公开(公告)号：US10115562B2

公开(公告)日：2018-10-30

申请号：US15252828

申请日：2016-08-31

Applicant: Samsung Electronics Co., Ltd.

Inventor： Suyoung Lee ,  Tamamushi Shuichi ,  Byunggook Kim ,  Byoungsup Ahn

IPC: H01J37/302 ,  H01J37/04 ,  H01J37/317

Abstract: A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.