利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

38 条记录 (耗时 0.022 秒)

    FLUID TREATMENT SYSTEM
    11.
    发明申请
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号：US20110180723A1

    公开(公告)日：2011-07-28

    申请号：US13054701

    申请日：2009-07-15

    申请人： Michael Sasges ,  Jim Fraser

    发明人： Michael Sasges ,  Jim Fraser

    IPC分类号： B01J19/12

    CPC分类号： A23L3/26 ,  A23C3/07 ,  A23C3/076 ,  A23L2/50 ,  A23L3/28 ,  A61L2/08 ,  A61L2/10 ,  A61L2202/122 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/328

    摘要： There is described a fluid treatment system in which fluid to be treated is impinged under pressure on a radiation emitting surface. The fluid treatment system includes at least one radiation source having a radiation emitting surface and at least one nozzle element having a fluid discharge opening spaced from the radiation emitting surface. The fluid discharge opening is configured to impinge fluid to be treated on to at least a portion of the radiation emitting surface. The fluid treatment system is well suited to treating low transmittance fluid.

    摘要翻译： 描述了一种流体处理系统，其中待处理的流体在压力下撞击在辐射发射表面上。 流体处理系统包括具有辐射发射表面的至少一个辐射源和具有与辐射发射表面间隔开的流体排放口的至少一个喷嘴元件。 流体排放口构造成将待处理的流体冲击到辐射发射表面的至少一部分。 流体处理系统非常适合于处理低透光率液体。

    FLUID TREATMENT SYSTEM
    12.
    发明申请
    FLUID TREATMENT SYSTEM 失效
    流体处理系统

    公开(公告)号：US20090294689A1

    公开(公告)日：2009-12-03

    申请号：US12158835

    申请日：2006-12-21

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： G01N23/12 ,  G21G5/00

    CPC分类号： A61L2/10 ,  C02F1/325 ,  C02F2201/004 ,  C02F2303/14

    摘要： There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve—e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

    摘要翻译： 描述了可以与不需要保护套筒（例如准分子辐射源）的辐射源一起使用的流体处理系统。 本发明的流体系统处理的优点是可以从流体处理区域去除辐射源，而不必关闭流体处理系统，去除流体，破坏保持流体密封性的密封件，更换/使用辐射源和 反转步骤。 相反，本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

    Fluid treatment system
    13.
    发明授权
    Fluid treatment system 有权
    流体处理系统

    公开(公告)号：US08766211B2

    公开(公告)日：2014-07-01

    申请号：US13054701

    申请日：2009-07-15

    申请人： Michael Sasges ,  Jim Fraser

    发明人： Michael Sasges ,  Jim Fraser

    IPC分类号： A61L2/10

    CPC分类号： A23L3/26 ,  A23C3/07 ,  A23C3/076 ,  A23L2/50 ,  A23L3/28 ,  A61L2/08 ,  A61L2/10 ,  A61L2202/122 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/328

    摘要： There is described a fluid treatment system in which fluid to be treated is impinged under pressure on a radiation emitting surface. The fluid treatment system includes at least one radiation source having a radiation emitting surface and at least one nozzle element having a fluid discharge opening spaced from the radiation emitting surface. The fluid discharge opening is configured to impinge fluid to be treated on to at least a portion of the radiation emitting surface. The fluid treatment system is well suited to treating low transmittance fluid.

    摘要翻译： 描述了一种流体处理系统，其中待处理的流体在压力下撞击在辐射发射表面上。 流体处理系统包括具有辐射发射表面的至少一个辐射源和具有与辐射发射表面间隔开的流体排放口的至少一个喷嘴元件。 流体排放口构造成将待处理的流体冲击到辐射发射表面的至少一部分。 流体处理系统非常适合于处理低透光率液体。

    EXCIMER RADIATION LALMP ASSEMBLY, AND SOURCE MODULE AND FLUID TREATMENT SYSTEM CONTAINING SAME
    15.
    发明申请
    EXCIMER RADIATION LALMP ASSEMBLY, AND SOURCE MODULE AND FLUID TREATMENT SYSTEM CONTAINING SAME 有权
    EXCIMER辐射灯组件，以及包含其的源模块和流体处理系统

    公开(公告)号：US20090101835A1

    公开(公告)日：2009-04-23

    申请号：US12158849

    申请日：2006-12-21

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： G01N23/12

    CPC分类号： H01J61/70 ,  A61L2/10 ,  C02F1/325 ,  C02F2201/3223 ,  H01J61/52 ,  H01J65/046

    摘要： There is described an excimer radiation lamp assembly. The lamp assembly comprises: an elongate member having an annular cross-section to define an elongate passageway aligned with a longitudinal axis of the lamp assembly; an electrode element in electrical connection with at least a portion of the elongate passageway; and a cooling element disposed in the elongate passageway, the cooling element being electrically isolated with respect to the electrode element.

    摘要翻译： 描述了准分子辐射灯组件。 灯组件包括：细长构件，其具有环形横截面以限定与灯组件的纵向轴线对齐的细长通道; 与所述细长通道的至少一部分电连接的电极元件; 以及设置在所述细长通道中的冷却元件，所述冷却元件相对于所述电极元件电隔离。

    Ultraviolet radiation lamp and source module and treatment system containing same
    16.
    发明授权
    Ultraviolet radiation lamp and source module and treatment system containing same 有权
    紫外线辐射灯和源模块及包含其的处理系统

    公开(公告)号：US08338808B2

    公开(公告)日：2012-12-25

    申请号：US11915154

    申请日：2006-05-15

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： A61N5/06 ,  G01J3/10 ,  H05G2/00

    CPC分类号： H01J61/52 ,  C02F1/32 ,  C02F2201/004 ,  H01J61/20

    摘要： The present invention relates to an ultraviolet radiation lamp. The lamp comprises: (i) a substantially sealed cavity comprising a mercury-containing material; and (ii) a heating unit disposed exteriorly with respect to the cavity. The heating unit is disposed in contact with a first portion of the cavity comprising the mercury-containing material. The heating unit has adjustable heat output.

    摘要翻译： 本发明涉及紫外线辐射灯。 灯包括：（i）包含含汞材料的基本上密封的空腔; 和（ii）相对于空腔设置在外部的加热单元。 加热单元设置成与包含含汞材料的空腔的第一部分接触。 加热单元具有可调节的热量输出。

    Fluid treatment system
    17.
    发明授权
    Fluid treatment system 失效
    流体处理系统

    公开(公告)号：US07985956B2

    公开(公告)日：2011-07-26

    申请号：US12158835

    申请日：2006-12-21

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： G01N23/12

    CPC分类号： A61L2/10 ,  C02F1/325 ,  C02F2201/004 ,  C02F2303/14

    摘要： There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve—e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

    摘要翻译： 描述了可以与不需要保护套筒（例如准分子辐射源）的辐射源一起使用的流体处理系统。 本发明的流体系统处理的优点是可以从流体处理区域去除辐射源，而不必关闭流体处理系统，去除流体，破坏保持流体密封性的密封件，更换/使用辐射源和 反转步骤。 相反，本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

    Excimer radiation lamp assembly, and source module and fluid treatment system containing same
    18.
    发明授权
    Excimer radiation lamp assembly, and source module and fluid treatment system containing same 有权
    准分子辐射灯组件，以及包含其的源模块和流体处理系统

    公开(公告)号：US07960705B2

    公开(公告)日：2011-06-14

    申请号：US12158849

    申请日：2006-12-21

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： G01N23/12

    CPC分类号： H01J61/70 ,  A61L2/10 ,  C02F1/325 ,  C02F2201/3223 ,  H01J61/52 ,  H01J65/046

    摘要： There is described an excimer radiation lamp assembly. The lamp assembly comprises: an elongate member having an annular cross-section to define an elongate passageway aligned with a longitudinal axis of the lamp assembly; an electrode element in electrical connection with at least a portion of the elongate passageway; and a cooling element disposed in the elongate passageway, the cooling element being electrically isolated with respect to the electrode element.

    摘要翻译： 描述了准分子辐射灯组件。 灯组件包括：细长构件，其具有环形横截面以限定与灯组件的纵向轴线对齐的细长通道; 与所述细长通道的至少一部分电连接的电极元件; 以及设置在所述细长通道中的冷却元件，所述冷却元件相对于所述电极元件电隔离。

    Ultraviolet radiation light emitting diode device
    19.
    发明授权
    Ultraviolet radiation light emitting diode device 有权
    紫外线发射二极管装置

    公开(公告)号：US07842932B2

    公开(公告)日：2010-11-30

    申请号：US12131485

    申请日：2008-06-02

    申请人： Douglas G. Knight ,  Jim Fraser ,  Michael Sasges

    发明人： Douglas G. Knight ,  Jim Fraser ,  Michael Sasges

    IPC分类号： A61L2/10 ,  C02F1/32

    CPC分类号： A61L2/10 ,  A23C3/076 ,  H01L33/405 ,  H01L2224/14

    摘要： There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.

    摘要翻译： 公开了一种紫外线照射装置。 该装置包括基部，连接到基部的多个半导体结构以及连接到多个半导体结构的紫外线透射元件。 优选地：（i）至少一个发光二极管与紫外线辐射透明元件直接接触，或者（ii）至少一个发光二极管和紫外线辐射透明元件之间存在间隔，该间隔基本上 完全没有空气。 还公开了结合有紫外线辐射装置的流体处理系统。