公开(公告)号：US20210364917A1

公开(公告)日：2021-11-25

申请号：US17386440

申请日：2021-07-27

Applicant: FUJIFILM Corporation

Inventor： Minoru UEMURA ,  Masafumi KOJIMA ,  Akiyoshi GOTO ,  Kei YAMAMOTO ,  Takashi KAWASHIMA

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  C07C381/12 ,  C07C317/28 ,  C07C317/44 ,  C07D327/06 ,  C07C255/17 ,  C07D333/46 ,  C07C311/16 ,  C07C25/02 ,  C07D317/72

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition having excellent storage stability during long-term storage. In addition, also provided are a resist film, a pattern forming method, and a method for manufacturing an electronic device, each relating to the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound represented by General Formula (I) and an acid-decomposable resin. M1+A−-L-B−M2+  (I)

公开(公告)号：US20210088905A1

公开(公告)日：2021-03-25

申请号：US17106170

申请日：2020-11-29

Applicant: FUJIFILM Corporation

Inventor： Masafumi KOJIMA ,  Minoru UEMURA ,  Takashi KAWASHIMA ,  Akiyoshi GOTO ,  Kei YAMAMOTO ,  Kazuhiro MARUMO ,  Keiyu OU

IPC: G03F7/039 ,  G03F7/038 ,  C08L33/10 ,  G03F7/32

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator A that generates an acid represented by General Formula (I), the acid having a pKa of −1.00 or more; one or more selected from the group consisting of a photoacid generator B that generates an acid having a pKa larger than that of an acid generated from the photoacid generator A by 1.00 or more, and a nitrogen-containing compound C having a pKa of a conjugate acid thereof larger than that of the acid generated from the photoacid generator A by 1.00 or more; and an acid-decomposable resin, in which in a case where the actinic ray-sensitive or radiation-sensitive resin composition includes a photoacid generator D that generates an acid having a pKa of less than −1.00, a ratio of the number of moles of the photoacid generator A to the number of moles of the photoacid generator D in the composition, is 1.0 or more.