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    ELECTRON BEAM SOURCE AND THE USE OF THE SAME
    20.
    发明申请
    ELECTRON BEAM SOURCE AND THE USE OF THE SAME 审中-公开

    公开(公告)号：US20190193193A1

    公开(公告)日：2019-06-27

    申请号：US16195995

    申请日：2018-11-20

    申请人： Arcam AB

    发明人： Mattias Fager

    IPC分类号： B23K15/00 ,  H01J37/302 ,  H01J37/317 ,  B33Y30/00 ,  B33Y10/00 ,  B33Y50/02

    CPC分类号： B23K15/0086 ,  B29C64/153 ,  B33Y10/00 ,  B33Y30/00 ,  B33Y50/02 ,  H01J1/135 ,  H01J1/16 ,  H01J3/027 ,  H01J37/3023 ,  H01J37/3178

    摘要： Provided is an electron beam source for generating an electron beam comprising a cathode, an anode and a grid for regulating an electron beam current. The cathode has a base and a protrusion with sidewalls and a top surface. The base surface and the top surface are essentially flat. The base surface and the top surface are arranged at a predetermined distance from each other. The base is larger than the protrusion. The electron beam source further comprising a control unit adapted for changing an applied voltage to the grid for switching a spot size of the electron beam on a target surface between at least a first a first spot size corresponding to emission from the top surface of the cathode only and to a second spot size corresponding to emission from the top surface and the base surface of the cathode.