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    RADIATION LAMP AND RADIATION SOURCE MODULE INCORPORATING SAME
    1.
    发明申请
    RADIATION LAMP AND RADIATION SOURCE MODULE INCORPORATING SAME 有权
    辐射灯和辐射源模块并入

    公开(公告)号：US20110227473A1

    公开(公告)日：2011-09-22

    申请号：US12094774

    申请日：2006-11-22

    申请人： Joseph Elku ,  Jim Fraser ,  Michael Sasges ,  Michael D. Rodgers

    发明人： Joseph Elku ,  Jim Fraser ,  Michael Sasges ,  Michael D. Rodgers

    IPC分类号： H01J5/60

    CPC分类号： A61L2/10 ,  C02F1/325 ,  C02F2201/004 ,  H01J5/60 ,  H01K1/465 ,  H01R13/6273 ,  H01R33/06 ,  H01R33/942

    摘要： A lamp device is disclosed. The lamp device comprises a first electrical connector and a second electrical connector located at a first end portion of the lamp device. The first end portion of the lamp device is received in a receptacle of a first base portion. A first locking portion is included for secunng the first base portion to the first end portion. The present radiation lamp device obviates or mitigates the need to use adhesive and/or polymer insulation/O-rings to achieve electrical connections. Further, the present radiation lamp may be oriented in a vertical orientation without the need to use springs and/or rubber part to support the distal end of the lamp.

    摘要翻译： 公开了一种灯装置。 灯装置包括位于灯装置的第一端部处的第一电连接器和第二电连接器。 灯装置的第一端部被容纳在第一基部的插座中。 包括第一锁定部分以将第一基部分隔开到第一端部。 本辐射灯装置消除或减轻了使用粘合剂和/或聚合物绝缘/ O形环实现电连接的需要。 此外，本辐射灯可以以垂直方向定向，而不需要使用弹簧和/或橡胶部分来支撑灯的远端。

    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME
    2.
    发明申请
    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME 有权
    ULTRAVIOLET辐射灯和源模块及其处理系统

    公开(公告)号：US20090065413A1

    公开(公告)日：2009-03-12

    申请号：US11915154

    申请日：2006-05-15

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： A61L2/10 ,  H01J61/52

    CPC分类号： H01J61/52 ,  C02F1/32 ,  C02F2201/004 ,  H01J61/20

    摘要： The present invention relates to an ultraviolet radiation lamp. The lamp comprises: (i) a substantially sealed cavity comprising a mercury-containing material; and (ii) a heating unit disposed exteriorly with respect to the cavity. The heating unit is disposed in contact with a first portion of the cavity comprising the mercury-containing material. The heating unit has adjustable heat output.

    摘要翻译： 本发明涉及紫外线辐射灯。 灯包括：（i）包含含汞材料的基本上密封的空腔; 和（ii）相对于空腔设置在外部的加热单元。 加热单元设置成与包含含汞材料的空腔的第一部分接触。 加热单元具有可调节的热量输出。

    ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE
    3.
    发明申请
    ULTRAVIOLET RADIATION LIGHT EMITTING DIODE DEVICE 审中-公开
    超紫外线辐射发光二极管器件

    公开(公告)号：US20110089347A1

    公开(公告)日：2011-04-21

    申请号：US12955212

    申请日：2010-11-29

    申请人： DOUGLAS G. KNIGHT ,  Jim Fraser ,  Michael Sasges

    发明人： DOUGLAS G. KNIGHT ,  Jim Fraser ,  Michael Sasges

    IPC分类号： G21K5/00

    CPC分类号： A61L2/10 ,  A23C3/076 ,  H01L33/405 ,  H01L2224/14

    摘要： There is disclosed an ultraviolet radiation device. The device comprises a base portion, a plurality of semiconductor structures connected to the base portion and an ultraviolet radiation transparent element connected to the plurality of semiconductor structures. Preferably: (i) the at least one light emitting diode is in direct contact with the ultraviolet radiation transparent element, or (ii) there is a spacing between the at least one light emitting diode and the ultraviolet radiation transparent element, the spacing being substantially completely free of air. There is also disclosed a fluid treatment system incorporating the ultraviolet radiation device.

    摘要翻译： 公开了一种紫外线照射装置。 该装置包括基部，连接到基部的多个半导体结构以及连接到多个半导体结构的紫外线透射元件。 优选地：（i）至少一个发光二极管与紫外线辐射透明元件直接接触，或者（ii）至少一个发光二极管和紫外线辐射透明元件之间存在间隔，该间隔基本上 完全没有空气。 还公开了结合有紫外线辐射装置的流体处理系统。

    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME
    4.
    发明申请
    ULTRAVIOLET RADIATION LAMP AND SOURCE MODULE AND TREATMENT SYSTEM CONTAINING SAME 有权
    ULTRAVIOLET辐射灯和源模块及其处理系统

    公开(公告)号：US20090090667A1

    公开(公告)日：2009-04-09

    申请号：US12065501

    申请日：2006-08-31

    申请人： Jim Fraser ,  Joseph Elku ,  Michael Sasges

    发明人： Jim Fraser ,  Joseph Elku ,  Michael Sasges

    IPC分类号： H01J61/52 ,  B03C1/02

    CPC分类号： H01J61/523 ,  C02F1/325 ,  C02F2201/326 ,  C02F2209/02 ,  G05D23/22 ,  H01J61/56

    摘要： The invention relates to an ultraviolet radiation lamp. The lamp comprises a substantially sealed cavity comprising a mercury-containing material; a filament disposed in the sealed cavity; and an electrical control element in contact with the filament, the electrical control element configured to adjust or maintain a temperature of the mercury-containing material with respect to a prescribed temperature. Such a constructions allows the present ultraviolet radiation lamp to be operated at optimal efficiency without the need to use additional components to add heat to and/or remove heat from the mercury-containing material.

    摘要翻译： 本发明涉及一种紫外线辐射灯。 该灯包括包含含汞材料的基本上密封的空腔; 设置在密封空腔中的细丝; 以及与灯丝接触的电气控制元件，所述电气控制元件构造成调节或维持含汞材料相对于规定温度的温度。 这种结构允许本发明的紫外线辐射灯以最佳的效率运行，而不需要使用额外的部件来加热和/或从含汞材料中去除热量。

    FLUID TREATMENT SYSTEM
    6.
    发明申请
    FLUID TREATMENT SYSTEM 有权
    流体处理系统

    公开(公告)号：US20110180723A1

    公开(公告)日：2011-07-28

    申请号：US13054701

    申请日：2009-07-15

    申请人： Michael Sasges ,  Jim Fraser

    发明人： Michael Sasges ,  Jim Fraser

    IPC分类号： B01J19/12

    CPC分类号： A23L3/26 ,  A23C3/07 ,  A23C3/076 ,  A23L2/50 ,  A23L3/28 ,  A61L2/08 ,  A61L2/10 ,  A61L2202/122 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/328

    摘要： There is described a fluid treatment system in which fluid to be treated is impinged under pressure on a radiation emitting surface. The fluid treatment system includes at least one radiation source having a radiation emitting surface and at least one nozzle element having a fluid discharge opening spaced from the radiation emitting surface. The fluid discharge opening is configured to impinge fluid to be treated on to at least a portion of the radiation emitting surface. The fluid treatment system is well suited to treating low transmittance fluid.

    摘要翻译： 描述了一种流体处理系统，其中待处理的流体在压力下撞击在辐射发射表面上。 流体处理系统包括具有辐射发射表面的至少一个辐射源和具有与辐射发射表面间隔开的流体排放口的至少一个喷嘴元件。 流体排放口构造成将待处理的流体冲击到辐射发射表面的至少一部分。 流体处理系统非常适合于处理低透光率液体。

    FLUID TREATMENT SYSTEM
    7.
    发明申请
    FLUID TREATMENT SYSTEM 失效
    流体处理系统

    公开(公告)号：US20090294689A1

    公开(公告)日：2009-12-03

    申请号：US12158835

    申请日：2006-12-21

    申请人： Jim Fraser ,  Michael Sasges

    发明人： Jim Fraser ,  Michael Sasges

    IPC分类号： G01N23/12 ,  G21G5/00

    CPC分类号： A61L2/10 ,  C02F1/325 ,  C02F2201/004 ,  C02F2303/14

    摘要： There is described a fluid treatment system which may which may be used with radiation sources that do not require a protective sleeve—e.g., excimer radiation sources. An advantage of the present fluid system treatment is that the radiation sources may be removed from the fluid treatment zone without necessarily having to shut down the fluid treatment system, remove the fluid, break the seals which retain fluid tightness, replace/service radiation source and than reverse the steps. Instead, the present fluid treatment system allows for service/replacement of the radiation sources in the fluid treatment zone during operation of the fluid treatment system.

    摘要翻译： 描述了可以与不需要保护套筒（例如准分子辐射源）的辐射源一起使用的流体处理系统。 本发明的流体系统处理的优点是可以从流体处理区域去除辐射源，而不必关闭流体处理系统，去除流体，破坏保持流体密封性的密封件，更换/使用辐射源和 反转步骤。 相反，本流体处理系统允许在流体处理系统的操作期间对流体处理区域中的辐射源进行维修/更换。

    Fluid treatment system
    8.
    发明授权
    Fluid treatment system 有权
    流体处理系统

    公开(公告)号：US08766211B2

    公开(公告)日：2014-07-01

    申请号：US13054701

    申请日：2009-07-15

    申请人： Michael Sasges ,  Jim Fraser

    发明人： Michael Sasges ,  Jim Fraser

    IPC分类号： A61L2/10

    CPC分类号： A23L3/26 ,  A23C3/07 ,  A23C3/076 ,  A23L2/50 ,  A23L3/28 ,  A61L2/08 ,  A61L2/10 ,  A61L2202/122 ,  C02F1/325 ,  C02F2201/3227 ,  C02F2201/328

    摘要： There is described a fluid treatment system in which fluid to be treated is impinged under pressure on a radiation emitting surface. The fluid treatment system includes at least one radiation source having a radiation emitting surface and at least one nozzle element having a fluid discharge opening spaced from the radiation emitting surface. The fluid discharge opening is configured to impinge fluid to be treated on to at least a portion of the radiation emitting surface. The fluid treatment system is well suited to treating low transmittance fluid.

    摘要翻译： 描述了一种流体处理系统，其中待处理的流体在压力下撞击在辐射发射表面上。 流体处理系统包括具有辐射发射表面的至少一个辐射源和具有与辐射发射表面间隔开的流体排放口的至少一个喷嘴元件。 流体排放口构造成将待处理的流体冲击到辐射发射表面的至少一部分。 流体处理系统非常适合于处理低透光率液体。

    Ultraviolet radiation lamp and source module and treatment system containing same
    9.
    发明授权
    Ultraviolet radiation lamp and source module and treatment system containing same 有权
    紫外线辐射灯和源模块及包含其的处理系统

    公开(公告)号：US08318007B2

    公开(公告)日：2012-11-27

    申请号：US12065501

    申请日：2006-08-31

    申请人： Jim Fraser ,  Joseph Elku ,  Michael Sasges

    发明人： Jim Fraser ,  Joseph Elku ,  Michael Sasges

    IPC分类号： B01D17/12 ,  C02F1/30 ,  H01J7/24

    CPC分类号： H01J61/523 ,  C02F1/325 ,  C02F2201/326 ,  C02F2209/02 ,  G05D23/22 ,  H01J61/56

    摘要： The invention relates to an ultraviolet radiation lamp. The lamp comprises a substantially sealed cavity comprising a mercury-containing material; a filament disposed in the sealed cavity; and an electrical control element in contact with the filament, the electrical control element configured to adjust or maintain a temperature of the mercury-containing material with respect to a prescribed temperature. Such a constructions allows the present ultraviolet radiation lamp to be operated at optimal efficiency without the need to use additional components to add heat to and/or remove heat from the mercury-containing material.

    摘要翻译： 本发明涉及一种紫外线辐射灯。 该灯包括包含含汞材料的基本上密封的空腔; 设置在密封空腔中的细丝; 以及与灯丝接触的电气控制元件，所述电气控制元件构造成调节或维持含汞材料相对于规定温度的温度。 这种结构允许本发明的紫外线辐射灯以最佳的效率运行，而不需要使用额外的部件来加热和/或从含汞材料中去除热量。