Systems and methods for control of ultra short pulse amplification
    11.
    发明授权
    Systems and methods for control of ultra short pulse amplification 有权
    用于控制超短脉冲放大的系统和方法

    公开(公告)号:US08139910B2

    公开(公告)日:2012-03-20

    申请号:US12259176

    申请日:2008-10-27

    IPC分类号: G02B6/34 G02B5/18

    摘要: A method of controlling an ultra-short pulse system is described comprising controlling an optical power within the ultra-short pulse system and control-system controlling a width of an optical pulse. In some embodiments, the method also comprises tuning a compressor by controlling a number of passes of the optical pulse through a Bragg grating to control the width of the optical pulse output from the compressor. In other embodiments, the method may comprise tuning a multi-pass stretcher by controlling a number of passes of the optical pulse through a loop of the multi-pass stretcher to control the width of the optical pulse output from the multi-pass stretcher. A method of controlling an ultra-short pulse system may also comprise accessing a control system from a remotely located command station, communicating status information from the control system to the command station, and communicating information from the command station to the control system.

    摘要翻译: 描述了一种控制超短脉冲系统的方法,包括控制超短脉冲系统内的光功率和控制光脉冲宽度的控制系统。 在一些实施例中,该方法还包括通过控制通过布拉格光栅的光脉冲的通过次数来调节压缩器,以控制从压缩机输出的光脉冲的宽度。 在其他实施例中,该方法可以包括通过控制多通道担架的环路来控制光脉冲的通过次数来调整多通道担架,以控制从多通道担架输出的光脉冲的宽度。 控制超短脉冲系统的方法还可以包括从远程定位的命令站访问控制系统,将状态信息从控制系统传送到命令站,以及将信息从命令站传送到控制系统。

    Pulse stretcher and compressor including a multi-pass Bragg grating
    12.
    发明授权
    Pulse stretcher and compressor including a multi-pass Bragg grating 有权
    包括多通布拉格光栅的脉冲展宽器和压缩器

    公开(公告)号:US07444049B1

    公开(公告)日:2008-10-28

    申请号:US11615883

    申请日:2006-12-22

    IPC分类号: G02B6/34 G02B5/18

    摘要: A chirped pulse amplification (CPA) system and method is described wherein the pulse is stretched using multiple passes through a Bragg grating or compressed using multiple passes through a Bragg grating. A switch may be used to control the number of passes through the Bragg grating, thus, tuning the compressed or the stretched pulse width. The pulse may be directed through an amplifier between the multiple passes through the Bragg grating to apply amplification to the stretched pulse multiple times. The Bragg grating may include a fiber Bragg grating, a volume Bragg grating, or a Bragg waveguide.

    摘要翻译: 描述了一种啁啾脉冲放大(CPA)系统和方法,其中使用多遍通过布拉格光栅进行脉冲拉伸或使用多次穿过布拉格光栅进行压缩。 可以使用开关来控制通过布拉格光栅的通过次数,从而调谐压缩或拉伸的脉冲宽度。 脉冲可以通过布拉格光栅的多遍之间的放大器引导,以对扩展的脉冲进行多次放大。 布拉格光栅可以包括光纤布拉格光栅,体积布拉格光栅或布拉格波导。

    Method of depositing diamond-like carbon film onto a substrate having a
low melting temperature
    13.
    发明授权
    Method of depositing diamond-like carbon film onto a substrate having a low melting temperature 失效
    将金刚石状碳膜沉积在具有低熔点的基底上的方法

    公开(公告)号:US5171607A

    公开(公告)日:1992-12-15

    申请号:US471849

    申请日:1990-01-29

    申请人: Michael J. Cumbo

    发明人: Michael J. Cumbo

    摘要: A diamond-like carbon film is deposited on an insulating substrate using a solid carbon source evaporated by an electron beam so as to maintain the substrate temperature below about 150.degree. C. in a differentially evacuated chamber containing a selective etchant gas such as hydrogen. In orer to bombard the substrate with positively charged ions while preventing accumulation of a repulsive surface charge, a radio frequency (RF) electric field is applied to a rotating fixture holding the substrate. The differentially evacuated chamber maintains the atmospheric pressure around the solid carbon source at one end of the chamber at a sufficiently low pressure to prevent loss of electron beam energy and thereby enable vaporization of the carbon while maintaining the substrate at the other end of the chamber at a higher pressure which enables the RF electric field to excite an ion gas plasma around the substrate and thereby facilitate deposition of the diamond-like carbon film. In the preferred embodiment, the differentially evacuated chamber has a bypass manifold connected between the two ends of the chamber. A control system responding to pressure sensing apparatus inside the chamber governs the position of a butterfly valve in the bypass manifold to regulate the differential pressure in the chamber. In order to keep the substrate temperature below about 150.degree., the rotating fixture holding the substrate is water-cooled.

    摘要翻译: 使用通过电子束蒸发的固体碳源将金刚石状碳膜沉积在绝缘基板上,以便在含有诸如氢的选择性蚀刻剂气体的差异抽真空室中将基板温度保持在低于约150℃。 为了以正电荷离子轰击衬底,同时防止排斥表面电荷的累积,射频(RF)电场被施加到保持衬底的旋转夹具上。 差异抽真空的腔室在足够低的压力下保持腔体一端的固体碳源周围的大气压力,以防止电子束能量的损失,从而使得能够汽化碳,同时将衬底保持在腔室的另一端 更高的压力使RF电场能够激发衬底周围的离子气体等离子体,从而促进类金刚石碳膜的沉积。 在优选实施例中,差异抽真空室具有连接在腔室两端之间的旁通歧管。 响应于室内的压力感测装置的控制系统控制旁通歧管中的蝶阀的位置,以调节室中的压差。 为了使基板温度保持在150度以下,保持基板的旋转夹具是水冷的。