公开(公告)号：US20150225437A1

公开(公告)日：2015-08-13

申请号：US14422292

申请日：2013-08-19

申请人： Tanaka Kikinzoku Kogyo K.K.

发明人： Ryosuke Harada ,  Naoki Nakata ,  Masayuki Saito

IPC分类号： C07F15/00 ,  C23C16/46 ,  C23C16/18

CPC分类号： C07F15/0046 ,  C23C16/18 ,  C23C16/46

摘要： The present invention provides a raw material, formed of a ruthenium complex, for producing a ruthenium thin film or a ruthenium compound thin film by a chemical deposition method, wherein the ruthenium complex is a ruthenium complex represented by the following formula, in which carbonyl groups and a fluoroalkyl derivative of a polyene are coordinated to ruthenium. The present invention provides a raw material for chemical deposition having a preferable decomposition temperature, and the production cost therefor is low: (nR-L)Ru(CO)3  [Chemical Formula 1] wherein L is a polyene having a carbon number of from 4 to 8 and 2 to 4 double bonds, wherein the polyene L has n (n≧1) pieces of substituents Rs, wherein the substituents Rs are each a fluoroalkyl group having a carbon number of from 1 to 6 and a fluorine number of from 1 to 13, and in the case when the polyene L has two or more (n≧2) of the substituents Rs, the carbon numbers and the fluorine numbers of the substituents Rs may be different in the same molecule.

摘要翻译： 本发明提供一种由钌络合物形成的原料，用于通过化学沉积法制备钌薄膜或钌化合物薄膜，其中钌络合物是下式表示的钌络合物，其中羰基 多烯的氟烷基衍生物与钌配位。 本发明提供了具有优选的分解温度的化学沉积用原料，其制造成本低：（nR-L）Ru（CO）3 [化学式1]其中L是碳原子数为 4〜8个和2〜4个双键，其中多烯L具有n（n≥1）个取代基R s，其中取代基R 5各自为碳原子数1〜6的氟代烷基， 在多烯L具有两个以上（n≥2）个取代基Rs的情况下，取代基Rs的碳数和氟数在同一分子中可能不同。