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    ANTIFOULING COMPOUNDS USED FOR MICROBIAL FOULING CONTROL
    2.
    发明申请
    ANTIFOULING COMPOUNDS USED FOR MICROBIAL FOULING CONTROL 有权

    公开(公告)号：US20210380440A1

    公开(公告)日：2021-12-09

    申请号：US17338000

    申请日：2021-06-03

    Applicant: Ecolab USA Inc.

    Inventor： Ashish Dhawan ,  Kun Xiong ,  Carter Martin Silvernail

    IPC: C02F1/50 ,  C07C43/11

    Abstract: Disclosed herein are antifouling compositions and uses of antifouling compositions for controlling microbial fouling in a system in contact with an aqueous medium. The antifouling compositions comprising an antifouling compound of Formula 1 wherein A is an optionally substituted phenyl, naphthalene, indole, purine, pyridine, quinoline, isoquinoline, pyrimidine, pyrrole, furan, thiophene, imidazole, or thiazole; and Z has the following structure: wherein X is —O—, —N(R10)—, —OC(O)—, —C(O)O—, —N(R10)C(O)—, —C(O)N(R10)—, —OC(O)O—, —OC(O)N(R10)—, —N(R10)C(O)O—, or —N(R10)C(O)N(R10)—; p is an integer from 0 to 10; R6 is hydrogen, alkyl, or aryl; R7 is alkyl, aryl, or —(CH2)z-O—R11; R8 and R9 are independently hydrogen, alkyl or aryl; R10 is hydrogen or alkyl; R11 is hydrogen or alkyl; m is independently an integer from 2 to 20; n is independently an integer from 3 to 20; and z is an integer from 1 to 10, wherein at least one of R8 and R9 are other than hydrogen and wherein the antifouling composition reduces biofilm growth in a system comprising an aqueous medium.

    LOW RISK CHLORINE DIOXIDE ONSITE GENERATION SYSTEM
    5.
    发明申请
    LOW RISK CHLORINE DIOXIDE ONSITE GENERATION SYSTEM 审中-公开

    公开(公告)号：US20180273381A1

    公开(公告)日：2018-09-27

    申请号：US15928435

    申请日：2018-03-22

    Applicant: Ecolab USA Inc.

    Inventor： Kun Xiong ,  Felice DiMascio ,  Nicholas Ryan Denny ,  Shawn Dalke

    IPC: C01B11/02 ,  B01J14/00

    CPC classification number: C01B11/024 ,  B01J14/00 ,  C01B11/026

    Abstract: The present disclosure generally relates to producing chloride dioxide. A chlorine dioxide reactor, methods for producing chlorine dioxide, and treating aqueous systems are disclosed. The reactor may include a mixing device, a first feed line in fluid communication with the mixing device, and a second feed line in fluid communication with the mixing device. The reactor may include a proximal portion in fluid communication with the mixing device and a distal portion in fluid communication with a motive water line. The mixing device, the reactor, a portion of the first feed line, and a portion of the second feed line may be positioned within the motive water line.

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