公开(公告)号：US20250044685A1

公开(公告)日：2025-02-06

申请号：US18755491

申请日：2024-06-26

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Changsoo WOO ,  Seol Hee LIM ,  Minyoung LEE ,  Jimin KIM

IPC: G03F7/004 ,  G03F1/80 ,  G03F7/11 ,  G03F7/16 ,  G03F7/20

Abstract: A semiconductor photoresist composition includes an organometallic compound represented by Chemical Formula 1 and a solvent. A method of forming (or providing) patterns utilizing the same is provided. (R1)n1-M-[(X)—R2]m1  [Chemical Formula 1]

公开(公告)号：US20240369935A1

公开(公告)日：2024-11-07

申请号：US18565488

申请日：2022-07-04

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Hyungrang MOON ,  Minyoung LEE ,  Ryunmin HEO ,  Jamin KU ,  Donghyung LEE ,  Dasom HAN ,  Minsoo KIM ,  Jaehyun KIM

IPC: G03F7/20 ,  G03F7/004 ,  G03F7/16

Abstract: Provided are composition for removing edge beads from metal-containing resists, and a method of forming patterns including step of removing edge beads using the same and the composition includes an organic solvent and a compound having an AMW of 7 g/mol·ea or more.

公开(公告)号：US20240176234A1

公开(公告)日：2024-05-30

申请号：US18484247

申请日：2023-10-10

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Sangkyun IM ,  Seungyong CHAE ,  Yaeun SEO ,  Taegeun SEONG ,  Minyoung LEE ,  Jimin KIM

IPC: G03F7/004 ,  C07F7/22

CPC classification number: G03F7/0042 ,  C07F7/2224

Abstract: A semiconductor photoresist composition includes an organotin compound represented by Chemical Formula 1 and a solvent. A method for forming patterns uses the semiconductor photoresist composition.

公开(公告)号：US20240061336A1

公开(公告)日：2024-02-22

申请号：US18323358

申请日：2023-05-24

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Changsoo WOO ,  Seung HAN ,  Seungyong CHAE ,  Minyoung LEE ,  Jimin KIM ,  Sumin JANG ,  Sangkyun IM ,  Yaeun SEO ,  Eunmi KANG ,  Soobin LIM ,  Kyungsoo MOON

IPC: G03F7/039 ,  G03F7/004

CPC classification number: G03F7/039 ,  G03F7/0045 ,  G03F7/0044

Abstract: A semiconductor photoresist composition and a method of forming patterns utilizing the semiconductor photoresist composition are disclosed. The semiconductor photoresist composition may include a first organometallic compound represented by Chemical Formula 1, a second organometallic compound represented by Chemical Formula 2, and a solvent, where the first organometallic compound is different from the second organometallic compound, at least one selected from among R1 and L1 may include a tertiary carbon, and at least one selected from among R2 and L2 may include at least one selected from among a primary carbon and a secondary carbon.

公开(公告)号：US20230037563A1

公开(公告)日：2023-02-09

申请号：US17858924

申请日：2022-07-06

Applicant: SAMSUNG SDI CO., LTD. ,  SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ryunmin HEO ,  Hyungrang MOON ,  Minyoung LEE ,  Minsoo KIM ,  Youngkwon KIM ,  Jaehyun KIM ,  Changsoo WOO ,  Jung Min CHOI ,  Moohyun KOH ,  Jungah KIM ,  Sungan DO ,  Sang Won BAE ,  Hoon HAN ,  SukKoo HONG

IPC: G03F7/32

Abstract: A metal-containing photoresist developer composition, and a method of forming patterns including a step of developing using the same are provided. The metal-containing photoresist developer composition includes an organic solvent, and a heptagonal ring compound substituted with at least one hydroxy group (—OH). The heptagonal ring compound has at least two double bonds in the ring.

公开(公告)号：US20200321656A1

公开(公告)日：2020-10-08

申请号：US16305092

申请日：2017-05-29

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Yunhee KIM ,  Hoseok YANG ,  Minyoung LEE ,  Sejeong PARK ,  Hyunwoo KIM ,  Sujeong KOH

IPC: H01M10/0569 ,  H01M10/0525 ,  H01M4/131 ,  C08L65/02

Abstract: The present invention relates to an electrolyte for a lithium secondary battery, comprising an organic solvent, a lithium salt and a compound of Chemical Formula 1, wherein the compound of Chemical Formula 1 is contained in an amount of 0.001 wt % or more and less than 0.1 wt %. In Chemical Formula 1, n is one of the integers 3 to 10.

公开(公告)号：US20180083317A1

公开(公告)日：2018-03-22

申请号：US15708728

申请日：2017-09-19

Applicant: SAMSUNG SDI CO., LTD.

Inventor： Sejeong PARK ,  Hoseok YANG ,  Sujeong KOH ,  Yunhee KIM ,  Hyunwoo KIM ,  Minyoung LEE ,  Heeyeon HWANG

IPC: H01M10/0567 ,  H01M10/0525 ,  H01M10/0568 ,  H01M10/0569

CPC classification number: H01M10/0567 ,  H01M10/052 ,  H01M10/0525 ,  H01M10/0568 ,  H01M10/0569 ,  H01M2300/0028 ,  Y02T10/7011

Abstract: Provided is an additive composition for a lithium battery electrolyte, the additive composition including a first compound represented by Formula 1 and a second compound represented by Formula 2: Also provided are an organic electrolyte including the additive composition, and a battery including the organic electrolyte.