公开(公告)号：US20140030433A1

公开(公告)日：2014-01-30

申请号：US13939591

申请日：2013-07-11

Applicant: APPLIED MATERIALS, INC.

Inventor： JOSEPH M. RANISH

IPC: B05C5/00

CPC classification number: B05C5/00 ,  B05C5/001 ,  C23C16/24 ,  C23C16/455 ,  C23C16/45578 ,  C30B25/14

Abstract: Methods and apparatus for delivering process gases to a substrate are provided herein. In some embodiments, an apparatus for processing a substrate may include a gas distribution conduit disposed in a processing volume of a process chamber above a substrate support to distribute a process gas to a processing surface of the substrate when disposed on the substrate support; and an actuator coupled to the gas distribution conduit to move the gas distribution conduit with respect to the substrate support. In some embodiments, a method of processing a substrate may include introducing a process gas to a process chamber through a gas distribution conduit disposed above a substrate having a processing surface; and moving the gas distribution conduit within the process chamber and with respect to the substrate to distribute the process gas across the processing surface of the substrate.

Abstract translation: 本文提供了将工艺气体输送到基底的方法和装置。 在一些实施例中，用于处理衬底的装置可以包括设置在衬底支撑件上方的处理室的处理容积中的气体分配管道，以便当设置在衬底支架上时将工艺气体分配到衬底的处理表面; 以及联接到所述气体分配管道以致使所述气体分配管道相对于所述衬底支撑件移动的致动器。 在一些实施例中，处理衬底的方法可以包括通过布置在具有处理表面的衬底之上的气体分配导管将工艺气体引入处理室; 以及将所述气体分配管道移动到所述处理室内并相对于所述衬底，以将所述工艺气体分布在所述衬底的所述处理表面上。