公开(公告)号：US20120114837A1

公开(公告)日：2012-05-10

申请号：US13281036

申请日：2011-10-25

申请人： Yoshiyuki Nakagawa ,  Shingo Nakano ,  Naoto Fukuda

发明人： Yoshiyuki Nakagawa ,  Shingo Nakano ,  Naoto Fukuda

IPC分类号： C23C16/52 ,  C23C16/455

CPC分类号： C23C16/52 ,  C23C14/24 ,  C23C14/546 ,  C23C16/46

摘要： Provided are a film formation apparatus and a film formation method which may control with accuracy the thickness of a thin film formed on the film formation object. A film formation apparatus includes a moving part (film formation source unit) for moving a film formation source between a predetermined film formation waiting position and a predetermined film forming position is provided, and the moving part holds a quartz oscillator for measurement and a quartz oscillator for calibration so that their relative positions with respect to the film formation source are maintained. And a calibration step for calibrating a monitored value of the quartz oscillator for measurement, using a monitored value of the quartz oscillator for calibration, is performed in a middle of the film forming step of forming the film on the film formation object.

摘要翻译： 提供可以精确地控制在成膜物体上形成的薄膜的厚度的成膜装置和成膜方法。 一种成膜装置包括：用于在预定的成膜等待位置和预定的成膜位置之间移动成膜源的移动部件（成膜源单元），并且移动部件保持用于测量的石英振荡器和石英振荡器 用于校准，使得它们相对于成膜源的相对位置得以保持。 并且在成膜物体上形成膜的成膜步骤的中间进行用于校准用于测量的石英振荡器的监测值的校准步骤，使用石英振荡器的监测值进行校准。

公开(公告)号：US20120103255A1

公开(公告)日：2012-05-03

申请号：US13270520

申请日：2011-10-11

申请人： Naoto Fukuda

发明人： Naoto Fukuda

IPC分类号： C23C16/458 ,  C23C16/04 ,  B65G47/24

CPC分类号： H01L21/682 ,  C23C14/042 ,  C23C14/54 ,  G01B11/14 ,  H01L51/0011 ,  H01L51/0012

摘要： Provided are an alignment method and an alignment apparatus, in which the number of times to carry out alignment operation is reduced to reduce damage of a substrate and a mask and improve the productivity of evaporation using the mask. Vibrations in the direction of gravity of a substrate immediately after the substrate is brought in are measured by a laser vibrometer. Based on the obtained vibration data, a vibration control portion generates an antiphase vibrational wave. After the vibrational wave is applied to the substrate to reduce the vibrations of the substrate, the alignment between the substrate and a mask is carried out.

摘要翻译： 提供了一种对准方法和对准装置，其中进行对准操作的次数减少，以减少基板和掩模的损坏，并提高使用掩模的蒸发的生产率。 通过激光振动计测量在基板刚刚进入的基板的重力方向上的振动。 基于获得的振动数据，振动控制部分产生反相振动波。 在将振动波施加到基板以减小基板的振动之后，进行基板和掩模之间的对准。