-
公开(公告)号：US20090279318A1
公开(公告)日：2009-11-12
申请号：US12108841
申请日：2008-04-24
Applicant: Yung-Tien Cheng , Liang-Ren Huang , Chi-Ching Huang , Chen-Kang Hsu
Inventor： Yung-Tien Cheng , Liang-Ren Huang , Chi-Ching Huang , Chen-Kang Hsu
Abstract: A headlight assembly includes a housing, a light source, a light shielding plate, and a light guiding plate. The housing defines a compartment, and includes a reflector and a lens disposed in front of the reflector. The light source is mounted in the compartment and is disposed on an optical axis. The light shielding plate is mounted between the light source and the lens. The light guiding plate is disposed below the optical axis. A first portion of light beams emitted upwardly is reflected by the reflector, passes over the light shielding plate and through the lens, which refracts the first portion of the light beams to form a first illuminating pattern. A second portion of the light beams passes through the light guiding plate and through the lens, which refracts the second portion of the light beams to result in a second illuminating pattern that is directed forwardly and upwardly.
Abstract translation: 头灯组件包括壳体，光源，遮光板和导光板。 壳体限定隔室，并且包括设置在反射器前面的反射器和透镜。 光源安装在隔间内并设置在光轴上。 遮光板安装在光源和透镜之间。 导光板配置在光轴的下方。 向上发射的光束的第一部分被反射器反射，穿过遮光板并穿过透镜，该透镜折射光束的第一部分以形成第一照明图案。 光束的第二部分穿过导光板并穿过透镜，折射光束的第二部分以产生向前和向上指向的第二照明图案。
-
公开(公告)号：US20090191723A1
公开(公告)日：2009-07-30
申请号：US12022161
申请日：2008-01-30
Applicant: Chi-Ching Huang , Tzu-Ching Yen , Shih-Chieh Lo , Wen-Tsung Wu
Inventor： Chi-Ching Huang , Tzu-Ching Yen , Shih-Chieh Lo , Wen-Tsung Wu
IPC: H01L21/02
CPC classification number: G03F7/70733 , G03F7/70541
Abstract: Method of performing lithographic processes on a wafer in a lithographic apparatus having multiple stages. First, a lithographic apparatus including a first wafer chuck and a second wafer chuck is provided. Subsequently, a cassette including a plurality of wafers is provided in the lithographic apparatus, and each wafer has a wafer identification. Thereafter, the first wafer chuck is set for holding the wafers having odd wafer identifications, and the second wafer chuck is set for holding the wafers having even wafer identifications. Next, a first lithographic process is performed on each wafer by the lithographic apparatus.
Abstract translation: 在具有多级光刻设备的晶片上进行光刻工艺的方法。 首先，提供包括第一晶片卡盘和第二晶片卡盘的光刻设备。 随后，在光刻设备中设置包括多个晶片的盒，并且每个晶片具有晶片识别。 此后，设置第一晶片卡盘用于保持具有奇数晶片标识的晶片，并且设置第二晶片卡盘用于保持具有均匀晶片标识的晶片。 接下来，通过光刻设备在每个晶片上执行第一光刻工艺。
-
公开(公告)号：US20070298329A1
公开(公告)日：2007-12-27
申请号：US11309096
申请日：2006-06-22
Applicant: Chi-Ching Huang
Inventor： Chi-Ching Huang
CPC classification number: G03F9/7084 , G03F1/42 , G03F1/50
Abstract: The invention is directed to a photomask for a photolithography process. The photomask comprises a substrate, at least one image region and a plurality of alignment marks. The image regions are located on the substrate and at least an image center of one of the image regions non-overlap with a substrate center. The alignment marks are located on the substrate and surrounding each of the image regions. Each of the image regions is surrounded by at least four alignment marks.
Abstract translation: 本发明涉及一种用于光刻工艺的光掩模。 光掩模包括基板，至少一个图像区域和多个对准标记。 图像区域位于基板上，并且至少一个图像区域的图像中心与基板中心不重叠。 对准标记位于基板上并围绕每个图像区域。 每个图像区域被至少四个对准标记包围。
-
公开(公告)号：US20220000656A1
公开(公告)日：2022-01-06
申请号：US17367462
申请日：2021-07-05
Applicant: Chi-Ching Huang
Inventor： Chi-Ching Huang
Abstract: An orthodontic appliance for movably disposed inside dental patient's mouth. The dental patient's mouth has a maxillary dental arch, a mandibular dental arch, and defines a lingual side, a labial side, and a buccal side. The orthodontic appliance has a hard maxillary retainer corresponding to patient's upper jaw, a hard mandibular retainer corresponding to patient's lower jaw, and a soft retainer rigidly attached to the hard maxillary retainer and hard mandibular retainer. The hard maxillary retainer and hard mandibular retainer can be prefabricated according to expected Cusp-to-Fossa Relationship of dental patient, and then be manufactured in an injection mold. The orthodontic appliance can have function to treat teeth deviation, dislocation, malocclusion, or teeth unmatch.
-
公开(公告)号：US11839568B2
公开(公告)日：2023-12-12
申请号：US17367462
申请日：2021-07-05
Applicant: Chi-Ching Huang
Inventor： Chi-Ching Huang
Abstract: An orthodontic appliance for movably disposed inside dental patient's mouth. The dental patient's mouth has a maxillary dental arch, a mandibular dental arch, and defines a lingual side, a labial side, and a buccal side. The orthodontic appliance has a hard maxillary retainer corresponding to patient's upper jaw, a hard mandibular retainer corresponding to patient's lower jaw, and a soft retainer rigidly attached to the hard maxillary retainer and hard mandibular retainer. The hard maxillary retainer and hard mandibular retainer can be prefabricated according to expected Cusp-to-Fossa Relationship of dental patient, and then be manufactured in an injection mold. The orthodontic appliance can have function to treat teeth deviation, dislocation, malocclusion, or teeth unmatch.
-
Patent Agency Ranking
6.发明公开公开(公告)号：US20230363856A1
公开(公告)日：2023-11-16
申请号：US18223025
申请日：2023-07-18
Applicant: Chi-Ching Huang
Inventor： Chi-Ching Huang
Abstract: A method for fabricating orthodontic appliance using bone expansion for dental alignment is provided. The method for fabricating orthodontic appliance comprises the following steps: Step G1: obtaining a digital representation of an initial dental arch of a dental patient; Step G2: displaying the digital representation of the initial dental arch and each tooth using a dental software; Step G3: setting an expansion vector V1 for the first molar of the digital representation of the initial dental arch; Step G4: setting expansion vectors V2 for the remaining teeth of the digital representation of the initial dental arch, based on the expansion vector V1; Step G5: forming a digital representation of a target output dental arch comprising multiple teeth at the ends of the expansion vectors V1 and V2; Step G6: optionally adjusting the teeth positions of the digital representation of the target output dental arch; and Step G7: outputting a physical orthodontic appliance based on profile of the digital representation of the target output dental arch. The method may utilize dental software to implement bone expansion of dental arch and fulfill multi-stage orthodontic treatment, so has flexibility and convenience to clinical practice.
-
公开(公告)号：US07789545B2
公开(公告)日：2010-09-07
申请号：US12108841
申请日：2008-04-24
Applicant: Yung-Tien Cheng , Liang-Ren Huang , Chi-Ching Huang , Chen-Kang Hsu
Inventor： Yung-Tien Cheng , Liang-Ren Huang , Chi-Ching Huang , Chen-Kang Hsu
IPC: F21S8/10
Abstract: A headlight assembly includes a housing, a light source, a light shielding plate, and a light guiding plate. The housing defines a compartment, and includes a reflector and a lens disposed in front of the reflector. The light source is mounted in the compartment and is disposed on an optical axis. The light shielding plate is mounted between the light source and the lens. The light guiding plate is disposed below the optical axis. A first portion of light beams emitted upwardly is reflected by the reflector, passes over the light shielding plate and through the lens, which refracts the first portion of the light beams to form a first illuminating pattern. A second portion of the light beams passes through the light guiding plate and through the lens, which refracts the second portion of the light beams to result in a second illuminating pattern that is directed forwardly and upwardly.
Abstract translation: 头灯组件包括壳体，光源，遮光板和导光板。 壳体限定隔室，并且包括设置在反射器前面的反射器和透镜。 光源安装在隔间内并设置在光轴上。 遮光板安装在光源和透镜之间。 导光板配置在光轴的下方。 向上发射的光束的第一部分被反射器反射，穿过遮光板并穿过透镜，该透镜折射光束的第一部分以形成第一照明图案。 光束的第二部分穿过导光板并穿过透镜，折射光束的第二部分以产生向前和向上指向的第二照明图案。
-
公开(公告)号：US07669171B2
公开(公告)日：2010-02-23
申请号：US11850513
申请日：2007-09-05
Applicant: Ju-Te Chen , Chung-An Chen , Chi-Ching Huang , Wen-Tsung Wu , Shih-Ming Yen
Inventor： Ju-Te Chen , Chung-An Chen , Chi-Ching Huang , Wen-Tsung Wu , Shih-Ming Yen
CPC classification number: G03F7/70558 , G03F7/705
Abstract: A prediction model for exposure dose is indicated by the following formula, E=E0+EC, wherein E represents an optimized exposure dose, E0 represents a preset exposure dose of a process control system, and EC represents an exposure dose compensation value, and EC=[(MTTdiff/X)/(CDmask/X)]×(ES/A′)×(Wlast+Wavg), wherein MTTdiff represents the differences between the MTT value of a previous lot and the MTT value of a next lot, CDmask represents the actual critical dimension of the mask, X represents the magnification of the mask, ES represents the actual exposure dose of a previous lot, A′ represents an experimental value obtained from the results of different lots, Wlast represents the last batch of weights and Wavg represents an average weight, and CDmask, ES, A′, Wlast and Wavg are set parameters built into the process control system.
Abstract translation: 曝光剂量的预测模型由以下公式表示，E = E0 + EC，其中E表示优化的曝光剂量，E0表示过程控制系统的预设曝光剂量，EC表示曝光剂量补偿值，EC表示曝光剂量补偿值 = [（MTTdiff / X）/（CDmask / X）]×（ES / A'）×（Wlast + Wavg），其中MTTdiff表示先前批次的MTT值与下一批次的MTT值之间的差异， CDmask表示掩模的实际临界尺寸，X表示掩模的放大倍数，ES表示先前批次的实际曝光剂量，A'表示从不同批次的结果获得的实验值，Wlast表示最后一批重量 Wavg代表平均重量，CDmask，ES，A'，Wlast和Wavg是内置到过程控制系统中的参数。
-
公开(公告)号：US20070030533A1
公开(公告)日：2007-02-08
申请号：US11495559
申请日：2006-07-31
Applicant: Tse-An Lin , Chi-Ching Huang
Inventor： Tse-An Lin , Chi-Ching Huang
IPC: H04N1/04
CPC classification number: H04N1/00519 , H04N1/00997 , H04N1/02815 , H04N1/1017
Abstract: An image acquisition method for an image acquisition apparatus is provided. The image acquisition method includes the steps of exposing an image acquisition platform and moving an optical module from an initial position to a hiding position. The hiding position is located at an opaque area of the image acquisition platform. The opaque area is used for concealing the light emitted from the optical module. The image acquisition method of the invention prevents the light from reaching and irritating the user's eyes when the user is operating the image acquisition apparatus.
Abstract translation: 提供了一种用于图像获取装置的图像获取方法。 图像获取方法包括曝光图像采集平台并将光学模块从初始位置移动到隐藏位置的步骤。 隐藏位置位于图像采集平台的不透明区域。 不透明区域用于隐藏从光学模块发出的光。 本发明的图像获取方法在用户操作图像采集装置时防止光线到达并刺激用户的眼睛。
-
公开(公告)号：US20210315669A1
公开(公告)日：2021-10-14
申请号：US17083383
申请日：2020-10-29
Applicant: Chi-Ching Huang
Inventor： Chi-Ching Huang , Tzu-Yun Kao
Abstract: A orthodontic suite and its manufacturing method for multistage treating malocclusion or abnormal alignment of the teeth and jaws are suggest. The orthodontic suite has a first stage and a second orthodontic appliances, in which the first orthodontic appliance includes a first stage arch, first stage anchoring troughs and first stage adapting troughs disposed on the first stage arch. The second orthodontic appliance includes a second stage arch, second stage anchoring troughs and second stage adapting troughs disposed on the second stage arch. The positions of second stage anchoring troughs are identical to the first stage anchoring troughs, and the positions of the second stage adapting troughs are shifting or rotating based on the first stage adapting troughs.
-
-
-
-
-
-
-
-
-
Search Results
14
records
(took 0.012 seconds)
