公开(公告)号：US11099417B2

公开(公告)日：2021-08-24

申请号：US16739829

申请日：2020-01-10

Applicant: Samsung Display Co., Ltd.

Inventor： Minsu Lee ,  Wonjang Ki ,  Dae-Hyun Noh ,  Yongsung Park ,  Seungbin Lee

IPC: G02F1/1335 ,  H01L33/44 ,  G02B1/11 ,  G02F1/135

Abstract: An electronic apparatus including a base substrate that includes an active area and a peripheral area adjacent to the active area, a plurality of pixels that are disposed in the active area, a plurality of pads that are disposed in the peripheral area, fan-out lines that are disposed in the peripheral area and connect the pixels and the pads, and an anti-reflection layer that includes an active portion and a peripheral portion. The active portion overlaps the active area and includes a plurality of color patterns respectively overlapping the pixels, and the peripheral portion overlaps the peripheral area. The anti-reflection layer overlaps at least a part of the fan-out lines.

公开(公告)号：US09519167B2

公开(公告)日：2016-12-13

申请号：US14745997

申请日：2015-06-22

Applicant: Samsung Display Co., Ltd.

Inventor： Jung-Mi Choi ,  Dae-Hyun Noh

IPC: G06F1/16 ,  G02F1/133

CPC classification number: G02F1/133 ,  G03F7/0007 ,  G03F7/0035 ,  G03F7/203

Abstract: A method of forming a pattern may include: disposing a first material layer; disposing a first photoresist film including first shot regions; exposing the first shot regions to light, wherein an overlapping region between first shot regions may be overlappingly exposed to light exposures onto the first shot regions; forming a first photoresist pattern by developing the first photoresist film; forming a first pattern by etching the first material layer using the first photoresist pattern as an etching mask; disposing a second material layer on the first pattern; disposing a second photoresist film including second shot regions; exposing the second shot regions, wherein a boundary region between second shot regions may be disposed spaced apart from the overlapping region; forming a second photoresist pattern by developing the second photoresist film; and forming a second pattern by etching the second material layer using the second photoresist pattern as an etching mask.

Abstract translation: 形成图案的方法可以包括：设置第一材料层; 设置包括第一射出区域的第一光致抗蚀剂膜; 将第一射出区域暴露于光，其中第一射出区域之间的重叠区域可能重叠地暴露于第一射出区域上的光照射; 通过显影第一光致抗蚀剂膜形成第一光致抗蚀剂图案; 通过使用第一光致抗蚀剂图案作为蚀刻掩模蚀刻第一材料层来形成第一图案; 在第一图案上设置第二材料层; 设置包括第二射出区域的第二光致抗蚀剂膜; 暴露第二射出区域，其中第二射击区域之间的边界区域可以设置成与重叠区域间隔开; 通过显影所述第二光致抗蚀剂膜形成第二光致抗蚀剂图案; 以及通过使用第二光致抗蚀剂图案作为蚀刻掩模蚀刻第二材料层来形成第二图案。

公开(公告)号：US09070896B2

公开(公告)日：2015-06-30

申请号：US13856308

申请日：2013-04-03

Applicant: Samsung Display Co., Ltd.

Inventor： Ki-Wook Kim ,  Dae-Hyun Noh

IPC: H01L29/04 ,  H01L51/52 ,  H01L29/08

CPC classification number: H01L51/52 ,  H01L27/3248 ,  H01L27/326 ,  H01L27/3265 ,  H01L51/5265

Abstract: An OLED display includes: a substrate; a first signal line provided on the substrate; a second signal line crossing the first signal line; a thin film transistor connected to the first signal line and the second signal line; a pixel electrode connected to a drain electrode of the thin film transistor; an emission layer formed on the pixel electrode; a common electrode formed on the emission layer and formed of a reflective material; and a capacitor overlapping the pixel electrode.

Abstract translation: OLED显示器包括：基板; 设置在基板上的第一信号线; 与第一信号线交叉的第二信号线; 连接到第一信号线和第二信号线的薄膜晶体管; 连接到所述薄膜晶体管的漏电极的像素电极; 形成在像素电极上的发射层; 形成在发射层上并由反射材料形成的公共电极; 以及与像素电极重叠的电容器。