专利检索 ap:("Hideo Kobayashi" OR "Norio Kosuge" OR "Yasuo Yokoyama" OR "Yuka Komori" OR "Taizo Mohri") AND inv:"Yasuo Yokoyama" 第 2 页

11.

发明授权
Method for forming an insulating glass film on a grain-oriented silicon steel sheet having a high magnetic induction 失效
标题翻译：在具有高磁导率的颗粒状硅钢板上形成绝缘玻璃膜的方法

公开(公告)号：US3930906A

公开(公告)日：1976-01-06

申请号：US552029

申请日：1975-02-24

申请人： Toshio Irie , Yasuo Yokoyama , Toshitomo Sugiyama , Hiroshi Shimanaka , Shigeru Kobayashi

发明人： Toshio Irie , Yasuo Yokoyama , Toshitomo Sugiyama , Hiroshi Shimanaka , Shigeru Kobayashi

IPC分类号： H01F1/18 , C21D1/74 , C21D3/04 , C21D8/12 , C23C22/00 , C23D5/00 , H01F1/147 , H01F1/04

CPC分类号： C21D3/04 , C21D1/74 , C21D8/1272 , C23D5/00 , H01F1/14783 , C21D8/1283

摘要： An insulating glass film having an excellent uniformity and a high adhesion to a grain-oriented silicon steel sheet having a high magnetic induction is formed by annealing a coil of a cold rolled silicon steel sheet having a final gauge in an annealing furnace under a non-oxidizing and non-reducing neutral inert gas, such as nitrogen or argon at a constant temperature keeping stage of 800.degree.-920.degree.C and then under dry hydrogen at a temperature of 1,000.degree.-1,200.degree.C in the final annealing stage.