公开(公告)号：US20100203458A1

公开(公告)日：2010-08-12

申请号：US12670806

申请日：2008-08-19

Applicant: Hubertus Van Aert ,  Pascal Meeus ,  Stefaan Lingier

Inventor： Hubertus Van Aert ,  Pascal Meeus ,  Stefaan Lingier

IPC: G03C5/30 ,  G03C5/29

CPC classification number: G03F7/322

Abstract: A method for developing a printing plate precursor comprising the step of immersing the precursor in an aqueous alkaline developing solution comprising a (co) polymer comprising a monomeric unit which is represented by the following formula (I): wherein L is a linking group; R1, R2 and R3 independently represent hydrogen or an alkyl group; R4 represents an optionally substituted hydroxyaryl group; x=0 or 1; y=0 or 1 and when y=0 then x=1 and L is further bound to C* to form a cyclic structure.

Abstract translation: 一种用于显影印版前体的方法，其包括将前体浸入包含由下式（I）表示的单体单元的（共）聚合物的水性碱性显影溶液的步骤：其中L是连接基团; R1，R2和R3独立地表示氢或烷基; R4表示任选取代的羟基芳基; x = 0或1; y = 0或1，当y = 0时x = 1，L进一步与C *结合形成环状结构。

公开(公告)号：US20060257798A1

公开(公告)日：2006-11-16

申请号：US11413859

申请日：2006-04-28

Applicant: Willi-Kurt Gries ,  Marc Van Damme ,  Mario Boxhorn ,  Pascal Meeus

Inventor： Willi-Kurt Gries ,  Marc Van Damme ,  Mario Boxhorn ,  Pascal Meeus

IPC: G03C5/00

CPC classification number: G03F7/322

Abstract: The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water, comprises at least one alkaline reacting silicate and has a pH of at least 11, characterized in that the developer comprises at least a non-ionic surfactant, wherein the hydrophobic part is an aryl group having in addition to the hydrophilic part at least two substituents different to hydrogen, and the hydrophilic part is a polyethyleneoxy group with at least 6 ethyleneoxy units. The developer leads to less depositions in the developing apparatus and on the processed printing plates and has an increased sedimentation stability.

Abstract translation: 本发明涉及一种用于辐照敏感组合物的碱性显影剂，其显影液基于水，包含至少一种碱性反应硅酸盐，其pH值至少为11，其特征在于显影剂包含至少一种非离子表面活性剂， 其中疏水部分是除了亲水部分之外还具有与氢不同的至少两个取代基的芳基，亲水部分是具有至少6个乙烯氧基单元的聚乙烯氧基。 显影剂在显影装置和加工印刷版上导致较少的沉积，并且具有增加的沉降稳定性。

公开(公告)号：US5593817A

公开(公告)日：1997-01-14

申请号：US594144

申请日：1996-01-31

Applicant: Freddy Henderickx ,  Ann Verbeeck ,  Pascal Meeus ,  Hieronymus Andriessen

Inventor： Freddy Henderickx ,  Ann Verbeeck ,  Pascal Meeus ,  Hieronymus Andriessen

IPC: G03C5/29 ,  G03C5/30 ,  G03C5/305 ,  G03C5/31 ,  G03C5/38 ,  G03C8/36

CPC classification number: G03C8/365 ,  G03C5/30 ,  G03C5/305 ,  G03C5/31 ,  G03C5/383

Abstract: A photographic developing solution and a method of developing silver halide materials in the said developing solution is disclosed, the said developing solution comprising hydroquinone in an amount from 0 to 30 g per litre, an auxiliary developer, and silver halide complexing agents in an amount from 0 to 50 g per litre, characterized in that said developer further comprisesin amounts from 0.1 to 5 g per litre a compound corresponding to the formula (I), accompanied by charge compensating anions,Z'N.sup.+ --R--N.sup.+ Z" (I)wherein at least divalent group R contains at least one oxyethylene group and wherein Z' and Z", being the same or different, are composed of enough atoms to form a heterocyclic aromatic 5- or 6-ring;andat least 1 g of a compound corresponding to the formula (II), a precursor thereof, a derivative thereof and/or a metal salt thereof ##STR1## wherein each of A, B and D independently represents an oxygen atom or NR.sup.1 ;X represents an oxygen atom, a sulphur atom, NR.sup.2 ; CR.sup.3 R.sup.4 ;C=O; C=NR.sup.5 or C=S;Y represents an oxygen atom, a sulphur atom, NR.sup.'2 ; CR.sup.'3 R.sup.'4 ; C=O, C=NR.sup.'5 or C=S;Z represents an oxygen atom, a sulphur atom, NR.sup."2 ; CR.sup."3 R.sup."4 ; C=O; C=NR.sup."5 or C=S;n equals 0, 1 or 2;each of R.sup.1 to R.sup.5, R.sup.'1 to R.sup.'5 and R.sup."1 to R.sup."5 independently represents hydrogen, alkyl, aralkyl, hydroxyalkyl, carboxyalkyl; alkenyl, alkynyl, cycloalkyl, cycloalkenyl, aryl or heterocyclyl;and whereinR.sup.3 and R.sup.4, R.sup.'3 and R.sup.'4, R.sup."3 and R.sup."4, may further form together a ring; andwherein in the case that X=CR.sup.3 R.sup.4 and Y=CR.sup.'3 R.sup.'4, R.sup.3 and R.sup.'3 and/or R.sup.4 and R.sup.'4 may form a ring and wherein in the case that Y=CR.sup.'3 R.sup.'4 and Z=CR.sup."3 R.sup."4 with n=1 or 2, R.sup.'3 and R.sup."3 and/or R.sup.'4 and R.sup."4 may form a ring.

公开(公告)号：US07186498B2

公开(公告)日：2007-03-06

申请号：US10956871

申请日：2004-10-01

Applicant: Willi-Kurt Gries ,  Marc Van Damme ,  Pascal Meeus ,  Mario Boxhorn

Inventor： Willi-Kurt Gries ,  Marc Van Damme ,  Pascal Meeus ,  Mario Boxhorn

IPC: G03F7/32

CPC classification number: G03F7/322

Abstract: The invention relates to an alkaline developer for irradiated radiation sensitive compositions, which developer is based on water and at least one inorganic salt having an alkaline reaction, wherein the developer has a pH of at least 11 and comprises at least three structurally different surfactants of formulae (A), (B) and (C), characterised in that the surfactant of formula (A) has one anionic group, the surfactant of formula (B) has two anionic groups, the surfactant of formula (C) is non-ionic and has at least one non-ionic hydrophilic group, and the concentration of each of the surfactants of formulae (A), (B) and (C) in the developer is at least 0.05 weight-% based on the total weight of the developer. The developer leads to less depositions and has a superior stability when used.

Abstract translation: 本发明涉及一种用于辐照敏感组合物的碱性显影剂，该显色剂基于水和至少一种具有碱性反应的无机盐，其中显影剂的pH至少为11，并且包含至少三种结构不同的式 （A），（B）和（C），其特征在于式（A）的表面活性剂具有一个阴离子基团，式（B）的表面活性剂具有两个阴离子基团，式（C）的表面活性剂是非离子的 并且具有至少一个非离子亲水基团，并且显影剂中式（A），（B）和（C）的每种表面活性剂的浓度相对于显影剂的总重量为至少0.05重量％ 。 开发人员的沉积少，在使用时具有优异的稳定性。