Abstract:
Provided are a resin composition including a coloring material, a resin, and a solvent, in which, in a case where a film having a thickness of 0.60 μm is formed by heating the resin composition at 200° C. for 30 minutes, a rate of change ΔA in an absorbance of the film after performing a heating treatment of the film at 300° C. for 5 hours in a nitrogen atmosphere, which is represented by Expression (1), is 50% or less; a film formed of the resin composition; a color filter; a solid-state imaging element; and an image display device. In the following expression, ΔA is the rate of change in the absorbance of the film after the heating treatment, A1 is a maximum value of an absorbance of the film before the heating treatment in a wavelength range of 400 to 1100 nm, and A2 is an absorbance of the film after the heating treatment, and is an absorbance at a wavelength showing the maximum value of the absorbance of the film before the heating treatment in a wavelength range of 400 to 1100 nm. ΔA=|100−(A2/A1)×100| (1)
Abstract:
A method of producing a pattern includes a step of forming a photocurable composition layer on a support, using a photocurable composition including a color material and a resin and having an acid value of a solid content of 1 to 25 mgKOH/g; a step of patternwise exposing the photocurable composition layer; and a step of treating the photocurable composition layer in an unexposed area using a developer including an organic solvent, thereby performing development.
Abstract:
Provided is a photosensitive coloring composition with which a pixel having excellent adhesiveness with a support and excellent rectangularity can be formed. In addition, provided is also a method of manufacturing an optical filter including a pixel having excellent adhesiveness with a support and excellent rectangularity. This photosensitive coloring composition is a photosensitive coloring composition for exposure to light having a wavelength of 300 nm or shorter, the photosensitive coloring composition including a coloring material and a curable compound. In a case where a film having a thickness of 0.5 μm after drying is formed using the photosensitive coloring composition, an optical density of the above-described film with respect to light having a wavelength of 248 nm is 1.6 or higher. It is preferable that a content of the coloring material is 50 mass % or higher with respect to a total solid content of the photosensitive coloring composition.
Abstract:
Provided is a composition with which a film having a lower refractive index and reduced defects can be formed. In addition, provided are a film forming method and a method of manufacturing an optical sensor. This composition includes colloidal silica particles and a solvent. In the colloidal silica particles, an average particle size D1 that is measured using a dynamic light scattering method is 25 to 1000 nm and a ratio D1/D2 of the average particle size D1 to an average particle size D2 that is obtained from a specific surface area of the colloidal silica particles measured using a nitrogen adsorption method is 3 or higher. The solvent includes a solvent A1 having a boiling point of 245° C. or higher and a solubility parameter of lower than 11.3 (cal/cm3)0.5 and a solvent A2 having a boiling point of 120° C. or higher and lower than 245° C. and a solubility parameter of 11.3 (cal/cm3)0.5 or higher.
Abstract:
An object of the present invention is to provide a near-infrared-absorbing composition capable of forming a cured film having excellent heat resistance while maintaining strong near-infrared shielding properties when a cured film is produced. The near-infrared-absorbing composition of the present invention includes a copper complex obtained by reacting two or more kinds of sulfonic acids represented by General Formula (I) described below or salts thereof with a copper component and a solvent.