公开(公告)号：US20170048958A1

公开(公告)日：2017-02-16

申请号：US14824147

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003

Abstract: A method includes providing a target material that includes a component that emits extreme ultraviolet (EUV) light when converted to plasma; directing a first beam of radiation toward the target material to deliver energy to the target material to modify a geometric distribution of the target material to form a modified target; directing a second beam of radiation toward the modified target, the second beam of radiation converting at least part of the modified target to plasma that emits EUV light; controlling a radiant exposure delivered to the target material from the first beam of radiation to within a predetermined range of radiant exposures; and stabilizing a power of the EUV light emitted from the plasma by controlling the radiant exposure delivered to the target material from the first beam of radiation to within the predetermined range of radiant exposures.

Abstract translation: 一种方法包括提供包含当转换成等离子体时发射极紫外（EUV）光的组分的靶材料; 将第一辐射束引导到目标材料以将能量传递到目标材料以改变目标材料的几何分布以形成修改的靶; 将第二射束照射到修改的目标物上，第二辐射束将至少部分改性靶转换成发射EUV光的等离子体; 控制从第一辐射束传送到目标材料的辐射暴露到辐射曝光的预定范围内; 以及通过将从第一辐射束传递到目标材料的辐射曝光控制在辐射曝光的预定范围内，来稳定从等离子体发射的EUV光的功率。

公开(公告)号：US09426872B1

公开(公告)日：2016-08-23

申请号：US14824267

申请日：2015-08-12

Applicant: ASML Netherlands B.V.

Inventor： Daniel Jason Riggs ,  Robert Jay Rafac

IPC: H05G2/00 ,  B05B12/02 ,  B05B17/06

CPC classification number: H05G2/008 ,  H05G2/005

Abstract: Methods and systems for improved timing of a source laser in a laser produced plasma (LPP) extreme ultraviolet (EUV) generation system are disclosed. Due to forces within the plasma chamber, a velocity of a droplet can slow as it approaches the irradiation site. Because the droplet is slowed, a source laser fires prematurely relative to the slowed droplet, resulting in only a leading portion of the droplet being irradiated. The resulting amount of EUV energy generated from the droplet is proportional to the slowed velocity of the droplet. To compensate, the firing of the source laser is delayed for a next droplet based on the generated EUV energy. Because the firing of the source laser is delayed for the next droplet, the next droplet is more likely to be in position to be more completely irradiated, resulting in more EUV energy being generated from the next droplet.

Abstract translation: 公开了用于改善激光产生的等离子体（LPP）极紫外（EUV）发生系统中的源激光器定时的方法和系统。 由于等离子体腔内的力，当液滴接近照射部位时，液滴的速度可能会减慢。 因为液滴减慢，源激光器相对于减慢的液滴过早地点燃，导致只有液滴的前导部分被照射。 从液滴产生的EUV能量的所得量与液滴的减速成比例。 为了补偿，基于产生的EUV能量，源激光器的点火被延迟下一个液滴。 因为源激光器的点火被延迟下一个液滴，所以下一个液滴更可能处于更完全照射的位置，导致从下一个液滴产生更多的EUV能量。