Abstract:
The present invention provides a plasma reactor for abating hazardous materials generated in a low-pressure process during a process of manufacturing a display or a semiconductor. A plasma reactor for abating hazardous materials according to an exemplary embodiment of the present invention includes: a first ground electrode and a second ground electrode disposed at a distance from each other; a dielectric fixed between the first ground electrode and the second ground electrode; and at least one driving electrode disposed on an outer surface of the dielectric, being spaced apart from the first ground electrode and the second ground electrode and connected to an AC power supply unit to receive a driving voltage therefrom.
Abstract:
The present invention relates to a method of loading 3-D image data in a navigation system. In the method, whether a vehicle enters an intersection while traveling is determined. A mask array based on a travel path of the vehicle is selected. An object to be displayed at the intersection is selected and a level-of-detail array of the object is selected according to a distance between the vehicle and the object. The level-of-detail array of the object overlaps the mask array. The object is displayed according to a level of detail of the object obtained from the level-of-detail array overlapping the mask array. According to the method, real-time 3-D image data can be loaded in a simple and efficient manner.