IMAGE SENSOR
    12.
    发明公开
    IMAGE SENSOR 审中-公开

    公开(公告)号:US20230411423A1

    公开(公告)日:2023-12-21

    申请号:US18199601

    申请日:2023-05-19

    CPC classification number: H01L27/1463 H01L27/14609 H01L27/14645

    Abstract: An image sensor includes a substrate having a plurality of unit pixels, a photoelectric device portion and a storage device portion disposed in the substrate and constituting the plurality of unit pixels, a device isolation structure disposed in the substrate and partitioning the plurality of unit pixels, and an overflow gate providing an overflow path between the photoelectric device portion and the storage device portion according to a certain voltage, wherein the device isolation structure is partially opened at a boundary between the photoelectric device portion and the storage device portion.

    IMAGE SENSORS
    13.
    发明公开
    IMAGE SENSORS 审中-公开

    公开(公告)号:US20230253438A1

    公开(公告)日:2023-08-10

    申请号:US18106764

    申请日:2023-02-07

    CPC classification number: H01L27/14643 H01L27/1463 H01L27/14636

    Abstract: An image sensor is provided. The image sensor includes: a semiconductor substrate including a photoelectric conversion region; a buried transmission gate electrode provided in a transmission gate trench; a fin-type active region provided between a first trench and a second trench which extend into the semiconductor substrate, wherein the fin-type active region includes a first source/drain region, a second source/drain region, and a channel region provided between the first and second source/drain regions; and a first gate electrode covering a top surface and both sidewalls of the fin-type active region, and inner walls of the first trench and the second trench. The channel region, the first source/drain region and the second source/drain region each have a first conductivity type. The photoelectric conversion region and the fin-type active region overlap along a vertical direction.

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