公开(公告)号：US20150109601A1

公开(公告)日：2015-04-23

申请号：US14383569

申请日：2013-03-08

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Paul IJmert Scheffers ,  Jan Andries Meijer ,  Erwin Slot ,  Vincent Sylvester Kuiper ,  Niels Vergeer

IPC: G03F7/20

CPC classification number: G03F7/707 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3045 ,  H01J37/3177 ,  H01J2237/1501 ,  H01J2237/1502 ,  H01J2237/3045

Abstract: A multi-beamlet charged particle beamlet lithography system for transferring a pattern to a surface of a substrate. The system comprises a projection system (311) for projecting a plurality of charged particle beamlets (7) onto the surface of the substrate; a chuck (313) moveable with respect to the projection system; a beamlet measurement sensor (i.a. 505, 511) for determining one or more characteristics of one or more of the charged particle beamlets, the beamlet measurement sensor having a surface (501) for receiving one or more of the charged particle beamlets; and a position mark measurement system for measuring a position of a position mark (610, 620, 635), the position mark measurement system comprising an alignment sensor (361, 362). The chuck comprises a substrate support portion for supporting the substrate, a beamlet measurement sensor portion (460) for accommodating the surface of the beamlet measurement sensor, and a position mark portion (470) for accommodating the position mark.

Abstract translation: 一种用于将图案转印到基板表面的多子束带电粒子光束光刻系统。 该系统包括用于将多个带电粒子子束（7）投影到衬底的表面上的投影系统（311） 相对于投影系统可移动的卡盘（313）; 用于确定一个或多个带电粒子子束的一个或多个特征的小波束测量传感器（即505,511），所述小束测量传感器具有用于接收一个或多个带电粒子子束的表面（501） 以及用于测量位置标记（610,620,635）的位置的位置标记测量系统，所述位置标记测量系统包括对准传感器（361,362）。 卡盘包括用于支撑基板的基板支撑部分，用于容纳小梁测量传感器的表面的小梁测量传感器部分（460）和用于容纳位置标记的位置标记部分（470）。