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    Metal particle composition, method for producing metal particle composition, and paste
    2.
    发明授权
    Metal particle composition, method for producing metal particle composition, and paste 有权

    公开(公告)号：US12221550B2

    公开(公告)日：2025-02-11

    申请号：US17792009

    申请日：2021-06-30

    Applicant: KURARAY CO., LTD.

    Inventor： Yuki Nishijima ,  Daiki Noguchi ,  Takashi Fukumoto

    IPC: C09D11/52 ,  B22F1/102 ,  C09C1/62 ,  C09C3/08 ,  C09D11/037 ,  H01B1/22

    Abstract: To provide a metal particle composition having excellent oxidation resistance, which does not require a transition metal catalyst and can be applied to existing metal particles, a method for producing the metal particle composition, and a paste. The metal particle composition contains, with respect to 100 parts by mass of metal particles, 0.1 to 5 parts by mass of a compound (A) having a structure represented by the following general formula (I): in which R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, or an aralkyl group, R3 and R4 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkoxy group, an alkenyl group having 2 to 6 carbon atoms, an alkenyloxy group, an aryl group, or an aralkyl group.

    Polymer, oxygen absorber using same, and curable composition
    3.
    发明授权
    Polymer, oxygen absorber using same, and curable composition 有权

    公开(公告)号：US12138615B2

    公开(公告)日：2024-11-12

    申请号：US17601998

    申请日：2020-02-20

    Applicant: KURARAY CO., LTD.

    Inventor： Daiki Noguchi ,  Takashi Fukumoto ,  Yuki Nishijima

    IPC: B01J20/26 ,  B01D53/02 ,  B01D53/14 ,  B01J20/22 ,  B01J20/30 ,  C08G59/20 ,  C08G59/62 ,  C08G65/00 ,  C08G65/24 ,  C08G65/26

    Abstract: A polymer represented by the following general formula (I): wherein X1, X2, and X3 each represent a chalcogen atom, R1 and R2 each independently represent any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 18 carbon atoms, an alkenyl group having 2 to 18 carbon atoms, and an aralkyl group, R3 and R4 each independently represent any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group, R5 and R6 each independently represent any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group, R7 represents a hydrogen atom or a methyl group, R8 represents any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group, n is any integer, and none of R3, R4, R5, and R6 are bonded to each other to form a ring structure.

    Composition having excellent coating properties
    7.
    发明授权
    Composition having excellent coating properties 有权

    公开(公告)号：US11795253B2

    公开(公告)日：2023-10-24

    申请号：US17417310

    申请日：2019-12-18

    Applicant: KURARAY CO., LTD.

    Inventor： Issei Oida ,  Daiki Noguchi ,  Takashi Fukumoto

    IPC: C08F222/10 ,  C08F2/48 ,  C08F216/04 ,  C08F220/32 ,  C09D4/00

    CPC classification number: C08F222/1065 ,  C08F2/48 ,  C08F216/04 ,  C08F220/32 ,  C09D4/00

    Abstract: The present invention relates to a composition containing a compound (A) represented by the following general formula (I) and a compound having two or more polymerizable functional groups (B) in a molecule (except for compound (A)), wherein a mass ratio ((A)/(B)) of the compound (A) to the compound having two or more polymerizable functional groups (B) in a multi-molecule is 30/70 to 50/50:




    wherein, R1 and R2 each independently represent any one selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R3 represents any one selected from the group consisting of an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R4 represents any one selected from the group consisting of a (meth)acryloyl group, a styryl group, and an alkenyl group having 2 to 6 carbon atoms; and n represents any integer of 1 to 5.

    ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION
    8.
    发明申请
    ACRYLIC ACID ESTER DERIVATIVE AND METHOD FOR PRODUCING SAME, INTERMEDIATE AND METHOD FOR PRODUCING SAME, HIGH-MOLECULAR-WEIGHT COMPOUND, AND PHOTORESIST COMPOSITION 有权
    丙烯酸酯衍生物及其生产方法，中间体及其生产方法，高分子量化合物和光电组合物

    公开(公告)号：US20150037733A1

    公开(公告)日：2015-02-05

    申请号：US14381352

    申请日：2013-02-25

    Applicant: KURARAY CO., LTD.

    Inventor： Akinobu Takeda ,  Takashi Fukumoto ,  Osamu Nakayama

    IPC: G03F7/038 ,  C08F128/06 ,  C07D275/06

    CPC classification number: G03F7/038 ,  C07D275/04 ,  C07D275/06 ,  C08F20/38 ,  C08F128/06 ,  C08F228/02 ,  G03F7/0397

    Abstract: Provided is an acrylic acid ester derivative which, when used as a constituent unit of a polymer which is included in a photoresist composition for a semiconductor, exhibits excellent lithography characteristics such as LWR and the like. Specifically, provided is an acrylic acid ester derivative represented by the following general formula (1). Furthermore, provided are an intermediate of the acrylic acid ester derivative and a process for producing the same; a polymer containing the acrylic acid ester derivative as a constituent unit; and a photoresist composition for a semiconductor containing the polymer. wherein, R1, R2, R3, R4, R5, R6, R7, R8, R9, R10, R11, R12, R13, m, x, and y are as defined in the text of Description.

    Abstract translation: 本发明提供一种丙烯酸酯衍生物，其用作半导体用光致抗蚀剂组合物中所含的聚合物的构成单元时，显示出优异的光刻特性如LWR等。 具体地，提供由以下通式（1）表示的丙烯酸酯衍生物。 另外，作为丙烯酸酯衍生物的中间体及其制造方法， 含有丙烯酸酯衍生物作为构成单元的聚合物; 以及含有该聚合物的半导体的光致抗蚀剂组合物。 其中，R 1，R 2，R 3，R 4，R 5，R 6，R 7，R 8，R 9，R 10，R 11，R 12，R 13，m，x和y如说明书的文字所定义。

    Oxygen absorbing agent
    10.
    发明授权
    Oxygen absorbing agent 有权

    公开(公告)号：US11174368B2

    公开(公告)日：2021-11-16

    申请号：US16343802

    申请日：2017-10-25

    Applicant: KURARAY CO., LTD.

    Inventor： Daiki Noguchi ,  Akinobu Takeda ,  Takashi Fukumoto

    IPC: C08K5/1515 ,  C07D303/18 ,  C08K5/00 ,  C08L101/00 ,  B01D53/14

    Abstract: An oxygen absorbing agent containing a compound (A) of formula (I): wherein X is a chalcogen atom, R1 and R2 are each any one of an alkyl group which optionally has a substituent, an alkenyl group which optionally has a substituent, an aryl group which optionally has a substituent, and an aralkyl group which optionally has a substituent, R3 and R4 are each any one of a hydrogen atom, an alkyl group which optionally has a substituent, an alkenyl group which optionally has a substituent, an aryl group which optionally has a substituent, and an aralkyl group which optionally has a substituent, and R5 is a polymerizable group; and a transition metal salt (B).

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