公开(公告)号：US07443705B2

公开(公告)日：2008-10-28

申请号：US11653842

申请日：2007-01-17

申请人： Youichi Ito

发明人： Youichi Ito

IPC分类号： H02M7/217 ,  H02M1/12

CPC分类号： H02M1/4241 ,  Y02B70/126

摘要： A power converting apparatus includes a rectifying circuit having a pair of AC power input terminals and a pair of rectified voltage output terminals; a reactor; and a charging and discharging circuit connected between the rectified voltage output terminals. The charging and discharging circuit includes a first condenser connected with one of the rectified voltage output terminals and one of the AC power input terminals; and a second condenser connected with the other of the rectified voltage output terminals and the one AC power input terminal. The reactor generates a resonance current together with the first condenser and the second condenser, and the second condenser discharges to zero voltage while the first condenser is charged.

摘要翻译： 电力转换装置包括具有一对交流电力输入端子和一对整流电压输出端子的整流电路; 反应堆 以及连接在整流电压输出端子之间的充放电电路。 所述充放电电路包括与所述整流电压输出端子和所述交流电力输入端子之一连接的第一电容器; 以及与所述整流电压输出端子和所述一个AC电力输入端子中的另一个连接的第二电容器。 电抗器与第一电容器和第二电容器一起产生谐振电流，并且第二电容器在第一冷凝器被充电时放电到零电压。

公开(公告)号：US20070115704A1

公开(公告)日：2007-05-24

申请号：US11653842

申请日：2007-01-17

申请人： Youichi Ito

发明人： Youichi Ito

IPC分类号： H02M7/00

CPC分类号： H02M1/4241 ,  Y02B70/126

摘要： A power converting apparatus includes a rectifying circuit having a pair of AC power input terminals and a pair of rectified voltage output terminals; a reactor; and a charging and discharging circuit connected between the rectified voltage output terminals. The charging and discharging circuit includes a first condenser connected with one of the rectified voltage output terminals and one of the AC power input terminals; and a second condenser connected with the other of the rectified voltage output terminals and the one AC power input terminal. The reactor generates a resonance current together with the first condenser and the second condenser, and the second condenser discharges to zero voltage while the first condenser is charged.

摘要翻译： 电力转换装置包括具有一对交流电力输入端子和一对整流电压输出端子的整流电路; 反应堆 以及连接在整流电压输出端子之间的充放电电路。 所述充放电电路包括与所述整流电压输出端子和所述交流电力输入端子之一连接的第一电容器; 以及与所述整流电压输出端子和所述一个AC电力输入端子中的另一个连接的第二电容器。 电抗器与第一电容器和第二电容器一起产生谐振电流，并且第二电容器在第一冷凝器被充电时放电到零电压。

公开(公告)号：US20060092678A1

公开(公告)日：2006-05-04

申请号：US11262806

申请日：2005-11-01

申请人： Youichi Ito

发明人： Youichi Ito

IPC分类号： H02M7/00

CPC分类号： H02M1/4241 ,  Y02B70/126

摘要： A power converting apparatus includes a rectifying circuit having a pair of AC power input terminals and a pair of rectified voltage output terminals; a reactor; and a charging and discharging circuit connected between the rectified voltage output terminals. The charging and discharging circuit includes a first condenser connected with one of the rectified voltage output terminals and one of the AC power input terminals; and a second condenser connected with the other of the rectified voltage output terminals and the one AC power input terminal. The reactor generates a resonance current together with the first condenser and the second condenser, and the second condenser discharges to zero voltage while the first condenser is charged.

摘要翻译： 电力转换装置包括具有一对交流电力输入端子和一对整流电压输出端子的整流电路; 反应堆 以及连接在整流电压输出端子之间的充放电电路。 所述充放电电路包括与所述整流电压输出端子和所述交流电力输入端子之一连接的第一电容器; 以及与所述整流电压输出端子和所述一个AC电力输入端子中的另一个连接的第二电容器。 电抗器与第一电容器和第二电容器一起产生谐振电流，并且第二电容器在第一冷凝器被充电时放电到零电压。

公开(公告)号：US06544379B2

公开(公告)日：2003-04-08

申请号：US09778780

申请日：2001-02-08

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H05H100

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

公开(公告)号：US06310787B2

公开(公告)日：2001-10-30

申请号：US09820469

申请日：2001-03-29

申请人： Youichi Ito ,  Sinji Sato ,  Yasuhiro Nakajima ,  Toshihiko Watanabe

发明人： Youichi Ito ,  Sinji Sato ,  Yasuhiro Nakajima ,  Toshihiko Watanabe

IPC分类号： H02J300

CPC分类号： H02M5/4585

摘要： A switching power converter capable of operation in either Nonconversion, Stepdown, or Stepup Mode. Included is a parallel circuit of three serial connections of a first, a second and a third pair of switches. The junction between the first pair of switches is connected to an a.c. input terminal via an inductor, the junction between the second switch pair grounded, and the junction between the third switch pair connected to an a.c. output terminal via another inductor. The first and third switch pairs are driven at the frequency (e.g. 50 Hz) of an a.c. input voltage, and the second switch pair at a higher frequency (e.g. 20 kHz), in Nonconversion Mode; the first switch pair at the low frequency, and the second and third switch pairs at the high frequency, in Stepdown Mode; and the first and second switch pairs at the high frequency, and the third switch pair at low frequency, in Stepup Mode. The second switch pair is invariably driven at the high frequency.

摘要翻译： 一种能够在非转换，降压或升压模式下工作的开关电源转换器。 包括第一，第二和第三对开关的三个串行连接的并联电路。 第一对开关之间的连接点连接到一个交流电 输入端子通过电感器，第二开关对之间的接点接地，并且第三开关对之间的连接处连接到直流电。 输出端子通过另一个电感。 第一和第三开关对以a.c.的频率（例如50Hz）驱动。 输入电压和第二开关对在非转换模式下处于较高频率（例如20kHz）; 在低频下的第一开关对，在降频模式下的高频的第二和第三开关对; 高频时的第一和第二开关对以及低频的第三开关对，处于升压模式。 第二个开关对总是以高频驱动。

公开(公告)号：US06899789B2

公开(公告)日：2005-05-31

申请号：US10437309

申请日：2003-05-14

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H01L21/00 ,  H01L21/68 ,  H01L21/683 ,  H05H1/00 ,  C23C16/00 ,  C23F1/00

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： A method and system of holding a substrate to decrease foreign substances on the back surface thereof. The substrate holding system includes a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface thereof to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.

摘要翻译： 保持基板以减少其背面上的异物的方法和系统。 基板保持系统包括：环状防漏表面，其具有与基板周边对应的试样台上的光滑表面，基板周围的接触保持部分，以及静电吸引装置，用于通过使基板 其背面到环状防漏面和接触保持部。 基板与环状防漏表面的接触保持部分和环形防漏表面内的位置接触。 基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。

公开(公告)号：US06610171B2

公开(公告)日：2003-08-26

申请号：US10107353

申请日：2002-03-28

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H05H100

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

公开(公告)号：US06524428B2

公开(公告)日：2003-02-25

申请号：US09849405

申请日：2001-05-07

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： C23C1600

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： A method and system of holding a substrate where foreign substances on the back surface can be decreased. The substrate holding system comprises a ring-shaped leakage-proof surface having a smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions within the periphery of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.

公开(公告)号：US06336991B1

公开(公告)日：2002-01-08

申请号：US09109178

申请日：1998-07-02

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： C23C1600

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： In a method of holding a substrate and a substrate holding system, the amount of foreign substances on the back surface of the substrate can be decreased, and only a small amount of foreign substances transferred from a mounting table to the substrate. For this purpose, the substrate holding system has a ring-shaped leakage-proof surface providing a smooth support surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions which bear against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic attraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate is exposed to a cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed at a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact each other in the large portion of the remaining area.

摘要翻译： 在保持基板和基板保持系统的方法中，可以减少基板的背面上的异物量，并且只有少量的异物从安装台传递到基板。 为此，基板保持系统具有环形防漏表面，在对应于基板的周边的样品台上提供平滑的支撑表面，多个接触保持部分抵靠在样品台上的基板上， 与基板的周边相对应的位置以及与基板的中心对应的位置，以及静电引导装置，用于通过使基板的背面与环状防漏面接触而固定基板，以及接触保持部 。 将基板暴露于环状防漏表面处的冷却表面和位于环形防漏表面内的位置处的接触保持部。 基板的后表面和冷却表面在剩余区域的大部分中彼此不接触。

公开(公告)号：US06221201B1

公开(公告)日：2001-04-24

申请号：US09108835

申请日：1998-07-02

申请人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

发明人： Naoyuki Tamura ,  Kazue Takahashi ,  Youichi Ito ,  Yoshifumi Ogawa ,  Hiroyuki Shichida ,  Tsunehiko Tsubone

IPC分类号： H05H100

CPC分类号： H01L21/6835 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833 ,  H01L2924/3025 ,  Y10T279/23

摘要： Present invention provides a method of holding substrate and a substrate holding system where the amount of foreign substances on the back surface can be decreased, and a little amount of foreign substances may be transferred from a mounting table to a substrate. The substrate holding system comprises a ring-shaped leakage-proof surface having smooth surface on the specimen table corresponding to the periphery of the substrate, a plurality of contact holding portions against the substrate on the specimen table between the corresponding position to the periphery of the substrate and the corresponding position to the center of the substrate, and electrostatic ttraction means for fixing the substrate by contacting the back surface of the substrate to the ring-shaped leakage-proof surface and the contact holding portions. The substrate contacts to the cooling surface at the ring-shaped leakage-proof surface and the contact holding portion placed on a position inside the ring-shaped leakage-proof surface. The back surface of the substrate and the cooling surface do not contact to each other in the large portion of the remaining area.