[POSITIONING APPARATUS AND POSITIONING METHOD USING THE SAME]
    11.
    发明申请
    [POSITIONING APPARATUS AND POSITIONING METHOD USING THE SAME] 失效
    [定位装置和使用其的定位方法]

    公开(公告)号:US20050208842A1

    公开(公告)日:2005-09-22

    申请号:US10710270

    申请日:2004-06-30

    CPC classification number: H01R13/648 H01R13/40 H01R13/6666 H01R13/74

    Abstract: An apparatus for positioning a transport system and a load port is described, including a signal emitting unit disposed on the transport system and a positioning board on the load port. The signal emitting unit has two positioning points thereon capable of emitting two light beams to the positioning board, while the positioning board has two holes thereon at two positions corresponding to the two positioning points. The two light beams can pass through the two holes perpendicular to the positioning board in a horizontal state when the load port is aligned with the transport system.

    Abstract translation: 描述了一种用于定位输送系统和负载端口的装置,包括设置在输送系统上的信号发射单元和负载端口上的定位板。 信号发射单元具有能够向定位板发射两个光束的两个定位点,同时定位板在与两个定位点对应的两个位置处具有两个孔。 当负载端口与输送系统对准时,两个光束可以以水平状态垂直于定位板穿过两个孔。

    Thin film transistor substrate and display apparatus using the same and manufacturing method thereof
    12.
    发明授权
    Thin film transistor substrate and display apparatus using the same and manufacturing method thereof 有权
    薄膜晶体管基板及使用其的显示装置及其制造方法

    公开(公告)号:US08767164B2

    公开(公告)日:2014-07-01

    申请号:US13349338

    申请日:2012-01-12

    CPC classification number: H01L27/1218

    Abstract: A thin film transistor substrate, a display apparatus using the same and a manufacturing method thereof are provided. The display apparatus includes a thin film transistor substrate, a top substrate and a display medium layer. The thin film transistor substrate includes a composite plate and several thin film transistors. The composite plate includes a core material structure and two insulation structures. The core material structure includes a metal layer. The two insulation structures are respectively disposed at two sides of the core material structure so as to sandwich the core material structure therebetween. The thin film transistors are disposed on the composite plate. The display medium layer is disposed between the thin film transistor substrate and the top substrate.

    Abstract translation: 提供薄膜晶体管基板,使用其的显示装置及其制造方法。 显示装置包括薄膜晶体管基板,顶部基板和显示介质层。 薄膜晶体管基板包括复合板和几个薄膜晶体管。 复合板包括芯材结构和两个绝缘结构。 芯材结构包括金属层。 两个绝缘结构分别设置在芯材结构的两侧,从而将芯材结构夹在其间。 薄膜晶体管设置在复合板上。 显示介质层设置在薄膜晶体管基板和顶层基板之间。

    Positioning apparatus and positioning method using the same
    13.
    发明授权
    Positioning apparatus and positioning method using the same 失效
    定位装置及其定位方法

    公开(公告)号:US07446872B2

    公开(公告)日:2008-11-04

    申请号:US10710270

    申请日:2004-06-30

    CPC classification number: H01R13/648 H01R13/40 H01R13/6666 H01R13/74

    Abstract: An apparatus for positioning a transport system and a load port is described, including a signal emitting unit disposed on the transport system and a positioning board on the load port. The signal emitting unit has two positioning points thereon capable of emitting two light beams to the positioning board, while the positioning board has two holes thereon at two positions corresponding to the two positioning points. The two light beams can pass through the two holes perpendicular to the positioning board in a horizontal state when the load port is aligned with the transport system.

    Abstract translation: 描述了一种用于定位传送系统和装载端口的装置,包括设置在传送系统上的信号发射单元和负载端口上的定位板。 信号发射单元具有能够向定位板发射两个光束的两个定位点,同时定位板在与两个定位点对应的两个位置处具有两个孔。 当负载端口与输送系统对准时,两个光束可以以水平状态垂直于定位板穿过两个孔。

    Process for removing particles from reticle
    14.
    发明授权
    Process for removing particles from reticle 有权
    从掩模版去除颗粒的方法

    公开(公告)号:US07396418B2

    公开(公告)日:2008-07-08

    申请号:US11747231

    申请日:2007-05-11

    CPC classification number: G03F1/82 G03F1/66

    Abstract: A process for removing particles from a reticle is described, wherein the process is performed by using a pellicle particle detector (PPD) and a particle removing tool disposed in front of the PPD as well as fixed to the PPD. The particle removing tool includes at least one gas spray member directed toward a surface of the reticle for removing particles. The process includes steps as follows, step (a) loading the reticle into the PPD through the gas spray member to detect whether the reticle has particles thereon; step (b) ejecting the reticle from the PPD; step (c) turning on the particle removing tool as well as going back to step (a) when particles are detected on the reticle, and ending the particle removal process when no particle is detected on the reticle.

    Abstract translation: 描述了从掩模版中除去颗粒的方法,其中通过使用防护薄膜颗粒检测器(PPD)和设置在PPD前面以及固定到PPD的颗粒去除工具来进行该过程。 颗粒去除工具包括指向掩模版表面的至少一个气体喷射构件,用于去除颗粒。 该方法包括以下步骤,步骤(a)通过气体喷射构件将掩模版加载到PPD中,以检测掩模版是否具有颗粒; 步骤(b)从PPD喷射掩模版; 步骤(c)打开颗粒去除工具,以及当在掩模版上检测到颗粒时返回到步骤(a),并且当在掩模版上没有检测到颗粒时结束颗粒去除过程。

    METHOD FOR MEASURING OVERLAY ERROR IN EXPOSURE MACHINE
    15.
    发明申请
    METHOD FOR MEASURING OVERLAY ERROR IN EXPOSURE MACHINE 审中-公开
    在曝光机中测量覆盖误差的方法

    公开(公告)号:US20070121093A1

    公开(公告)日:2007-05-31

    申请号:US11308682

    申请日:2006-04-21

    Applicant: Po-Ching Lin

    Inventor: Po-Ching Lin

    CPC classification number: G03F7/70458 G03F7/70633 H01L21/67288

    Abstract: A method for measuring the overlay error of an exposure machine is provided. The method includes disposing a pre-fabricated matching mask and a pre-fabricated matching wafer in two exposure machines and performing an exposure. Then, the image data obtained from the two exposure machines are subtracted from each other to eliminate the error resulting from the matching mask and the matching wafer. Therefore, a more accurate assessment of the overlay error between the two machines can be obtained and a more effective control of the variation between the machines can be achieved.

    Abstract translation: 提供了一种用于测量曝光机的重叠误差的方法。 该方法包括在两个曝光机中布置预制的匹配掩模和预制的匹配晶片并进行曝光。 然后,从两个曝光机获得的图像数据相互减去以消除由匹配掩模和匹配晶片产生的误差。 因此,可以获得对两台机器之间重叠误差的更准确的评估,并且可以实现对机器之间变化的更有效的控制。

    Reticle transferring support and transferring method thereof
    16.
    发明授权
    Reticle transferring support and transferring method thereof 有权
    标线转印支持及其转印方法

    公开(公告)号:US06882408B2

    公开(公告)日:2005-04-19

    申请号:US10604092

    申请日:2003-06-25

    Applicant: Po-Ching Lin

    Inventor: Po-Ching Lin

    CPC classification number: G03F7/70741

    Abstract: A reticle transferring support. The reticle transferring support has a supporting basefor containing a reticle, a plurality of braces for supporting the reticle, and a plurality of holders for fixing the position of the reticle. The braces are spheroids composed of soft plastic, and the position of the braces is adjustable so that the reticle will not be arranged. The holders each have an inclined plane so that the position of the reticle will be fixed automatically.

    Abstract translation: 标线转印支架。 标线转印支撑体具有用于包含掩模版的支撑基座,用于支撑光罩的多个支架,以及用于固定光罩的位置的多个保持器。 大括号是由软塑料组成的球体,并且支架的位置是可调节的,使得标线不会被布置。 支架各有一个倾斜平面,使得光罩的位置自动固定。

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