公开(公告)号：US20230363856A1

公开(公告)日：2023-11-16

申请号：US18223025

申请日：2023-07-18

Applicant: Chi-Ching Huang

Inventor： Chi-Ching Huang

IPC: A61C7/00 ,  A61C7/10 ,  G16H30/40

CPC classification number: A61C7/002 ,  A61C7/10 ,  G16H30/40

Abstract: A method for fabricating orthodontic appliance using bone expansion for dental alignment is provided. The method for fabricating orthodontic appliance comprises the following steps: Step G1: obtaining a digital representation of an initial dental arch of a dental patient; Step G2: displaying the digital representation of the initial dental arch and each tooth using a dental software; Step G3: setting an expansion vector V1 for the first molar of the digital representation of the initial dental arch; Step G4: setting expansion vectors V2 for the remaining teeth of the digital representation of the initial dental arch, based on the expansion vector V1; Step G5: forming a digital representation of a target output dental arch comprising multiple teeth at the ends of the expansion vectors V1 and V2; Step G6: optionally adjusting the teeth positions of the digital representation of the target output dental arch; and Step G7: outputting a physical orthodontic appliance based on profile of the digital representation of the target output dental arch. The method may utilize dental software to implement bone expansion of dental arch and fulfill multi-stage orthodontic treatment, so has flexibility and convenience to clinical practice.

公开(公告)号：US07789545B2

公开(公告)日：2010-09-07

申请号：US12108841

申请日：2008-04-24

Applicant: Yung-Tien Cheng ,  Liang-Ren Huang ,  Chi-Ching Huang ,  Chen-Kang Hsu

Inventor： Yung-Tien Cheng ,  Liang-Ren Huang ,  Chi-Ching Huang ,  Chen-Kang Hsu

IPC: F21S8/10

CPC classification number: F21V11/08 ,  F21S41/24 ,  F21S41/43 ,  F21S41/47

Abstract: A headlight assembly includes a housing, a light source, a light shielding plate, and a light guiding plate. The housing defines a compartment, and includes a reflector and a lens disposed in front of the reflector. The light source is mounted in the compartment and is disposed on an optical axis. The light shielding plate is mounted between the light source and the lens. The light guiding plate is disposed below the optical axis. A first portion of light beams emitted upwardly is reflected by the reflector, passes over the light shielding plate and through the lens, which refracts the first portion of the light beams to form a first illuminating pattern. A second portion of the light beams passes through the light guiding plate and through the lens, which refracts the second portion of the light beams to result in a second illuminating pattern that is directed forwardly and upwardly.

Abstract translation: 头灯组件包括壳体，光源，遮光板和导光板。 壳体限定隔室，并且包括设置在反射器前面的反射器和透镜。 光源安装在隔间内并设置在光轴上。 遮光板安装在光源和透镜之间。 导光板配置在光轴的下方。 向上发射的光束的第一部分被反射器反射，穿过遮光板并穿过透镜，该透镜折射光束的第一部分以形成第一照明图案。 光束的第二部分穿过导光板并穿过透镜，折射光束的第二部分以产生向前和向上指向的第二照明图案。

公开(公告)号：US07669171B2

公开(公告)日：2010-02-23

申请号：US11850513

申请日：2007-09-05

Applicant: Ju-Te Chen ,  Chung-An Chen ,  Chi-Ching Huang ,  Wen-Tsung Wu ,  Shih-Ming Yen

Inventor： Ju-Te Chen ,  Chung-An Chen ,  Chi-Ching Huang ,  Wen-Tsung Wu ,  Shih-Ming Yen

IPC: G06F17/50 ,  G06F19/00

CPC classification number: G03F7/70558 ,  G03F7/705

Abstract: A prediction model for exposure dose is indicated by the following formula, E=E0+EC, wherein E represents an optimized exposure dose, E0 represents a preset exposure dose of a process control system, and EC represents an exposure dose compensation value, and EC=[(MTTdiff/X)/(CDmask/X)]×(ES/A′)×(Wlast+Wavg), wherein MTTdiff represents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDmask represents the actual critical dimension of the mask, X represents the magnification of the mask, ES represents the actual exposure dose of a previous lot, A′ represents an experimental value obtained from the results of different lots, Wlast represents the last batch of weights and Wavg represents an average weight, and CDmask, ES, A′, Wlast and Wavg are set parameters built into the process control system.

Abstract translation: 曝光剂量的预测模型由以下公式表示，E = E0 + EC，其中E表示优化的曝光剂量，E0表示过程控制系统的预设曝光剂量，EC表示曝光剂量补偿值，EC表示曝光剂量补偿值 = [（MTTdiff / X）/（CDmask / X）]×（ES / A'）×（Wlast + Wavg），其中MTTdiff表示先前批次的MTT值与下一批次的MTT值之间的差异， CDmask表示掩模的实际临界尺寸，X表示掩模的放大倍数，ES表示先前批次的实际曝光剂量，A'表示从不同批次的结果获得的实验值，Wlast表示最后一批重量 Wavg代表平均重量，CDmask，ES，A'，Wlast和Wavg是内置到过程控制系统中的参数。