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    Ceramic membrane device and a method of producing the same
    1.
    发明授权
    Ceramic membrane device and a method of producing the same 失效
    陶瓷膜装置及其制造方法

    公开(公告)号：US5178727A

    公开(公告)日：1993-01-12

    申请号：US831752

    申请日：1992-02-10

    申请人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya

    发明人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya

    IPC分类号： G03F1/22

    CPC分类号： G03F1/22 ,  Y10T428/24322

    摘要： A ceramic membrane device for a photomask is a ring-shaped base plate constituting a circumferential frame and having a flat front surface, an outer side surface and a rear surface, a front CVD coating supported on the front surface of the base plate and defining a flat surface on which a masking pattern is to be formed, and a rear CVD coating formed on the rear surface of the base plate. The front and rear CVD coatings are made of a silicon compound. The ceramic membrane device is made by providing a plate having a flat front surface, a side surface and a rear surface, forming a front CVD coating made of a silicon compound on the side surface and the front surface of the plate, forming a rear CVD coating made of a silicon compound on a partial area of the rear surface of the plate so that an uncoated area remains, removing the portion of the plate corresponding to the uncoated area by means of etching so that the remaining portion of the plate can function as a circumferential frame for the ceramic membrane formed by the front coating.

    摘要翻译： 一种用于光掩模的陶瓷膜装置是构成圆周框架并具有平坦的前表面，外侧表面和后表面的环形基板，支撑在基板的前表面上的前CVD涂层， 要形成掩模图案的平坦表面和形成在基板的后表面上的后CVD涂层。 前后CVD涂层由硅化合物制成。 陶瓷膜装置通过提供具有平坦的前表面，侧表面和后表面的板制成，在板的侧表面和前表面上形成由硅化合物制成的前CVD涂层，形成后CVD 由硅化合物制成的涂层在板的后表面的局部区域上，使得未涂覆区域残留，通过蚀刻去除对应于未涂覆区域的板的部分，使得板的剩余部分可以作为 由前涂层形成的用于陶瓷膜的圆周框架。

    Susceptor
    2.
    发明授权
    Susceptor 失效
    SUSCEPTOR

    公开(公告)号：US5074017A

    公开(公告)日：1991-12-24

    申请号：US454782

    申请日：1989-12-26

    申请人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya ,  Yasumi Sasaki

    发明人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya ,  Yasumi Sasaki

    IPC分类号： C30B25/12 ,  C23C16/44 ,  C23C16/458 ,  H01L21/205 ,  H01L21/31

    CPC分类号： C23C16/4584 ,  Y10T29/41

    摘要： A susceptor for use in a vertical vapor growth apparatus includes a susceptor body (12) having an upper surface, a plurality of wafer receiving portions (17) formed in the upper surface of the susceptor body (12), and plates (16) fixed in the upper surface of the susceptor body (12) near the wafer setting portions (17). The plates (16) have an upper surface such that, when wafers (5) are mounted in the wafer setting portions (17), the upper surfaces of the plates (16) and the wafers (5) are positioned substantially in the same plane. The plates (16) are made of quartz glass or fused silica.

    摘要翻译： 用于垂直气相生长装置的基座包括具有上表面的基座体（12），形成在基座体（12）的上表面中的多个晶片接收部分（17），以及固定 在靠近晶片设置部分（17）的基座主体（12）的上表面中。 板（16）具有上表面，使得当晶片（5）安装在晶片设置部分（17）中时，板（16）和晶片（5）的上表面基本上位于同一平面 。 板（16）由石英玻璃或熔融石英制成。

    Ceramic device
    3.
    发明授权
    Ceramic device 失效
    陶瓷装置

    公开(公告)号：US5449545A

    公开(公告)日：1995-09-12

    申请号：US006856

    申请日：1993-01-21

    申请人： Eiichi Toya ,  Yukio Itoh ,  Takashi Tanaka ,  Yasumi Sasaki

    发明人： Eiichi Toya ,  Yukio Itoh ,  Takashi Tanaka ,  Yasumi Sasaki

    IPC分类号： G03F1/22 ,  G03F1/60 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/22 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24355 ,  Y10T428/24917 ,  Y10T428/265 ,  Y10T428/30

    摘要： A ceramic device is disclosed that has a silicon base plate, a first ceramic film formed on a first surface of the silicon base plate, a second ceramic film formed on a second surface of the silicon base plate opposite to the first surface, and an operation opening formed in the silicon base plate between the first and second surfaces. A surface portion of the first ceramic film exposed to the operation opening Is a mirror surface having 0.05 micrometers or less of center line average height Ra. A mirror surface keeping film can be formed between the first surface of the silicon base plate and the first ceramic film for keeping a mirror surface in an etching step to etch the silicon base plate, and the silicon base plate can be reduced partially in the etching step for forming an operation opening thereby exposing a corresponding portion of the mirror surface keeping film to the operation opening.

    摘要翻译： 公开了一种陶瓷器件，其具有硅基板，形成在硅基板的第一表面上的第一陶瓷膜，形成在与第一表面相对的硅基板的第二表面上的第二陶瓷膜，以及操作 开口形成在第一和第二表面之间的硅基板中。 暴露于操作开口的第一陶瓷膜的表面部分是具有0.05微米或更小的中心线平均高度Ra的镜面。 在蚀刻步骤中，在硅基板的第一表面和第一陶瓷膜之间可以形成镜面保持膜，用于在蚀刻步骤中保持镜面，以蚀刻硅基板，并且可以在蚀刻中部分地减少硅基板 用于形成操作开口的步骤，从而将镜面保持膜的相应部分暴露于操作开口。

    Vertical boat and a method for making the same
    8.
    发明授权
    Vertical boat and a method for making the same 失效
    垂直船和制作相同的方法

    公开(公告)号：US5492229A

    公开(公告)日：1996-02-20

    申请号：US151386

    申请日：1993-11-12

    申请人： Takashi Tanaka ,  Jun Yoshikawa ,  Eiichi Toya ,  Atsuo Kitazawa ,  Kazunori Meguro ,  Tatsuo Nozawa ,  Yutaka Ishizuka ,  Yoshiyuki Watanabe ,  Masaru Seino ,  Hideo Nakanishi

    发明人： Takashi Tanaka ,  Jun Yoshikawa ,  Eiichi Toya ,  Atsuo Kitazawa ,  Kazunori Meguro ,  Tatsuo Nozawa ,  Yutaka Ishizuka ,  Yoshiyuki Watanabe ,  Masaru Seino ,  Hideo Nakanishi

    IPC分类号： C30B31/14 ,  H01L21/673 ,  A47F7/00

    CPC分类号： H01L21/67309 ,  C30B31/14

    摘要： A vertical boat for holding a plurality of semiconductor wafers comprising two end members (2) positioned at the top and the bottom of the vertical boat, and a plurality of support members (3,4,5,6,104) vertically mounted on the end members (2) for supporting the wafers, wherein each support member (3,4,5,6,104) is formed by a plate-like member having a series of slits (9,10,7,8,108) formed thereon in such a manner that a plurality of support arms are defined by the slits (9,10,7,8,108) at a predetermined interval, each support arm having a support projection (11,12,13,14,112) formed at the end thereof, and wherein the inner portions (P) of the wafer (1) is to be supported by the support projections (11,12,13,14,112) whereas the periphery of the wafer (1) does not contact the arms of the support members (3,4,5,6,104). The slits can be formed in two steps: forming a series of first slit portions on the plate-like member at a predetermined interval so as to retain two side walls of the plate-like member; and forming a series of second small slit portions on one of the side walls at the same interval so as to connect each second slit portion to the corresponding first slit portion.

    摘要翻译： 一种用于保持多个半导体晶片的垂直船，包括位于垂直船的顶部和底部的两个端部构件（2）和垂直安装在端部构件上的多个支撑构件（3,4,5,6,104） （2），用于支撑晶片，其中每个支撑构件（3,4,5,6,104）由其上形成有一系列狭缝（9,10,7,8,108）的板状构件形成，其方式使得 多个支撑臂由狭缝（9,10,7,8,108）以预定的间隔限定，每个支撑臂具有在其端部形成的支撑突起（11,12,13,14,112），并且其中内部 晶片（1）的部分（P）将由支撑突起（11,12,13,14,112）支撑，而晶片（1）的周边不与支撑部件（3,4）的臂接触， 5,6,104）。 狭缝可以分成两个步骤：以预定间隔在板状构件上形成一系列第一狭缝部分，以便保持板状构件的两个侧壁; 并且在一个侧壁上以相同的间隔形成一系列第二小狭缝部分，以将每个第二狭缝部分连接到相应的第一狭缝部分。

    Steam generator and mixer using the same
    10.
    发明授权
    Steam generator and mixer using the same 失效
    蒸汽发生器和搅拌机使用相同

    公开(公告)号：US06961516B2

    公开(公告)日：2005-11-01

    申请号：US10811822

    申请日：2004-03-30

    申请人： Eiichi Toya ,  Tomio Konn

    发明人： Eiichi Toya ,  Tomio Konn

    IPC分类号： F01N3/24 ,  A61M11/04 ,  A61M16/10 ,  F22B29/06

    CPC分类号： A61M16/109 ,  A61M11/042 ,  A61M16/1075

    摘要： A steam generating apparatus includes: a liquid tank portion 1 for storing a liquid; an evaporator portion 2 which is directly connected to the liquid tank portion, heats the liquid supplied from the liquid tank portion, and generates steam; a steam storage portion 3 which is directly connected to the evaporator portion, and stores the steam generated by the evaporator portion; a passageway 4 which is directly connected to the steam storage portion and outwardly passes the generated steam; a liquid pathway 10b which is connected to the liquid tank portion, and supplies the liquid; and a heater unit 20 which is provided on one side of the evaporator portion, and heats at least the evaporator portion. The liquid tank portion 1, the evaporator portion 2, the steam storage portion 3, the passageway 4, and the liquid pathway 10b are formed within an integral member of a translucent material.

    摘要翻译： 蒸汽发生装置包括：用于储存液体的液体罐部分1; 蒸发器部分2直接连接到液罐部分，加热从液罐部分供应的液体，并产生蒸汽; 蒸汽存储部3，其直接连接到蒸发器部分，并且存储由蒸发器部分产生的蒸汽; 通道4，其直接连接到蒸汽存储部分并向外通过产生的蒸汽; 液体通道10b，其连接到液体罐部分，并供应液体; 以及加热器单元20，其设置在蒸发器部分的一侧，并且至少加热蒸发器部分。 液体罐部分1，蒸发器部分2，蒸汽存储部分3，通道4和液体通道10b形成在半透明材料的整体构件内。