公开(公告)号：US5916368A

公开(公告)日：1999-06-29

申请号：US807680

申请日：1997-02-27

Applicant: Andreas Ebert

Inventor： Andreas Ebert

IPC: B05C11/08 ,  B05C11/10 ,  G03F7/16 ,  B05C21/00 ,  B05B11/00 ,  B23B5/22

CPC classification number: G03F7/162 ,  B05C11/08 ,  B05C11/1042 ,  Y10T279/11

Abstract: Disclosed is method and apparatus for distributing a chemical over the surface of a substrate. The method includes depositing the chemical on a portion of the surface of a substrate near the center of the substrate. The method further includes controlling the temperature of the surface of a substrate so that the viscosity of the chemical is calibrated to cause the chemical to be deposited on the surface of the substrate in a substantially uniform manner.

Abstract translation: 公开了用于在基板的表面上分配化学品的方法和装置。 该方法包括将化学品沉积在衬底的靠近衬底中心的一部分表面上。 该方法还包括控制衬底表面的温度，使得校准化学品的粘度以使化学品以基本上均匀的方式沉积在衬底的表面上。

公开(公告)号：US5840365A

公开(公告)日：1998-11-24

申请号：US797819

申请日：1997-02-07

Applicant: Andreas Ebert ,  Abdul Ghafar

Inventor： Andreas Ebert ,  Abdul Ghafar

IPC: B05C11/08 ,  G11B7/26 ,  B05D5/12

CPC classification number: B05C11/08 ,  G11B7/26

Abstract: Disclosed is a spinning chemical applicator for spin coating a work piece. The spinning chemical applicator includes a bowl having a base region and substantially curved walls. A chuck base having a chuck plate for holding the work piece, the chuck base and the chuck plate contained within an inner region of the bowl. A bowl covering lid being mounted on a top surface of the substantially curved walls. A plurality of upper venting holes being defined in the substantially curved walls, the plurality of upper venting holes defining a venting path to the inner region of the bowl. And plurality of venting drain holes defined in the substantially curved walls at an edge location that is substantially below each of the plurality of upper venting holes. The plurality of venting drain holes providing a venting and drain path for the inner region of the bowl.

Abstract translation: 公开了用于旋涂工件的纺丝化学施加器。 纺丝化学施加器包括具有基部区域和基本上弯曲的壁的碗。 具有用于保持工件的卡盘盘，卡盘基座和卡盘盘夹在碗的内部区域内的卡盘基座。 覆盖盖的碗安装在基本上弯曲的壁的顶表面上。 多个上通气孔限定在基本上弯曲的壁中，多个上通气孔限定到碗的内部区域的通气路径。 以及多个通气排放孔，其限定在基本上弯曲的壁中，在大致低于多个上排气孔中的每一个的边缘位置处。 多个通气排放孔为碗的内部区域提供通气和排放路径。