公开(公告)号：US10704135B2

公开(公告)日：2020-07-07

申请号：US14920081

申请日：2015-10-22

Applicant: UNITED TECHNOLOGIES CORPORATION

Inventor： James W Neal ,  Brian T Hazel ,  David A Litton ,  Eric Jorzik

IPC: C23C14/30 ,  C23C14/56 ,  C23C14/54

Abstract: A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein.

公开(公告)号：US10661297B2

公开(公告)日：2020-05-26

申请号：US16032803

申请日：2018-07-11

Applicant: United Technologies Corporation

Inventor： James W. Neal ,  Kevin W. Schlichting ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik ,  Michael J. Maloney

IPC: C23C14/24 ,  B05B15/62 ,  C23C14/50

Abstract: An embodiment of a method includes retaining a first workpiece and a second workpiece selectively on a workpiece fixture disposed within a deposition chamber. The workpiece fixture includes tooling including a first workpiece holder, a second workpiece holder, and a first hollow wall. The first workpiece is separated from the second workpiece using the first hollow wall. Energy is selectively applied and directed within the deposition chamber, from an energy source toward a first crucible, the first crucible including a plurality of walls defining an upper recess contiguous with, and disposed directly above a first lower recess, at least the upper recess open to an interior of the deposition chamber. During the step of selectively applying and directing energy, a gas valve is controlled to maintain a partial vacuum in the deposition chamber of greater than 2 Pa to control a size and overlap of at least one coating zone formed around each of the at least one workpiece.

公开(公告)号：US20170101874A1

公开(公告)日：2017-04-13

申请号：US14880846

申请日：2015-10-12

Applicant: United Technologies Corporation

Inventor： James W. Neal ,  Michael J. Maloney ,  Kevin W. Schlichting ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik

IPC: F01D5/28 ,  C04B35/622 ,  F02C3/04 ,  C04B35/48 ,  B32B9/00 ,  F01D25/00

CPC classification number: F01D5/288 ,  B32B9/005 ,  B32B2250/02 ,  C04B35/48 ,  C04B35/62222 ,  C04B2237/348 ,  C23C14/083 ,  C23C14/30 ,  F01D25/005 ,  F02C3/04 ,  F05D2220/323 ,  F05D2230/31 ,  F05D2240/12 ,  F05D2240/30 ,  F05D2240/35 ,  F05D2240/55 ,  F05D2300/134 ,  F05D2300/135 ,  F05D2300/15 ,  F05D2300/606

Abstract: An article includes a substrate and a multi-layered ceramic barrier coating on a substrate. The coating includes, from the substrate outward, a first layer of a low-dopant ceramic material and a second layer high-dopant ceramic material. The first layer has a columnar microstructure and the second layer has a branched columnar microstructure.