METHOD OF PRODUCING NANOPATTERNED TEMPLATES
    22.
    发明申请
    METHOD OF PRODUCING NANOPATTERNED TEMPLATES 有权
    生产纳米材料的方法

    公开(公告)号:US20080230514A1

    公开(公告)日:2008-09-25

    申请号:US12049541

    申请日:2008-03-17

    IPC分类号: C23F1/02

    摘要: Nanopatterned substrates can be prepared by a method that includes forming a block copolymer film on a substrate, annealing the block copolymer film, surface reconstructing the annealed block copolymer film, coating an etch-resistant layer on the surface reconstructed block copolymer film, etching the resist-coated block copolymer film to create an etched article comprising a nanopatterned substrate, and separating the etch-resistant layer and the block copolymer film from the nanopatterned substrate. The method is applicable to a wide variety of substrate materials, avoids any requirement for complicated procedures to produce long-range order in the block copolymer film, and avoids any requirement for metal functionalization of the block copolymer.

    摘要翻译: 纳米图案化的基材可以通过包括在基材上形成嵌段共聚物膜,退火嵌段共聚物膜,重整退火的嵌段共聚物膜的表面,在表面重整的嵌段共聚物膜上涂覆耐蚀刻层,蚀刻抗蚀剂 涂覆的嵌段共聚物膜以产生包含纳米图案化基材的蚀刻制品,并将该耐蚀刻层和嵌段共聚物膜与纳米图案化的基材分离。 该方法适用于各种基板材料,避免了在嵌段共聚物膜中产生长距离顺序的复杂程序的任何要求,并且避免了对嵌段共聚物的金属官能化的任何要求。