公开(公告)号：US07509035B2

公开(公告)日：2009-03-24

申请号：US11195395

申请日：2005-08-02

申请人： Joseph M. Ranish ,  Corina E. Tanasa ,  Sundar Ramamurthy ,  Claudia Lai ,  Ravi Jallepally ,  Ramachandran Balasubramanian ,  Aaron M. Hunter ,  Agus Tjandra ,  Norman Tam

发明人： Joseph M. Ranish ,  Corina E. Tanasa ,  Sundar Ramamurthy ,  Claudia Lai ,  Ravi Jallepally ,  Ramachandran Balasubramanian ,  Aaron M. Hunter ,  Agus Tjandra ,  Norman Tam

IPC分类号： F26B19/00 ,  F27B5/14

CPC分类号： H01L21/67115 ,  H05B3/0047

摘要： A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them. The radiance pattern includes a variation in diffuseness or collimation. In one embodiment, the center lines of all of the lamps are disposed away from the center axis. The array can be an hexagonal array, in which the center axis is located at a predetermined position between neighboring lamps.

摘要翻译： 热处理室包括以中心轴为中心旋转的基板支撑体和具有预定的它们之间的辐射图形差异的阵列中的多个灯的灯头。 辐射图包括扩散或准直的变化。 在一个实施例中，所有灯的中心线远离中心轴设置。 阵列可以是六边形阵列，其中中心轴位于相邻灯之间的预定位置。

公开(公告)号：US06828234B2

公开(公告)日：2004-12-07

申请号：US10108779

申请日：2002-03-26

申请人： Norman Tam ,  Teresa Trowbridge

发明人： Norman Tam ,  Teresa Trowbridge

IPC分类号： H01L2144

CPC分类号： H01L21/67115 ,  H01L21/67109

摘要： A method that includes flowing an inert gas into an interior of a single wafer process chamber to create a pressure in the interior that is greater than an ambient pressure; and maintaining the greater interior pressure during a wafer transfer with the single wafer process chamber.

摘要翻译： 一种方法，其包括将惰性气体流入单个晶片处理室的内部，以在内部产生大于环境压力的压力; 并且在用单晶片处理室进行晶片传送期间保持较大的内部压力。

公开(公告)号：US20060066193A1

公开(公告)日：2006-03-30

申请号：US11195395

申请日：2005-08-02

申请人： Joseph Ranish ,  Corina Tanasa ,  Sundar Ramamurthy ,  Claudia Lai ,  Ravi Jallepally ,  Ramachandran Balasubramanian ,  Aaron Hunter ,  Agus Tjandra ,  Norman Tam

发明人： Joseph Ranish ,  Corina Tanasa ,  Sundar Ramamurthy ,  Claudia Lai ,  Ravi Jallepally ,  Ramachandran Balasubramanian ,  Aaron Hunter ,  Agus Tjandra ,  Norman Tam

IPC分类号： H01K1/30 ,  H01K1/26

CPC分类号： H01L21/67115 ,  H05B3/0047

摘要： A thermal processing chamber includes a substrate support rotating about a center axis and a lamphead of plural lamps in an array having a predetermined difference in radiance pattern between them. The radiance pattern includes a variation in diffuseness or collimation. In one embodiment, the center lines of all of the lamps are disposed away from the center axis. The array can be an hexagonal array, in which the center axis is located at a predetermined position between neighboring lamps.