利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

18 条记录 (耗时 0.022 秒)

    Susceptor
    1.
    发明授权
    Susceptor 失效
    SUSCEPTOR

    公开(公告)号：US5074017A

    公开(公告)日：1991-12-24

    申请号：US454782

    申请日：1989-12-26

    申请人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya ,  Yasumi Sasaki

    发明人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya ,  Yasumi Sasaki

    IPC分类号： C30B25/12 ,  C23C16/44 ,  C23C16/458 ,  H01L21/205 ,  H01L21/31

    CPC分类号： C23C16/4584 ,  Y10T29/41

    摘要： A susceptor for use in a vertical vapor growth apparatus includes a susceptor body (12) having an upper surface, a plurality of wafer receiving portions (17) formed in the upper surface of the susceptor body (12), and plates (16) fixed in the upper surface of the susceptor body (12) near the wafer setting portions (17). The plates (16) have an upper surface such that, when wafers (5) are mounted in the wafer setting portions (17), the upper surfaces of the plates (16) and the wafers (5) are positioned substantially in the same plane. The plates (16) are made of quartz glass or fused silica.

    摘要翻译： 用于垂直气相生长装置的基座包括具有上表面的基座体（12），形成在基座体（12）的上表面中的多个晶片接收部分（17），以及固定 在靠近晶片设置部分（17）的基座主体（12）的上表面中。 板（16）具有上表面，使得当晶片（5）安装在晶片设置部分（17）中时，板（16）和晶片（5）的上表面基本上位于同一平面 。 板（16）由石英玻璃或熔融石英制成。

    Ceramic membrane device and a method of producing the same
    2.
    发明授权
    Ceramic membrane device and a method of producing the same 失效
    陶瓷膜装置及其制造方法

    公开(公告)号：US5178727A

    公开(公告)日：1993-01-12

    申请号：US831752

    申请日：1992-02-10

    申请人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya

    发明人： Eiichi Toya ,  Yukio Itoh ,  Tadashi Ohashi ,  Masayuki Sumiya

    IPC分类号： G03F1/22

    CPC分类号： G03F1/22 ,  Y10T428/24322

    摘要： A ceramic membrane device for a photomask is a ring-shaped base plate constituting a circumferential frame and having a flat front surface, an outer side surface and a rear surface, a front CVD coating supported on the front surface of the base plate and defining a flat surface on which a masking pattern is to be formed, and a rear CVD coating formed on the rear surface of the base plate. The front and rear CVD coatings are made of a silicon compound. The ceramic membrane device is made by providing a plate having a flat front surface, a side surface and a rear surface, forming a front CVD coating made of a silicon compound on the side surface and the front surface of the plate, forming a rear CVD coating made of a silicon compound on a partial area of the rear surface of the plate so that an uncoated area remains, removing the portion of the plate corresponding to the uncoated area by means of etching so that the remaining portion of the plate can function as a circumferential frame for the ceramic membrane formed by the front coating.

    摘要翻译： 一种用于光掩模的陶瓷膜装置是构成圆周框架并具有平坦的前表面，外侧表面和后表面的环形基板，支撑在基板的前表面上的前CVD涂层， 要形成掩模图案的平坦表面和形成在基板的后表面上的后CVD涂层。 前后CVD涂层由硅化合物制成。 陶瓷膜装置通过提供具有平坦的前表面，侧表面和后表面的板制成，在板的侧表面和前表面上形成由硅化合物制成的前CVD涂层，形成后CVD 由硅化合物制成的涂层在板的后表面的局部区域上，使得未涂覆区域残留，通过蚀刻去除对应于未涂覆区域的板的部分，使得板的剩余部分可以作为 由前涂层形成的用于陶瓷膜的圆周框架。

    Ceramic device
    3.
    发明授权
    Ceramic device 失效
    陶瓷装置

    公开(公告)号：US5449545A

    公开(公告)日：1995-09-12

    申请号：US006856

    申请日：1993-01-21

    申请人： Eiichi Toya ,  Yukio Itoh ,  Takashi Tanaka ,  Yasumi Sasaki

    发明人： Eiichi Toya ,  Yukio Itoh ,  Takashi Tanaka ,  Yasumi Sasaki

    IPC分类号： G03F1/22 ,  G03F1/60 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/22 ,  Y10T428/24322 ,  Y10T428/24331 ,  Y10T428/24355 ,  Y10T428/24917 ,  Y10T428/265 ,  Y10T428/30

    摘要： A ceramic device is disclosed that has a silicon base plate, a first ceramic film formed on a first surface of the silicon base plate, a second ceramic film formed on a second surface of the silicon base plate opposite to the first surface, and an operation opening formed in the silicon base plate between the first and second surfaces. A surface portion of the first ceramic film exposed to the operation opening Is a mirror surface having 0.05 micrometers or less of center line average height Ra. A mirror surface keeping film can be formed between the first surface of the silicon base plate and the first ceramic film for keeping a mirror surface in an etching step to etch the silicon base plate, and the silicon base plate can be reduced partially in the etching step for forming an operation opening thereby exposing a corresponding portion of the mirror surface keeping film to the operation opening.

    摘要翻译： 公开了一种陶瓷器件，其具有硅基板，形成在硅基板的第一表面上的第一陶瓷膜，形成在与第一表面相对的硅基板的第二表面上的第二陶瓷膜，以及操作 开口形成在第一和第二表面之间的硅基板中。 暴露于操作开口的第一陶瓷膜的表面部分是具有0.05微米或更小的中心线平均高度Ra的镜面。 在蚀刻步骤中，在硅基板的第一表面和第一陶瓷膜之间可以形成镜面保持膜，用于在蚀刻步骤中保持镜面，以蚀刻硅基板，并且可以在蚀刻中部分地减少硅基板 用于形成操作开口的步骤，从而将镜面保持膜的相应部分暴露于操作开口。

    Susceptor for vapor-growth deposition
    4.
    发明授权
    Susceptor for vapor-growth deposition 失效
    蒸气生长沉积物的受体

    公开(公告)号：US5200157A

    公开(公告)日：1993-04-06

    申请号：US668329

    申请日：1991-03-14

    申请人： Eiichi Toya ,  Masayuki Ohkawa ,  Kazuo Itoh ,  Yasumi Sasaki

    发明人： Eiichi Toya ,  Masayuki Ohkawa ,  Kazuo Itoh ,  Yasumi Sasaki

    IPC分类号： C30B25/12

    CPC分类号： C30B25/12

    摘要： The susceptor according to the present invention comprises a main body in the shape of a trapezoidal plate, and which has three circular depressions formed in its surface. The main body is made of silicon carbide having a bulk density of 3.00 g/cm.sup.3 or more. At least 70% of the surface region of the main body is made of crystal particles having a diameter of 5 .mu.m or more. The main body has a thickness of, for example, 700 .mu.m. Six susceptors are attached to a hexagonal upper plate which is fastened to a shaft, and also to a hexagonal lower plate, thereby forming a barrel. Silicon wafers are placed in the circular depressions, so that single-crystal layers may be epitaxially formed on the wafers.

    摘要翻译： 根据本发明的感受体包括呈梯形板形状的主体，并且在其表面上形成有三个圆形凹陷。 主体由堆积密度为3.00g / cm 3以上的碳化硅构成。 主体的表面区域的至少70％由直径为5μm以上的结晶粒子构成。 主体的厚度例如为700μm。 六个感受体连接到六角形上板，该六角形上板被固定到轴上，并且还连接到六边形下板，从而形成筒。 将硅晶片放置在圆形凹陷中，使得可以在晶片上外延形成单晶层。