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11.
公开(公告)号:US5696518A
公开(公告)日:1997-12-09
申请号:US549700
申请日:1995-11-15
申请人: Yukio Itoh , Tadashi Yasuoka , Ryoji Amemiya
发明人: Yukio Itoh , Tadashi Yasuoka , Ryoji Amemiya
IPC分类号: G04G17/04 , G04G17/08 , G04G99/00 , G04R20/08 , G04R20/26 , G04R60/06 , H01Q1/27 , H04B1/08 , H04B1/38 , H01Q1/12
摘要: An antenna device used for portable electronic appliances such as electronic wristwatches furnished with a reception function. Antenna device 100 is bent conforming to the side of watch case 201 and installed on the side of watch case 201. The antenna device is composed of an antenna 110 and an antenna case 150 in which the antenna 110 is housed. The antenna case is made of or coated with a non-metallic material and formed separately from a watch case made of a metallic material. In addition, the antenna case is fixed to watch case 201 with screws 152 at positions apart from the extended line P of antenna core 111.
摘要翻译: PCT No.PCT / JP94 / 01219 Sec。 371日期:1995年11月15日 102(e)日期1995年11月15日PCT 1994年7月25日PCT公布。 WO95 / 27928 PCT公开 1995年10月19日的日期用于具有接收功能的电子手表等便携式电子设备的天线装置。 天线装置100被弯曲成符合表壳201的侧面并且安装在表壳201的侧面上。天线装置由天线110和天线110被容纳在天线壳体150内。 天线箱由非金属材料制成或涂覆,并与金属材料制成的表壳分开形成。 此外,天线壳体在与天线芯111的延伸线P分开的位置处以螺钉152固定到手表壳体201。
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公开(公告)号:US5178727A
公开(公告)日:1993-01-12
申请号:US831752
申请日:1992-02-10
申请人: Eiichi Toya , Yukio Itoh , Tadashi Ohashi , Masayuki Sumiya
发明人: Eiichi Toya , Yukio Itoh , Tadashi Ohashi , Masayuki Sumiya
IPC分类号: G03F1/22
CPC分类号: G03F1/22 , Y10T428/24322
摘要: A ceramic membrane device for a photomask is a ring-shaped base plate constituting a circumferential frame and having a flat front surface, an outer side surface and a rear surface, a front CVD coating supported on the front surface of the base plate and defining a flat surface on which a masking pattern is to be formed, and a rear CVD coating formed on the rear surface of the base plate. The front and rear CVD coatings are made of a silicon compound. The ceramic membrane device is made by providing a plate having a flat front surface, a side surface and a rear surface, forming a front CVD coating made of a silicon compound on the side surface and the front surface of the plate, forming a rear CVD coating made of a silicon compound on a partial area of the rear surface of the plate so that an uncoated area remains, removing the portion of the plate corresponding to the uncoated area by means of etching so that the remaining portion of the plate can function as a circumferential frame for the ceramic membrane formed by the front coating.
摘要翻译: 一种用于光掩模的陶瓷膜装置是构成圆周框架并具有平坦的前表面,外侧表面和后表面的环形基板,支撑在基板的前表面上的前CVD涂层, 要形成掩模图案的平坦表面和形成在基板的后表面上的后CVD涂层。 前后CVD涂层由硅化合物制成。 陶瓷膜装置通过提供具有平坦的前表面,侧表面和后表面的板制成,在板的侧表面和前表面上形成由硅化合物制成的前CVD涂层,形成后CVD 由硅化合物制成的涂层在板的后表面的局部区域上,使得未涂覆区域残留,通过蚀刻去除对应于未涂覆区域的板的部分,使得板的剩余部分可以作为 由前涂层形成的用于陶瓷膜的圆周框架。
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公开(公告)号:US5074017A
公开(公告)日:1991-12-24
申请号:US454782
申请日:1989-12-26
申请人: Eiichi Toya , Yukio Itoh , Tadashi Ohashi , Masayuki Sumiya , Yasumi Sasaki
发明人: Eiichi Toya , Yukio Itoh , Tadashi Ohashi , Masayuki Sumiya , Yasumi Sasaki
IPC分类号: C30B25/12 , C23C16/44 , C23C16/458 , H01L21/205 , H01L21/31
CPC分类号: C23C16/4584 , Y10T29/41
摘要: A susceptor for use in a vertical vapor growth apparatus includes a susceptor body (12) having an upper surface, a plurality of wafer receiving portions (17) formed in the upper surface of the susceptor body (12), and plates (16) fixed in the upper surface of the susceptor body (12) near the wafer setting portions (17). The plates (16) have an upper surface such that, when wafers (5) are mounted in the wafer setting portions (17), the upper surfaces of the plates (16) and the wafers (5) are positioned substantially in the same plane. The plates (16) are made of quartz glass or fused silica.
摘要翻译: 用于垂直气相生长装置的基座包括具有上表面的基座体(12),形成在基座体(12)的上表面中的多个晶片接收部分(17),以及固定 在靠近晶片设置部分(17)的基座主体(12)的上表面中。 板(16)具有上表面,使得当晶片(5)安装在晶片设置部分(17)中时,板(16)和晶片(5)的上表面基本上位于同一平面 。 板(16)由石英玻璃或熔融石英制成。
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