LOW RISK CHLORINE DIOXIDE ONSITE GENERATION SYSTEM

    公开(公告)号:US20190055146A1

    公开(公告)日:2019-02-21

    申请号:US15928749

    申请日:2018-03-22

    Abstract: The present disclosure generally relates to methods of treating process water using a reactor for generating chlorine dioxide onsite. The onsite generation system may include double ensured precursor feeding, effective reactor, automated control/alarm, and effective product delivery. The reactor may include a mixing device, a first feed line connected to the mixing device, and a second feed line connected to the mixing device. The reactor may include a proximal portion in fluid communication with the mixing device and a distal portion in fluid communication with a motive water line. The mixing device, the reactor, a portion of the first feed line, and a portion of the second feed line may be positioned within the motive water line.

    Antifouling compounds used for microbial fouling control

    公开(公告)号:US12195371B2

    公开(公告)日:2025-01-14

    申请号:US17338000

    申请日:2021-06-03

    Abstract: Disclosed herein are antifouling compositions and uses of antifouling compositions for controlling microbial fouling in a system in contact with an aqueous medium. The antifouling compositions comprising an antifouling compound of Formula 1 wherein A is an optionally substituted phenyl, naphthalene, indole, purine, pyridine, quinoline, isoquinoline, pyrimidine, pyrrole, furan, thiophene, imidazole, or thiazole; and Z has the following structure: wherein X is —O—, —N(R10)—, —OC(O)—, —C(O)O—, —N(R10)C(O)—, —C(O)N(R10)—, —OC(O)O—, —OC(O)N(R10)—, —N(R10)C(O)O—, or —N(R10)C(O)N(R10)—; p is an integer from 0 to 10; R6 is hydrogen, alkyl, or aryl; R7 is alkyl, aryl, or —(CH2)z-O—R11; R8 and R9 are independently hydrogen, alkyl or aryl; R10 is hydrogen or alkyl; R11 is hydrogen or alkyl; m is independently an integer from 2 to 20; n is independently an integer from 3 to 20; and z is an integer from 1 to 10, wherein at least one of R8 and R9 are other than hydrogen and wherein the antifouling composition reduces biofilm growth in a system comprising an aqueous medium.

    Low risk chlorine dioxide onsite generation system

    公开(公告)号:US11225421B2

    公开(公告)日:2022-01-18

    申请号:US16674389

    申请日:2019-11-05

    Abstract: The present disclosure generally relates to methods of treating process water using a reactor for generating chlorine dioxide onsite. The onsite generation system may include double ensured precursor feeding, effective reactor, automated control/alarm, and effective product delivery. The reactor may include a mixing device, a first feed line connected to the mixing device, and a second feed line connected to the mixing device. The reactor may include a proximal portion in fluid communication with the mixing device and a distal portion in fluid communication with a motive water line. The mixing device, the reactor, a portion of the first feed line, and a portion of the second feed line may be positioned within the motive water line.

    LOW RISK CHLORINE DIOXIDE ONSITE GENERATION SYSTEM

    公开(公告)号:US20200071203A1

    公开(公告)日:2020-03-05

    申请号:US16674389

    申请日:2019-11-05

    Abstract: The present disclosure generally relates to methods of treating process water using a reactor for generating chlorine dioxide onsite. The onsite generation system may include double ensured precursor feeding, effective reactor, automated control/alarm, and effective product delivery. The reactor may include a mixing device, a first feed line connected to the mixing device, and a second feed line connected to the mixing device. The reactor may include a proximal portion in fluid communication with the mixing device and a distal portion in fluid communication with a motive water line. The mixing device, the reactor, a portion of the first feed line, and a portion of the second feed line may be positioned within the motive water line.

    Apparatus for, System for and Methods of Maintaining Sensor Accuracy
    20.
    发明申请
    Apparatus for, System for and Methods of Maintaining Sensor Accuracy 有权
    用于维护传感器精度的系统和方法的装置

    公开(公告)号:US20160202229A1

    公开(公告)日:2016-07-14

    申请号:US14594625

    申请日:2015-01-12

    CPC classification number: G01N33/18

    Abstract: Methods of maintaining accuracy in the measurement of one or more parameters of industrial water in industrial water systems is disclosed. The methods comprise the use of physical and chemical means to prevent and/or remove deposition from one or more surfaces utilized in measurement of the one or more parameters. The deposition may be caused by, for example, corrosion, fouling, or microbiological growth.

    Abstract translation: 公开了在工业用水系统中测量一个或多个工业用水参数的准确度的方法。 所述方法包括使用物理和化学手段来防止和/或去除在测量一个或多个参数时使用的一个或多个表面的沉积。 沉积可以由例如腐蚀,结垢或微生物生长引起。

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