公开(公告)号：US20200293255A1

公开(公告)日：2020-09-17

申请号：US16588354

申请日：2019-09-30

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sungmin LIM ,  Taehoon LEE ,  Hanjin PARK ,  Changwon CHOI

IPC: G06F3/147 ,  G09G5/38 ,  G09G5/373

Abstract: A display apparatus and a control method thereof are provided. The display apparatus includes: a display, a driver configured to rotate the display between a horizontal arrangement state in which a width of the display is greater than a height of the display, and a vertical arrangement state in which the height of the display is greater than the width of the display; and a processor configured to execute instructions to: identify an object included in an image, identify whether the image is an image of a horizontal type or an image of a vertical type based on the identified object, and based on an arrangement state of the display and the identified type of the image, control the driver to rotate the display.

公开(公告)号：US20180143527A1

公开(公告)日：2018-05-24

申请号：US15625049

申请日：2017-06-16

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwanseok SEO ,  SeongSue KIM ,  Taehoon LEE ,  Roman CHALYKH

IPC: G03F1/26 ,  G03F1/24

Abstract: A phase-shift mask for extreme ultraviolet (EUV) lithography may be provided. The phase-shift mask may include a substrate, a reflection layer on the substrate, and phase-shift patterns including at least one metal nitride on the reflection layer. The at least one metal nitride may include at least one of TaN, TiN, ZrN, HfN, CrN, VN, NbN, MoN, WN, AlN, GaN, ScN, and YN.