公开(公告)号：US11410291B2

公开(公告)日：2022-08-09

申请号：US16921812

申请日：2020-07-06

Applicant: KLA Corporation

Inventor： Prasanti Uppaluri ,  Rajesh Manepalli ,  Ashok V. Kulkarni ,  Saibal Banerjee ,  John Kirkland

IPC: G06T7/00 ,  H01L21/66

Abstract: A method includes receiving one or more sets of wafer data, identifying one or more primitives from one or more shapes in one or more layers in the one or more sets of wafer data, classifying each of the one or more primitives as a particular primitive type, identifying one or more primitive characteristics for each of the one or more primitives, generating a primitive database of the one or more primitives, generating one or more rules based on the primitive database, receiving one or more sets of design data, applying the one or more rules to the one or more sets of design data to identify one or more critical areas, and generating one or more wafer inspection recipes including the one or more critical areas for an inspection sub-system.

公开(公告)号：US11114324B2

公开(公告)日：2021-09-07

申请号：US16653939

申请日：2019-10-15

Applicant: KLA Corporation

Inventor： Martin Plihal ,  Erfan Soltanmohammadi ,  Prasanti Uppaluri ,  Mohit Jani ,  Chris Maher

IPC: H01L21/67 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  H01J37/28 ,  G06T7/00 ,  G06T7/11 ,  H01J37/22 ,  G03F7/20

Abstract: Systems and methods for detecting defect candidates on a specimen are provided. One method includes, after scanning of at least a majority of a specimen is completed, applying one or more segmentation methods to at least a substantial portion of output generated during the scanning thereby generating two or more segments of the output. The method also includes separately detecting outliers in the two or more segments of the output. In addition, the method includes detecting defect candidates on the specimen by applying one or more predetermined criteria to results of the separately detecting to thereby designate a portion of the detected outliers as the defect candidates.

公开(公告)号：US20200328104A1

公开(公告)日：2020-10-15

申请号：US16653939

申请日：2019-10-15

Applicant: KLA Corporation

Inventor： Martin Plihal ,  Erfan Soltanmohammadi ,  Prasanti Uppaluri ,  Mohit Jani ,  Chris Maher

IPC: H01L21/67 ,  G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  H01J37/28 ,  H01J37/22 ,  G06T7/00 ,  G06T7/11

Abstract: Systems and methods for detecting defect candidates on a specimen are provided. One method includes, after scanning of at least a majority of a specimen is completed, applying one or more segmentation methods to at least a substantial portion of output generated during the scanning thereby generating two or more segments of the output. The method also includes separately detecting outliers in the two or more segments of the output. In addition, the method includes detecting defect candidates on the specimen by applying one or more predetermined criteria to results of the separately detecting to thereby designate a portion of the detected outliers as the defect candidates.