pL(qH pL)N 0.5 qH G], where q and p are multipliers to the quarter-wave thicknesses of high and low refractive index material, respectively, H is the quarter-wave thickness of the high refracting index material; L is the quarter-wave thickness of the low refracting index material; N represents the total number of layers between bounding half layers of high index of refraction material (0.5 qH); G represents a substrate and A represents air.
摘要翻译： 本发明公开了一种非四分之一波长多层结构，其具有多个交替的低折射率折射率堆叠和高折射率材料堆叠折射率。 多个交替的堆叠可以反射紫外区域中的电磁辐射和可见光区域中的电磁辐射的窄带。 非四分之一波长多层结构，即nLdL <> nHdH <>λ0/ 4可以表示为[A 0.5 qH pL（qH pL）N 0.5 qH G]，其中q和p是四分之一波长厚度的乘数 的高折射率材料和低折射率材料，H是高折射率材料的四分之一波长厚度; L是低折射率材料的四分之一波长厚度; N表示高折射率材料（0.5qH）的界限半层之间的层数总数; G表示底物，A表示空气。
-
公开(公告)号：US20110128616A1
公开(公告)日：2011-06-02
申请号：US13021730
申请日：2011-02-05
申请人： Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
发明人： Debasish Banerjee , Minjuan Zhang , Masahiko Ishii
CPC分类号： G02B5/285 , G02B5/0825 , G02B5/085
摘要： An omnidirectional structural color (OSC) having a non-periodic layered structure. The OSC can include a multilayer stack that has an outer surface and at least two layers. The at least two layers can include at least one first index of refraction material layer A1 and at least one second index of refraction material layer B1. The at least A1 and B1 can be alternately stacked on top of each other with each layer having a predefined thickness dA1 and dB1, respectively. The dA1 is not generally equal to the dB1 such that the multilayer stack has a non-periodic layered structure.
摘要翻译： 具有非周期性分层结构的全向结构颜色（OSC）。 OSC可以包括具有外表面和至少两层的多层堆叠。 所述至少两层可以包括至少一个第一折射材料层A1和至少一个第二折射材料层B1折射率。 至少A1和B1可以交替地堆叠在彼此的顶部，每个层分别具有预定义的厚度dA1和dB1。 dA1通常不等于dB1，使得多层堆叠具有非周期性分层结构。
-
-
-
-
-
-
-
-
-
搜索结果
80 条记录 (耗时 0.023 秒)
