PIN-TYPE PHOTO DETECTING ELEMENT WITH THREE SEMICONDUCTOR LAYERS, AND WINDOW SEMICONDUCTOR LAYER HAVING CONTROLLED THICKNESS
    11.
    发明申请
    PIN-TYPE PHOTO DETECTING ELEMENT WITH THREE SEMICONDUCTOR LAYERS, AND WINDOW SEMICONDUCTOR LAYER HAVING CONTROLLED THICKNESS 有权
    具有三个半导体层的PIN型光电检测元件和具有控制厚度的窗口半导体层

    公开(公告)号:US20100151620A1

    公开(公告)日:2010-06-17

    申请号:US12711881

    申请日:2010-02-24

    IPC分类号: H01L31/18

    摘要: A semiconductor photo detecting element includes a PIN-type photo detecting element and window semiconductor layer. The PIN-type photo detecting element has a semiconductor substrate, a first semiconductor layer, a second semiconductor layer and a third semiconductor layer. The first semiconductor layer is provided on the semiconductor substrate, is lattice-matched to the semiconductor substrate, includes a first conductivity type dopant, and has first band gap energy. The second semiconductor layer is provided on the first semiconductor layer, has the first band gap energy, and has a concentration of the first conductivity type dopant lower than that of the first semiconductor layer or is substantially undoped. The third semiconductor layer is provided on the second semiconductor layer. The window semiconductor layer has second band gap energy larger than the first band gap energy at a light-incoming side with respect to the second semiconductor layer and has a thickness of 5 nm to 50 nm.

    摘要翻译: 半导体光电检测元件包括PIN型光检测元件和窗半导体层。 PIN型光检测元件具有半导体衬底,第一半导体层,第二半导体层和第三半导体层。 第一半导体层设置在半导体衬底上,与半导体衬底晶格匹配,包括第一导电型掺杂剂,并且具有第一带隙能量。 第二半导体层设置在第一半导体层上,具有第一带隙能量,并且第一导电类型掺杂物的浓度低于第一半导体层的浓度或基本上未掺杂。 第三半导体层设置在第二半导体层上。 窗口半导体层具有比相对于第二半导体层的光入射侧的第一带隙能量大的第二带隙能量,并且具有5nm至50nm的厚度。