公开(公告)号：US09395625B2

公开(公告)日：2016-07-19

申请号：US14381352

申请日：2013-02-25

Applicant: KURARAY CO., LTD.

Inventor： Akinobu Takeda ,  Takashi Fukumoto ,  Osamu Nakayama

IPC: C07D275/04 ,  C07D275/06 ,  G03F7/038 ,  C08F20/38 ,  G03F7/039 ,  C08F228/02 ,  C08F128/06

CPC classification number: G03F7/038 ,  C07D275/04 ,  C07D275/06 ,  C08F20/38 ,  C08F128/06 ,  C08F228/02 ,  G03F7/0397

Abstract: Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.

Abstract translation: 本发明提供一种丙烯酸酯衍生物，其用作半导体用光致抗蚀剂组合物中所含的聚合物的构成单元时，显示出优异的光刻特性如LWR等。 具体地，提供由以下通式（1）表示的丙烯酸酯衍生物。 另外，作为丙烯酸酯衍生物的中间体及其制造方法， 含有丙烯酸酯衍生物作为构成单元的聚合物; 以及含有该聚合物的半导体的光致抗蚀剂组合物。 其中，R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9，R 10，R 11，R 12，R 13，m，x和y如说明书的文字所定义。