Polishing head capable of continuously varying pressure distribution between pressure regions for uniform polishing
    11.
    发明授权
    Polishing head capable of continuously varying pressure distribution between pressure regions for uniform polishing 有权
    抛光头能够连续地改变压力区域之间的压力分布,以进行均匀抛光

    公开(公告)号:US08888563B2

    公开(公告)日:2014-11-18

    申请号:US13195220

    申请日:2011-08-01

    申请人: Norihiko Moriya

    发明人: Norihiko Moriya

    IPC分类号: B24B29/00 B24B37/30

    CPC分类号: B24B37/30

    摘要: A polishing apparatus which includes a polishing head for holding a work, and a polishing plate on which a polishing pad is adhered. The polishing head includes a holding plate, an elastic sheet member fixed to an edge of the holding plate, a ring-shaped template fixed to an outer edge of a lower face of the elastic sheet member, a pressure chamber formed between a lower face of the holding plate and an upper face of the elastic sheet member, a seal ring having a main body part which is fitted to a supporting plate, a seal lip, which slidelingly contacts the elastic sheet member and divides the inside of the pressure chamber into an inner divided chamber and an outer divided chamber; and a fluid supply section for individually supplying a fluid to the divided chambers.

    摘要翻译: 一种抛光装置,其包括用于保持工件的抛光头和其上附着有抛光垫的抛光板。 抛光头包括保持板,固定到保持板的边缘的弹性片构件,固定到弹性片构件的下表面的外边缘的环形模板,形成在弹性片构件的下表面之间的压力室 所述保持板和所述弹性片构件的上表面,密封环,其具有装配到支撑板的主体部,密封唇,其与所述弹性片构件滑动接触并将所述压力室的内部分隔成为 内分隔室和外分隔室; 以及用于将流体单独地供应到分隔室的流体供应部。

    Method of polishing work
    12.
    发明申请
    Method of polishing work 失效
    抛光方法

    公开(公告)号:US20070128985A1

    公开(公告)日:2007-06-07

    申请号:US11633506

    申请日:2006-12-05

    申请人: Norihiko Moriya

    发明人: Norihiko Moriya

    IPC分类号: B24B49/00

    摘要: In the method of precisely polishing a work, torque of a sun gear and an internal gear are kept constant and a load applied to a carrier is reduced and maintained. The method comprises the steps of: changing a rotational speed of at least one of the sun gear, the internal gear, an upper polishing plate and a lower polishing plate; measuring rotation torque of a driving motor of at least one of the sun gear and the internal gear; detecting the minimum rotation torque measured in the measuring step; and adjusting the rotational speed of at least one of the sun gear, the internal gear, the upper polishing plate and the lower polishing plate so as to make the rotation torque thereof equal to the minimum rotation torque or running rotation torque, which is greater a prescribed value than the minimum rotation torque.

    摘要翻译: 在精密抛光工件的方法中,恒星齿轮和内齿轮的扭矩保持恒定,并且减小并维持施加在载体上的载荷。 该方法包括以下步骤:改变太阳齿轮,内齿轮,上抛光板和下抛光板中的至少一个的旋转速度; 测量太阳齿轮和内齿轮中的至少一个的驱动电机的旋转扭矩; 检测在测量步骤中测量的最小旋转扭矩; 并调节太阳齿轮,内齿轮,上抛光板和下抛光板中的至少一个的旋转速度,以使其转动扭矩等于最小旋转转矩或行驶旋转转矩,其大于 规定值低于最小旋转扭矩。

    Abrasive machine and method of abrading work piece
    13.
    发明授权
    Abrasive machine and method of abrading work piece 失效
    研磨机和研磨工件的方法

    公开(公告)号:US06939204B2

    公开(公告)日:2005-09-06

    申请号:US10691898

    申请日:2003-10-23

    申请人: Norihiko Moriya

    发明人: Norihiko Moriya

    CPC分类号: B24B37/08 B24B37/345

    摘要: The abrasive machine is capable of feeding a proper amount of slurry and preventing a work piece from sticking on an upper abrasive plate. The abrasive machine comprises: the upper abrasive plate abrading an upper face of the work piece and having a plurality of slurry holes for feeding the slurry to the work piece; a lower abrasive plate abrading a lower face of the work piece; a slurry feeding unit pressurizing and feeding the slurry; a plurality of slurry paths respectively connecting the slurry holes to the slurry feeding unit; a plurality of valve mechanisms respectively provided to the slurry paths so as to control flows of the slurry; and a control section for controlling the valve mechanisms.

    摘要翻译: 研磨机能够输送适量的浆料并防止工件粘在上磨料板上。 研磨机包括:上磨料板研磨工件的上表面,并具有用于将浆料供给到工件的多个浆料孔; 研磨工件的下表面的下研磨板; 浆料供给单元,对浆料进行加压供给; 多个浆料路径,分别将浆料孔连接到浆料供给单元; 多个阀机构分别设置在浆料路径上,以便控制浆料的流动; 以及用于控制阀机构的控制部。