公开(公告)号：US20240164146A1

公开(公告)日：2024-05-16

申请号：US18335316

申请日：2023-06-15

Applicant: Samsung Display Co., LTD.

Inventor： Choong Youl IM ,  Ha Seok JEON ,  Hyun Duck CHO ,  Beohm Rock CHOI

IPC: H10K59/122 ,  H10K59/38 ,  H10K59/40 ,  H10K59/80

CPC classification number: H10K59/122 ,  H10K59/38 ,  H10K59/40 ,  H10K59/873 ,  H10K59/8792 ,  H10K2102/351

Abstract: A display device includes a first electrode disposed on a substrate; a pixel defining layer that has an opening exposing the first electrode; a second electrode disposed on the pixel defining layer and the first electrode; an encapsulation layer that covers the second electrode; a color filter disposed on the encapsulation layer; and an upper light blocking layer that has an upper opening corresponding to the color filter, wherein the upper light blocking layer overlaps an overlapping portion where adjacent color filters overlap each other in a plan view.

公开(公告)号：US20240049516A1

公开(公告)日：2024-02-08

申请号：US18314622

申请日：2023-05-09

Applicant: Samsung Display Co., LTD.

Inventor： Jun Hee LEE ,  Yeong Ho LEE ,  Choong Youl IM ,  Hyun Duck CHO ,  Beohm Rock CHOI

IPC: H10K59/122 ,  H10K59/65 ,  H10K59/80 ,  H10K59/40

CPC classification number: H10K59/122 ,  H10K59/65 ,  H10K59/8792 ,  H10K59/873 ,  H10K59/40 ,  H10K2102/311

Abstract: A light emitting display device includes: a substrate; an anode on the substrate; a pixel defining layer having an opening overlapping the anode; an emission layer in the opening of the pixel defining layer; a spacer on the pixel defining layer and having a step; a cathode formed in the emission layer, the pixel defining layer, and the spacer; an encapsulation layer on the cathode; and a light blocking layer on the encapsulation layer, wherein the spacer includes a first portion and a second portion that is lower than the first portion and is integrally formed with the first portion, and the first portion and the second portion of the spacer overlaps the light blocking layer in a plan view.

公开(公告)号：US20230363231A1

公开(公告)日：2023-11-09

申请号：US18105392

申请日：2023-02-03

Applicant: Samsung Display Co., LTD.

Inventor： Jun Hee LEE ,  Choong Youl IM ,  Ha Seok JEON ,  Hyun Duck CHO ,  Beohm Rock CHOI

IPC: H10K59/38 ,  H10K59/122 ,  H10K59/131 ,  H10K59/80 ,  H10K59/121 ,  H10K59/65 ,  H10K59/40

CPC classification number: H10K59/38 ,  H10K59/122 ,  H10K59/131 ,  H10K59/8792 ,  H10K59/1213 ,  H10K59/65 ,  H10K59/40 ,  H10K59/1216

Abstract: An electronic device including a light emitting display device includes: a first data conductive layer, a second data conductive layer, a green light emitting diode (LED) anode, a red light emitting diode (LED) anode, and a blue light emitting diode (LED) anode positioned on the second organic layer; a pixel definition layer including a green opening overlapping the green light emitting diode (LED) anode, a red opening overlapping the red light emitting diode (LED) anode, and a blue opening overlapping the blue light emitting diode (LED) anode. The first data conductive layer include a first expansion overlapping the red opening or the blue opening of the pixel definition layer, the second data conductive layer includes a second expansion overlapping the green opening of the pixel definition layer, and the second expansion of the second data conductive layer entirely overlaps the green opening of the pixel definition layer.

公开(公告)号：US20230268356A1

公开(公告)日：2023-08-24

申请号：US18155982

申请日：2023-01-18

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong-Hwan RYU ,  Woo Jin CHO ,  Jong-Hyun CHOUNG ,  Jae Uoon KIM ,  Sun-Jin SONG ,  Hyun Duck CHO

IPC: H01L27/12 ,  G03F7/038 ,  G03F7/00

CPC classification number: H01L27/1288 ,  G03F7/0035 ,  G03F7/0382 ,  H01L27/1262 ,  C23F1/00

Abstract: A method of manufacturing a display device in a chamber in which a material including yttrium is coated on an inner surface includes: forming a first layer pattern by dry etching on a substrate; depositing a second layer material on the first layer pattern; forming a photoresist pattern on the second layer material; completing a second layer pattern by using the photoresist pattern as an etch mask; and performing an additional acid etching process by using an etching solution including at least one of hydrochloric acid, sulfuric acid, or nitric acid before the forming of the photoresist pattern on the second layer material after the dry etching to form the first layer pattern.