公开(公告)号：US10429081B2

公开(公告)日：2019-10-01

申请号：US15042984

申请日：2016-02-12

Applicant: LG ELECTRONICS INC.

Inventor： Hyunwoo Park ,  Daebong Yang ,  Ingyu Yang

IPC: F24C15/32 ,  F24C3/08

Abstract: A cooking apparatus includes a frame configured to form a cooking chamber; a burner cover provided inside the frame and configured to form a combustion chamber; a burner accommodated in the combustion chamber; a fan provided at an outside of the burner cover in the frame; and a fan cover configured to cover the fan and the burner cover.

公开(公告)号：US10197288B2

公开(公告)日：2019-02-05

申请号：US15236529

申请日：2016-08-15

Applicant: LG ELECTRONICS INC.

Inventor： Hyunwoo Park ,  Dongjae Lee ,  Seungyoun Kim

IPC: H05B6/02 ,  H05B6/12 ,  F24C1/04 ,  A47J36/36 ,  A47J36/38 ,  F24C3/00 ,  F24C15/30 ,  F24C15/32 ,  H05B6/42 ,  A47J37/06 ,  F24C3/04 ,  F24C11/00 ,  F24C15/10

Abstract: A combination type cooker may include a top plate with a surface, a case that is configured to define a space shielded by the top plate, a gas burner that is provided inside the case, and in which a heat plate is heated by combustion of a fuel gas, an induction burner that is provided inside the case, and that is configured to heat a cooking container by induction, and a barrier that is provided between the gas burner and the induction burner, and that is configured to partition an inside of the case into a first space where the gas burner housed, and a second space where the induction burner is housed.

公开(公告)号：US12284746B2

公开(公告)日：2025-04-22

申请号：US17424143

申请日：2020-01-20

Applicant: LG ELECTRONICS INC.

Inventor： Hyunwoo Park ,  Wooil Kim ,  Gyegwang Lee ,  Imjun Cho

IPC: H05H1/34 ,  H05H1/28 ,  H05H1/42

Abstract: The present disclosure relates to a thermal plasma processing apparatus capable of efficiently using thermal plasma and securing a reaction time for the thermal decomposition of the processing gas. A Thermal plasma processing apparatus according to an embodiment of the present disclosure includes a torch part in which an arc is generated between a negative electrode and a positive electrode, and in which a processing gas to be thermally decomposed by the arc is injected between the negative electrode and the positive electrode, a power supply part configured to be connected to the negative electrode and the positive electrode and to apply a high voltage between the negative electrode and the positive electrode, and a reaction part configured to communicate with the torch part and to generate turbulence in the processing gas passing through the torch part.