公开(公告)号：US20180042438A1

公开(公告)日：2018-02-15

申请号：US15540014

申请日：2015-12-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dong Wook Kim ,  Ki Hwan Kwon ,  Jin Wook Yoon ,  Dong Woo Ha ,  Seok Man Hong

IPC: A47L9/00 ,  A47L5/22 ,  A47L9/28

Abstract: Disclosed is a vacuum cleaner including a flow path to guide air suctioned or discharged and a resonator connected to the flow path. The resonator is configured to change a resonance frequency to be canceled. Therefore, when the noise generated by changing operation modes of the vacuum cleaner is changed, the noise may be cancelled by changing the resonance frequency of the resonator.

公开(公告)号：US12239281B2

公开(公告)日：2025-03-04

申请号：US18447010

申请日：2023-08-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： See Hyun Kim ,  In Gyu Choi ,  Ki Hwan Kwon ,  Shin Kim ,  Hyeon Cheol Kim ,  Do Kyung Lee ,  Hyun Ju Lee ,  Yun Soo Jang ,  Seung Ryong Cha ,  Jung Gyun Han

IPC: A47L9/14 ,  A47L5/18 ,  A47L9/00 ,  A47L9/16 ,  A47L9/28 ,  A47L9/30

Abstract: A cleaning apparatus including a vacuum cleaner and a docking station is provided. The cleaning apparatus includes a vacuum cleaner including a dust collecting chamber in which foreign substances are collected, and a docking station configured to be connected to the dust collecting chamber to remove the foreign substances collected in the dust collecting chamber. The dust collecting chamber is configured to collect foreign substances through centrifugation, and configured to be docked to the docking station, and the docking station includes a suction device configured to suction the foreign substances and air in the dust collecting chamber docked to the docking station.

公开(公告)号：US11937765B2

公开(公告)日：2024-03-26

申请号：US17413218

申请日：2019-12-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： See Hyun Kim ,  In Gyu Choi ,  Ki Hwan Kwon ,  Shin Kim ,  Hyeon Cheol Kim ,  Do Kyung Lee ,  Hyun Ju Lee ,  Yun Soo Jang ,  Seung Ryong Cha ,  Jung Gyun Han

IPC: A47L9/14 ,  A47L5/18 ,  A47L9/00 ,  A47L9/16 ,  A47L9/28 ,  A47L9/30

CPC classification number: A47L9/149 ,  A47L5/18 ,  A47L9/0009 ,  A47L9/1608 ,  A47L9/1683 ,  A47L9/2894 ,  A47L9/30 ,  A47L9/2873

Abstract: A cleaning apparatus including a vacuum cleaner and a docking station is provided. The cleaning apparatus includes a vacuum cleaner including a dust collecting chamber in which foreign substances are collected, and a docking station configured to be connected to the dust collecting chamber to remove the foreign substances collected in the dust collecting chamber. The dust collecting chamber is configured to collect foreign substances through centrifugation, and configured to be docked to the docking station, and the docking station includes a suction device configured to suction the foreign substances and air in the dust collecting chamber docked to the docking station.

公开(公告)号：US11337573B2

公开(公告)日：2022-05-24

申请号：US17092822

申请日：2020-11-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： See Hyun Kim ,  In Gyu Choi ,  Ki Hwan Kwon ,  Shin Kim ,  Hyeon Cheol Kim ,  Do Kyung Lee ,  Hyun Ju Lee ,  Yun Soo Jang ,  Seung Ryong Cha ,  Jung Gyun Han

IPC: A47L9/00 ,  A47L9/14 ,  A47L9/16 ,  A47L9/28 ,  A47L9/30

Abstract: A cleaning apparatus including a vacuum cleaner and a docking station is provided. The cleaning apparatus includes a vacuum cleaner including a dust collecting chamber in which foreign substances are collected, and a docking station configured to be connected to the dust collecting chamber to remove the foreign substances collected in the dust collecting chamber. The dust collecting chamber is configured to collect foreign substances through centrifugation, and configured to be docked to the docking station, and the docking station includes a suction device configured to suction the foreign substances and air in the dust collecting chamber docked to the docking station.

公开(公告)号：US11078107B2

公开(公告)日：2021-08-03

申请号：US16123623

申请日：2018-09-06

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyoung Mok Kim ,  Seulkiro Kim ,  Yu Jeong Oh ,  Jong Ho Lee ,  Jung Soo Lim ,  Ki Hwan Kwon ,  Yong Jong Park ,  Hyun Sang Yoo ,  Boo-Keun Yoon ,  Hee Tae Lim

IPC: C03C8/08 ,  C23D13/00 ,  C23D5/02 ,  C03C3/068 ,  A47J31/44 ,  A47J37/06 ,  C23D5/04 ,  C03C8/14 ,  C03C3/095 ,  F24C15/00 ,  A47J36/02 ,  C23D1/00

Abstract: A cooking apparatus including an enamel coating layer having an improved cleaning efficiency and a manufacturing method therefor are provided. The cooking apparatus includes a cooking compartment configured to accommodate a cooking object, a door configured to open and close the cooking compartment, and an enamel coating layer provided on a surface of the cooking compartment. The enamel coating layer includes, in percent (%) by weight of the entire composition, 5% or less (excluding 0%) of a silicon dioxide (SiO2), 10% to 20% of an aluminum oxide (Al2O3), 10% to 20% of a phosphorous pentoxide (P2O5), 5% to 15% of a rare earth oxide, and 5% to 10% of a ferric oxide (Fe2O3).

公开(公告)号：US11006800B2

公开(公告)日：2021-05-18

申请号：US16308568

申请日：2017-05-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Ki Hwan Kwon ,  Jin Wook Yoon ,  Dong Wook Kim ,  Dong Woo Ha ,  Seok Man Hong

IPC: A47L9/16 ,  A47L9/22 ,  A47L9/00 ,  G10K11/162 ,  A47L11/40

Abstract: By improving a structure of a discharge flow path of a robot cleaner, it may be possible to minimize a loss of a suction force, thereby reducing a noise without deteriorating cleaning efficiency. The robot cleaner includes a fan motor configured to generate a suction force, a first housing in which the fan motor is accommodated, a second housing in which the first housing is accommodated, and a chamber positioned between the first housing and the second housing, wherein a plurality of slits are formed in the chamber.