Abstract:
An apparatus for positioning a transport system and a load port is described, including a signal emitting unit disposed on the transport system and a positioning board on the load port. The signal emitting unit has two positioning points thereon capable of emitting two light beams to the positioning board, while the positioning board has two holes thereon at two positions corresponding to the two positioning points. The two light beams can pass through the two holes perpendicular to the positioning board in a horizontal state when the load port is aligned with the transport system.
Abstract:
A thin film transistor substrate, a display apparatus using the same and a manufacturing method thereof are provided. The display apparatus includes a thin film transistor substrate, a top substrate and a display medium layer. The thin film transistor substrate includes a composite plate and several thin film transistors. The composite plate includes a core material structure and two insulation structures. The core material structure includes a metal layer. The two insulation structures are respectively disposed at two sides of the core material structure so as to sandwich the core material structure therebetween. The thin film transistors are disposed on the composite plate. The display medium layer is disposed between the thin film transistor substrate and the top substrate.
Abstract:
An apparatus for positioning a transport system and a load port is described, including a signal emitting unit disposed on the transport system and a positioning board on the load port. The signal emitting unit has two positioning points thereon capable of emitting two light beams to the positioning board, while the positioning board has two holes thereon at two positions corresponding to the two positioning points. The two light beams can pass through the two holes perpendicular to the positioning board in a horizontal state when the load port is aligned with the transport system.
Abstract:
A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particle removing tool includes at least one gas spray member directed toward a surface of the reticle for removing particles. The process includes steps as follows, step (a) loading the reticle into the PPD through the gas spray member to detect whether the reticle has particles thereon; step (b) ejecting the reticle from the PPD; step (c) turning on the particle removing tool as well as going back to step (a) when particles are detected on the reticle, and ending the particle removal process when no particle is detected on the reticle.
Abstract:
A method for measuring the overlay error of an exposure machine is provided. The method includes disposing a pre-fabricated matching mask and a pre-fabricated matching wafer in two exposure machines and performing an exposure. Then, the image data obtained from the two exposure machines are subtracted from each other to eliminate the error resulting from the matching mask and the matching wafer. Therefore, a more accurate assessment of the overlay error between the two machines can be obtained and a more effective control of the variation between the machines can be achieved.
Abstract:
A reticle transferring support. The reticle transferring support has a supporting basefor containing a reticle, a plurality of braces for supporting the reticle, and a plurality of holders for fixing the position of the reticle. The braces are spheroids composed of soft plastic, and the position of the braces is adjustable so that the reticle will not be arranged. The holders each have an inclined plane so that the position of the reticle will be fixed automatically.